Abstract: A composition which conditions a surface for electroless deposition of a metal is disclosed. The composition comprises a polymer surfactant comprising repeating units of a monomer, wherein each of the repeating units comprises a functional group; a metal ion; and water, wherein the functional group in each of the repeating units forms a complex with the metal ion. In a preferred embodiment, the functional group is amine, and the surfactant comprises polyethyleneimine and/or polyallylamine. The metal ion comprises cobalt, rhodium, palladium or silver. A method of forming the composition as well as a method of electroless deposition using the composition are also disclosed.