Abstract: Provided in the present disclosure are a PECVD coating system and coating method. In the coating method, deposition is performed on a surface of a substrate by means of a PECVD coating device so as to form an organic hydrophobic membrane, and deposition and coating involve the steps of: (A) providing an inductively coupled electric field for a reaction cavity of the PECVD coating device by means of an ICP generator of the PECVD coating device, so as to form a coupled magnetic field; and (B) providing a bias electric field for the reaction cavity by means of a bias power supply of the PECVD coating device.

Abstract: Provided are a plasma coating apparatus and a coating method. The plasma coating apparatus uses radio frequency discharge, and a discharge coil can be arranged in the lengthwise direction of a coating cavity, so as to provide a plasma environment for a base material when the base material moves within the coating cavity in the lengthwise direction of the coating cavity.

Abstract: An optical module includes a micro spectrometer. The micro spectrometer includes an optical crystal, a lens, and a photosensitive assembly. The optical crystal is configured to receive detection light and covert the detection light into interference light. The optical crystal is surrounded by a sleeve, the sleeve configured to fix a position of the optical crystal. The lens is configured for receiving the interference light and focusing the interference light. The photosensitive assembly is configured for imaging the interference light into an interference image. The optical module further comprises a controller. The controller is electrically connected to the photosensitive assembly, and the controller is used to convert the interference image into light wavelength signals and light intensity signals.

Abstract: Provided is a low dielectric constant film and a preparation method thereof, where epoxy alkanes, organosilicon compounds and fluorine-containing siloxane compounds are used as raw materials of the low dielectric constant film, and the low dielectric constant film is formed on a substrate surface by a plasma-enhanced chemical deposition method. Accordingly, a nanofilm with a low dielectric constant and excellent hydrophobicity is formed on the substrate surface.

Abstract: A coating apparatus includes a chamber body having a reaction chamber, a supporting rack, a monomer discharge source and a plasma generation source. The supporting rack has a supporting area for supporting the substrate. The monomer discharge source has a discharge inlet for introducing a coating forming material into the reaction chamber. The plasma generation source is arranged for exciting the coating forming material, wherein the supporting area of the supporting rack is located at a position between the monomer discharge source and the plasma generation source, so that the coating is evenly formed on the surface of the substrate, and the deposition velocity is increased.

Abstract: An exhaust gas filtering apparatus (1) and coating equipment (1000). The exhaust gas filtering apparatus (1) comprises at least one filtering unit (20), a first mounting unit (11), and a second mounting unit (12), where the filtering unit (20) is convenient to replace and can be replaced in a timely manner. The coating equipment (1000) comprises a coating body (2) and the exhaust gas filtering apparatus (1), where the coating body (2) is provided with a coating compartment (300), and a gas inlet (101) of the exhaust gas filtering apparatus (1) is in communication with the coating compartment (300).

Abstract: Disclosed in the present invention are a raw material gasification device, a film coating apparatus and a gasification method therefor. The raw material gasification device comprises: a first-stage gasification component, the first-stage gasification component being configured to perform primary gasification on fed raw materials; a second-stage gasification component, the second-stage gasification component being configured to perform further gasification on the raw materials subjected to the primary gasification by the first-stage gasification component; and a feeding control portion, the feeding control portion being configured to feed the raw materials to be gasified, and the feeding control portion being in controlled communication with the first-stage gasification component, thereby increasing the gasification efficiency of the raw materials.

Abstract: A transparent wear-resistant film layer, a plastic substrate modification method, and a product are provided, the plastic substrate modification method includes the following steps: bombarding with at least one plastic substrate positioned in a chamber of a PECVD coating device with plasma to clean and activate the at least one plastic substrate, and forming a transparent wear-resistant film layer on the at least one surface of the activated plastic substrate by a plasma enhanced chemical vapor deposition using a siloxane monomer as a reaction raw material.

Abstract: Disclosed are a hydrophobic and oleophobic coating, a preparation method therefor and a product, wherein the hydrophobic and oleophobic coating is formed by the deposition of a perfluoropolyether or perfluoropolyether derivative on the surface of a substrate by means of PECVD, such that the hydrophobic and oleophobic properties of the surface of the substrate are improved by the perfluoropolyether or perfluoropolyether derivative coating. Further disclosed are a hydrophobic and oleophobic coating, a preparation method therefor and a product, wherein the hydrophobic and oleophobic coating comprises: at least a two-layer structure, one of the layers being formed by the plasma chemical vapor deposition of one or more perfluoropolyethers or perfluoropolyether derivatives as raw materials, and the other layer being formed by the plasma chemical vapor deposition of a silane- or siloxane-containing raw material, thereby improving the hydrophobic and oleophobic properties of the surface of a substrate.

Abstract: A super-hydrophobic film layer, a preparation method thereof, and a product thereof are provided, the preparation method includes using a siloxane monomer as a reaction material to form a super-hydrophobic film layer on a surface of a substrate by a plasma enhanced chemical vapor deposition.

