Patents by Inventor Jian Zong
Jian Zong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 12252789Abstract: Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape to a central axis. A rotation rack may be operable to rotate about the central axis of the vacuum chamber. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber in a substantially symmetrical manner from the outer perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a polymeric multi-layer coating on surfaces of the one or more devices. Each layer may have a different composition of atoms to enhance the water resistance, corrosion resistance, and fiction resistance of the polymeric multi-layer coating.Type: GrantFiled: March 16, 2022Date of Patent: March 18, 2025Assignee: Jiangsu Favored Nanotechnology Co., LTDInventor: Jian Zong
-
Publication number: 20250011621Abstract: Detailed embodiments of the present invention provide a composite coating, a preparation method, and a device. The composite coating comprises a coating formed by plasma containing an unsaturated ester monomer having an aromatic ring, an ester coupling agent monomer, and an organosilane monomer having an aromatic ring or an epoxy group as an inner layer; and a coating formed by plasma containing a fluoroacrylate monomer and an organosilane monomer having an aromatic ring or an epoxy group as the outer layer. The composite coating has both an excellent anti-corrosion performance and excellent wear resistance.Type: ApplicationFiled: October 12, 2022Publication date: January 9, 2025Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventor: Jian ZONG
-
Patent number: 12180582Abstract: Provided in the present disclosure are a coating method and a film layer thereof, and a coating chucking appliance and an application thereof. The coating method comprises the steps of: forming a normal film layer on a first component on a substrate surface, and forming at least a thinner film layer on a second component on the substrate surface, wherein the thickness of the normal film layer is greater than the thickness of the thinner film layer. The coating method can prepare a thinner film layer on the surface of some portions or parts on the substrate surface, and prepare a thicker film layer on the surface of other portions or parts, thereby satisfying the requirements of coating a thinner film layer on some electronic components of the substrate, such as circuit interface components, ensuring data transmission performance.Type: GrantFiled: October 21, 2020Date of Patent: December 31, 2024Assignee: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventors: Jian Zong, Ji Peng, Yingjing Dai, Wei Shan, Zhuyao Lan
-
Patent number: 12173175Abstract: The present disclosure provides a water-resistant nanofilm, a preparation method and an article thereof, in which fluorocarbon gas is used as a plasma source and is formed on a substrate surface of substrate by a plasma enhanced chemical vapor deposition method, so that the water-resistance performance of the substrate surface is improved.Type: GrantFiled: June 12, 2020Date of Patent: December 24, 2024Assignee: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventor: Jian Zong
-
Publication number: 20240420914Abstract: A coating method for coating a substrate, including the following steps: (a) introducing. (a) introducing a coating forming material into a reaction chamber of a chamber body through a plurality of monomer discharge sources and exciting the coating forming material through a plasma generation source; and (b) guiding the substrate to alternately move close to the monomer discharge source and the plasma generation source for forming a polymer coating on the substrate. The step (b) comprises a step of rotating a supporting rack to guide the substrate to move between the plurality of monomer discharge sources and the electrode means of the plasma generation source.Type: ApplicationFiled: August 29, 2024Publication date: December 19, 2024Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventor: Jian ZONG
-
Patent number: 12170189Abstract: A coating apparatus includes a chamber body having a reaction chamber, a supporting rack, a monomer discharge source and a plasma generation source. The supporting rack has a supporting area for supporting the substrate. The monomer discharge source has a discharge inlet for introducing a coating forming material into the reaction chamber. The plasma generation source is arranged for exciting the coating forming material, wherein the supporting area of the supporting rack is located at a position between the monomer discharge source and the plasma generation source, so that the coating is evenly formed on the surface of the substrate, and the deposition velocity is increased.Type: GrantFiled: December 17, 2020Date of Patent: December 17, 2024Assignee: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventor: Jian Zong
-
Publication number: 20240329020Abstract: A terminal device includes a body, a smell sensor, a housing, an elastic piece, and a coil. A groove is defined on the body, the groove has a bottom wall. The smell sensor is fixed to the bottom wall. The housing covers the groove. The elastic piece includes a fixing area and a deformable area disposed around the fixing area. The fixing area is fixed to the housing, the deformable area can be deformed relative to the fixing area. The coil can generate a magnetic field to deform the deformable area toward the bottom wall, causing the deformable area and the bottom wall to cooperatively form an accommodating cavity, the smell sensor can be accommodated in the accommodating cavity.Type: ApplicationFiled: June 30, 2023Publication date: October 3, 2024Inventor: JIAN-ZONG LIU
