Patents by Inventor Jianchao Fan

Jianchao Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Low-pressure chemical vapor deposition apparatus and thin-film deposition method thereof
    Patent number: 9478440
    Abstract: A low-pressure chemical vapor deposition (LPCVD) apparatus and a thin-film deposition method thereof. The apparatus comprises a reaction furnace, having reaction gas input pipelines respectively arranged at a furnace opening part and a furnace tail part. During thin film deposition, each reaction gas is synchronously introduced into the reaction furnace through the input pipeline at the furnace opening part and the input pipeline at the furnace tail part.
    Type: Grant
    Filed: December 3, 2012
    Date of Patent: October 25, 2016
    Assignee: University of Utah Research Foundation
    Inventors: Xunhui Wang, Xiao Wu, Qijun Guo, Jianchao Fan
  • LOW-PRESSURE CHEMICAL VAPOR DEPOSITION APPARATUS AND THIN-FILM DEPOSITION METHOD THEREOF
    Publication number: 20140322900
    Abstract: A low-pressure chemical vapor deposition (LPCVD) apparatus and a thin-film deposition method thereof The apparatus comprises a reaction furnace, having reaction gas input pipelines respectively arranged at a furnace opening part and a furnace tail part. During thin film deposition, each reaction gas is synchronously introduced into the reaction furnace through the input pipeline at the furnace opening part and the input pipeline at the furnace tail part.
    Type: Application
    Filed: December 3, 2012
    Publication date: October 30, 2014
    Applicant: Wuxi China Resources Huajing Microelectronics Co., Ltd
    Inventors: Xunhui Wang, Xiao Wu, Qijun Guo, Jianchao Fan