Abstract: The present disclosure relates to a system and a method for image reconstruction. The method may include obtaining a projection image of a subject acquired by an imaging device, the projection image including a first region with a normal exposure corresponding to a first portion of the subject and a second region with an overexposure corresponding to a second portion of the subject; using first pixel values of first pixels in the first region to correct second pixel values of second pixels in the second region; and reconstructing, based on the first pixel values of the first pixels in the first region and the corrected second pixel values of the second pixels in the second region, a target image of the subject.

Abstract: The present invention provides a pattern verifying method. First, a target pattern is decomposed into a first pattern and a second pattern. A first OPC process is performed for the first pattern to form a first revised pattern, and a second OPC process is performed for the second pattern to form a second revised pattern. An inspection process is performed, wherein the inspection process comprises an after mask inspection (AMI) process, which comprises considering the target pattern, the first pattern and the second pattern.

Abstract: The present invention provides a pattern verifying method. First, a target pattern is decomposed into a first pattern and a second pattern. A first OPC process is performed for the first pattern to form a first revised pattern, and a second OPC process is performed for the second pattern to form a second revised pattern. An inspection process is performed, wherein the inspection process comprises an after mask inspection (AMI) process, which comprises considering the target pattern, the first pattern and the second pattern.