-
Publication number: 20240316586Abstract: A curved-screen shielding device is provided for shielding a curved screen assembly during a coating process. The curved-screen shielding device includes at least one template sleeve and a flexible sleeve, wherein the flexible sleeve includes a first accommodating accommodation space, and the template sleeve includes a second accommodation space. The curved screen assembly can be accommodated in the first accommodation space, and the flexible sleeve can be accommodated in the second accommodation space. At least one first through hole is configured at a corresponding position of the template sleeve and the flexible sleeve, and a coating monomer can reach a coating area of the curved screen assembly through the at least one first through hole to form coatings on the coating area of the curved screen assembly.Type: ApplicationFiled: December 2, 2021Publication date: September 26, 2024Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventors: Jian ZONG, Fuen SUN
-
Patent number: 12091574Abstract: The present invention provides a hydrophobic surface coating and a preparation method therefor. The hydrophobic surface coating uses one or more fluorinated alcohol compounds as a reaction gas material, and is formed on a surface of a base body by a plasma-enhanced chemical vapor deposition method, to improve the hydrophobicity, the chemical resistance, and the weatherability of the surface of the base body.Type: GrantFiled: June 18, 2020Date of Patent: September 17, 2024Assignee: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventors: Jian Zong, Bixian Kang, Yingjing Dai
-
Publication number: 20240287674Abstract: A composite film applied to a flexible substrate, a preparation method thereof, and a product thereof are provided. The composite film applied to the flexible substrate is used for being formed on the surface of the flexible substrate. The composite film applied to the flexible substrate includes: a nano-transition layer, which is a film layer formed on the surface of the flexible substrate by plasma enhanced chemical vapor deposition using a siloxane monomer as a reaction raw material; and a diamond-like carbon film, which is a film layer formed on the surface of the nano-transition layer by plasma enhanced chemical vapor deposition using a carbon source gas as a reaction raw material. The surface hardness and friction resistance of the substrate can be improved, and requirements of a flexible display device are met.Type: ApplicationFiled: May 13, 2022Publication date: August 29, 2024Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventor: Jian ZONG
-
Patent number: 12065740Abstract: Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape relative to a central axis. A primary rotation shaft may be operable to rotate about the central axis of the vacuum chamber and a secondary rotation shaft may be operable to rotate about a secondary axis distal to the central axis. The primary and secondary rotation shafts may be mechanically connected, and one or more devices may be secured on a platform that rotates along both shafts. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a uniform polymeric multi-layer coating on the surface of the one or more devices.Type: GrantFiled: May 9, 2022Date of Patent: August 20, 2024Assignee: Jiangsu Favored Nanotechnology Co., LTDInventor: Jian Zong
-
Publication number: 20240243395Abstract: Provided in a particular embodiment of the present invention is a batter with a coating. In the coating, a plasma coating of a siloxane monomer and an ester monomer of acrylic acid and homologues thereof is used as a base layer; a plasma coating of a multifunctional epoxide of an epoxide monomer with a carbon-carbon double bond structure, an epoxide monomer with a carbon-carbon triple bond structure or an epoxide monomer with two or more epoxy structures and an ester monomer of acrylic acid and the homologues thereof is used as an anti-corrosive layer; a plasma coating of a cyclosiloxane monomer is used as a hydrophobic layer; and all the layers are closely combined with each other to form, on the surface of the battery, an excellent protective coating free of halogens such as fluorine.Type: ApplicationFiled: May 11, 2022Publication date: July 18, 2024Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventors: Jian ZONG, Siyue LI
-
Publication number: 20240158645Abstract: Specific embodiments of the present disclosure provide a composite coating. In the composite coating, a plasma of a multifunctional-group monomer having an epoxy structure and a plasma of an ester-based coupling agent are used to form a coating as a base coating, and a plasma of an unsaturated ester-based monomer having aromatic ring(s) and a plasma of an ester-based coupling agent are used to form a coating as an anti-corrosion coating. The composite coating has a high binding force with a substrate and a strong corrosion resistance.Type: ApplicationFiled: February 25, 2022Publication date: May 16, 2024Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventors: Jian ZONG, Siyue LI
-