Abstract: Methods and apparatus for preparing a protective coating are described. In one example aspect, a method for preparing a protective coating includes positioning one or more target objects into a chamber. The chamber comprises a movable substrate and one or more trays coupled to the movable substrate to hold the one or more target objects such that the one or more target objects are movable within the chamber. The method also includes adding a monomer vapor into the chamber and performing a chemical vapor deposition process that comprises at least one cycle, each including a pretreatment phase and a coating phase.

Abstract: A protective coating is provided, including a first coating formed on a surface of a substrate by plasma polymerization deposition when the substrate contacts plasmas. The plasmas include a plasma of a monomer A and a plasma of a monomer B, wherein the monomer A includes both a silicon structural unit of formula (I) and at least one amine group structural unit of formula (II) or formula (III); and monomer B includes a terminal carboxyl group structural unit. Further disclosed is a preparation method of the protective coating, the method includes: providing a substrate, gasifying monomers including the monomer A and the monomer B and then introducing the monomers into a plasma reactor, performing a plasma discharge, and forming the first coating on the surface of the substrate by plasma polymerization. Further disclosed is a device, which is provided with the protective coating on at least part of the surface thereof.

Abstract: A water-resistant film layer, a preparation method therefor, and a product. The water-resistant film layer is formed on a surface of a substrate by one or more compounds shown in general formula (I) by means of a plasma chemical vapor deposition method, i.e., R1R2?R3R4(I), wherein R1 and R2 are each independently selected from one of a group consisting of hydrogen, alkyl, halogen, haloalkyl, and aryl, at least one of R1, R2, and R3 is halogen, and R4 is a hydrophobic functional group, typically having a fluorine-containing alky structure.

Abstract: The specific embodiment of the present disclosure provides a protective coating. An anticorrosive coating having a compact rigid molecular structure is formed by plasma polymerization coating of monomers including alicyclic epoxy structural units, and a hydrophobic coating is simultaneously formed by plasma polymerization coating on the anticorrosive coating, thus, coatings with excellent protective performance to the substrate are formed.

Abstract: Provided are a hydrophilic anti-fog film layer, a preparation method therefor, and an application and a product thereof. The hydrophilic anti-fog film layer is prepared by means of a plasma chemical vapor deposition method by using a titanium dioxide precursor source and a non-metal doping source as reaction raw materials, has relatively good anti-fog performance under visible light, and has relatively good light transmittance.

Abstract: A coating apparatus for coating a plurality of substrates includes a chamber body having a reaction chamber, a monomer discharge source having a discharge inlet for introducing a coating forming material into the reaction chamber of the chamber body, and a plasma generation source disposed at a central area of the reaction chamber of the chamber body for exciting the coating forming material, wherein the plurality of substrates is adapted for being arranged around the plasma generation source within the chamber body, so that the uniformity of the coatings formed on the surfaces of the substrates is enhanced, and the deposition velocity is increased.

Abstract: Methods and apparatus for preparing a protective coating are described. In one example aspect, an apparatus for preparing a protective coating includes a chamber, a substrate positioned within the chamber configured to hold at least a target object, an inlet pipe configured to direct a monomer vapor into the chamber, and one or more electrodes configured to perform a chemical vapor deposition process to produce a multi-layer coating. The chemical vapor deposition process comprises multiple cycles, each cycle comprising a pretreatment phase and a coating phase to produce a layer of the multi-layer coating.

Abstract: Provided in the present disclosure are a coating apparatus and an application thereof, being used for coating on the surface of a substrate, the coating apparatus comprises a feeding device and a device main body, wherein the feeding device is configured to communicate with the apparatus device main body, the feeding device comprises a gas feeding device and a liquid feeding device, the gas feeding device is in communication with the device main body and is used for transmitting a gaseous gas raw material to the device main body, the liquid feeding device is in communication with the device main body and is used for transmitting a liquid gasified gas raw material to the device main body, the device main body is used for preparing a thin film based on the gas raw material, and the same coating apparatus can be used for preparing various thin films or film layers with different properties or of different types on the surface of the substrate.

Abstract: A coating apparatus and movable electrode arrangement, movable support arrangement, and application thereof are disclosed. The coating apparatus includes a reactor chamber body and a movable support arrangement. The reactor chamber body has a reactor chamber. The movable support arrangement is received in the reactor chamber and includes one or more electrodes and a movable support. The movable support is adapted for rotating relative to the reactor chamber body. At least one of the electrodes is arranged on the movable support so as for rotating together with the movable support. One or more workpieces to be coated are adapted for being held on the movable support to move together with the movable support.

Abstract: The present disclosure provides an electrode support, a supporting mechanism, a support, a film coating apparatus, and an application. The electrode support is applied to the film coating apparatus. The film coating apparatus allows coating of at least one to-be-coated workpiece. The film coating apparatus comprises a reaction chamber and a pulse power supply; the pulse power supply is used for providing a pulse electric field in the reaction chamber. The electrode support comprises support members arranged in multiple layers; the support member of each layer is separately retained at a preset spacing; at least one layer of the support member is conductively connected to the pulse power supply to serve as a negative electrode of the pulse power supply. The electrode support can uniformly load the to-be-coated workpiece and can be used as an electrode, and wiring between the electrode support and an external power supply is simple.