Publication number: 20240133036Abstract: Provided in the present disclosure are a PECVD coating system and coating method. In the coating method, deposition is performed on a surface of a substrate by means of a PECVD coating device so as to form an organic hydrophobic membrane, and deposition and coating involve the steps of: (A) providing an inductively coupled electric field for a reaction cavity of the PECVD coating device by means of an ICP generator of the PECVD coating device, so as to form a coupled magnetic field; and (B) providing a bias electric field for the reaction cavity by means of a bias power supply of the PECVD coating device.Type: ApplicationFiled: January 11, 2022Publication date: April 25, 2024Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventor: Jian ZONG
-
Publication number: 20240102168Abstract: Provided are a plasma coating apparatus and a coating method. The plasma coating apparatus uses radio frequency discharge, and a discharge coil can be arranged in the lengthwise direction of a coating cavity, so as to provide a plasma environment for a base material when the base material moves within the coating cavity in the lengthwise direction of the coating cavity.Type: ApplicationFiled: January 11, 2022Publication date: March 28, 2024Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventor: Jian ZONG
-
Patent number: 11913837Abstract: An optical module includes a micro spectrometer. The micro spectrometer includes an optical crystal, a lens, and a photosensitive assembly. The optical crystal is configured to receive detection light and covert the detection light into interference light. The optical crystal is surrounded by a sleeve, the sleeve configured to fix a position of the optical crystal. The lens is configured for receiving the interference light and focusing the interference light. The photosensitive assembly is configured for imaging the interference light into an interference image. The optical module further comprises a controller. The controller is electrically connected to the photosensitive assembly, and the controller is used to convert the interference image into light wavelength signals and light intensity signals.Type: GrantFiled: March 7, 2022Date of Patent: February 27, 2024Assignee: TRIPLE WIN TECHNOLOGY(SHENZHEN) CO. LTD.Inventors: Hsin-Yen Hsu, Ye-Quang Chen, Ho-Kai Liang, Yi-Mou Huang, Jian-Zong Liu
-
Patent number: 11904352Abstract: Provided is a low dielectric constant film and a preparation method thereof, where epoxy alkanes, organosilicon compounds and fluorine-containing siloxane compounds are used as raw materials of the low dielectric constant film, and the low dielectric constant film is formed on a substrate surface by a plasma-enhanced chemical deposition method. Accordingly, a nanofilm with a low dielectric constant and excellent hydrophobicity is formed on the substrate surface.Type: GrantFiled: May 14, 2020Date of Patent: February 20, 2024Assignee: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventor: Jian Zong
-
Patent number: 11898248Abstract: A coating apparatus includes a chamber body having a reaction chamber, a supporting rack, a monomer discharge source and a plasma generation source. The supporting rack has a supporting area for supporting the substrate. The monomer discharge source has a discharge inlet for introducing a coating forming material into the reaction chamber. The plasma generation source is arranged for exciting the coating forming material, wherein the supporting area of the supporting rack is located at a position between the monomer discharge source and the plasma generation source, so that the coating is evenly formed on the surface of the substrate, and the deposition velocity is increased.Type: GrantFiled: March 10, 2020Date of Patent: February 13, 2024Assignee: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventor: Jian Zong
-
Publication number: 20240035156Abstract: An exhaust gas filtering apparatus (1) and coating equipment (1000). The exhaust gas filtering apparatus (1) comprises at least one filtering unit (20), a first mounting unit (11), and a second mounting unit (12), where the filtering unit (20) is convenient to replace and can be replaced in a timely manner. The coating equipment (1000) comprises a coating body (2) and the exhaust gas filtering apparatus (1), where the coating body (2) is provided with a coating compartment (300), and a gas inlet (101) of the exhaust gas filtering apparatus (1) is in communication with the coating compartment (300).Type: ApplicationFiled: December 2, 2021Publication date: February 1, 2024Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventors: Jian ZONG, Zhijun WANG
-
Publication number: 20230349041Abstract: Disclosed in the present invention are a raw material gasification device, a film coating apparatus and a gasification method therefor. The raw material gasification device comprises: a first-stage gasification component, the first-stage gasification component being configured to perform primary gasification on fed raw materials; a second-stage gasification component, the second-stage gasification component being configured to perform further gasification on the raw materials subjected to the primary gasification by the first-stage gasification component; and a feeding control portion, the feeding control portion being configured to feed the raw materials to be gasified, and the feeding control portion being in controlled communication with the first-stage gasification component, thereby increasing the gasification efficiency of the raw materials.Type: ApplicationFiled: June 25, 2021Publication date: November 2, 2023Applicant: JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.Inventor: Jian ZONG