Abstract: A color filter substrate and a manufacturing method thereof are provided. The color filter substrate has a transparent substrate; a color resist layer formed on the transparent substrate, and the color resist layer has at least one recess and at least one flat portion; a transparent conductive layer formed on the color resist layer; and a black photosensitive layer formed on the transparent conductive layer. The black photosensitive layer has a first protruding portion and a second protruding portion. The first protruding portion is disposed on the recess and extends into the recess. The second protruding portion is disposed on the flat portion and a height of the second protruding portion is greater than a height of the first protruding portion.

Abstract: A display panel and a method for manufacturing the same are provided. The display panel includes a substrate; a light-emitting device disposed on the substrate; a scattering layer disposed on the light-emitting device, wherein a plurality of scattering particles are arranged in the scattering layer, the scattering particles are used to improve a luminous efficiency of the light-emitting device; a sealant arranged on the substrate and arranged around the light-emitting device and the scattering layer; and a cover plate disposed on the scattering layer and the sealant.

Abstract: An OLED display device and a manufacturing method for the same are provided. The OLED display device includes a substrate, an organic light-emitting layer, a first encapsulation layer, a color filter layer, and a second encapsulation layer. Wherein the organic light-emitting layer is disposed on the substrate, the first encapsulation layer covers a surface of the organic light-emitting layer, the color filter layer is disposed on the first encapsulation layer, and the second encapsulation layer covers a surface of the color filter layer. In the present invention, the first encapsulation layer functions as a substrate of the color filter layer and is encapsulated by the first encapsulation layer and the second encapsulation layer, so that the CF substrate is omitted, the thickness of the entire display device is reduced, and flexibility is achieved.

Abstract: An OLED display device and a manufacturing method for the same are provided. The OLED display device includes a substrate, an organic light-emitting layer, a first encapsulation layer, a color filter layer, and a second encapsulation layer. Wherein the organic light-emitting layer is disposed on the substrate, the first encapsulation layer covers a surface of the organic light-emitting layer, the color filter layer is disposed on the first encapsulation layer, and the second encapsulation layer covers a surface of the color filter layer. In the present invention, the first encapsulation layer functions as a substrate of the color filter layer and is encapsulated by the first encapsulation layer and the second encapsulation layer, so that the CF substrate is omitted, the thickness of the entire display device is reduced, and flexibility is achieved.

Abstract: A method of fabricating a color filter is provided. In the method of fabricating the color filter, a patterned sacrificial layer having a thickness difference is formed on a substrate such that a patterned black photosensitive spacing material layer is formed by a single-tone photomask or a half-tone photomask and has effects of an original black matrix, a main spacer, and a sub-spacer. Thus, production costs can be reduced and a high yield can be carried out.

Abstract: A method of fabricating a color filter is provided. In the method of fabricating the color filter, a patterned sacrificial layer having a thickness difference is formed on a substrate such that a patterned black photosensitive spacing material layer is formed by a single-tone photomask or a half-tone photomask and has effects of an original black matrix, a main spacer, and a sub-spacer. Thus, production costs can be reduced and a high yield can be carried out.

Abstract: Provided is a color filter substrate, including a plurality of pixel unit regions arranged in an array. Each of the pixel unit regions has a first sub-pixel region, a second sub-pixel region, and a third sub-pixel region, which are respectively provided thereon with a red color barrier, a green color barrier, and a blue color barrier. In at least one of the pixel unit regions, thickness of a color barrier provided on a sub-pixel region corresponding to color of a specific color barrier is larger than thickness of a color barrier provided on a sub-pixel region corresponding to color of each of other two color barriers.

Abstract: A thin film transistor (TFT) array substrate and a manufacturing method of same are provided. The TFT array substrate includes a TFT array layer, a color filter layer, and a passivation layer. The color filter layer includes a blue sub-pixel, and the passivation layer includes a passivation layer body and a plurality of protrusions protruding on the passivation layer body. By forming the protrusions of the passivation layer on two side areas of the blue sub-pixel of the color filter layer, a photoresist on the two side areas of the blue sub-pixel is increased, such that a thickness of the passivation layer is uniformized, this reduces chromaticity difference.

Abstract: Provided is a color filter substrate, including a plurality of pixel unit regions arranged in an array. Each of the pixel unit regions has a first sub-pixel region, a second sub-pixel region, and a third sub-pixel region, which are respectively provided thereon with a red color barrier, a green color barrier, and a blue color barrier. In at least one of the pixel unit regions, thickness of a color barrier provided on a sub-pixel region corresponding to color of a specific color barrier is larger than thickness of a color barrier provided on a sub-pixel region corresponding to color of each of other two color barriers.

Abstract: The present invention discloses a micro light-emitting diode display device comprising a substrate, micro light-emitting diodes arrayed on an upper surface of a substrate for emitting blue light, a yellow phosphor layer disposed on a light-emitting side of the micro light-emitting diodes, and a color filter layer disposed on a light-emitting side of the yellow phosphor layer. The color filter layer comprises a red filter area, a green filter area, and a light-transmitting area. The yellow phosphor layer is provided with light-transmitting holes opened to its surface at intervals, and the light-transmitting holes are directly opposite to the light-transmitting area. The present invention further provides a method of manufacturing a micro light emitting diode display device. A color display purpose is achieved, which reduces the times of transferring the light-emitting diodes, simplifies the manufacturing process, and reduces technical difficulty for transferring micro LED.

Abstract: The present invention discloses a micro light-emitting diode display device comprising a substrate, micro light-emitting diodes arrayed on an upper surface of a substrate for emitting blue light, a yellow phosphor layer disposed on a light-emitting side of the micro light-emitting diodes, and a color filter layer disposed on a light-emitting side of the yellow phosphor layer. The color filter layer comprises a red filter area, a green filter area, and a light-transmitting area. The yellow phosphor layer is provided with light-transmitting holes opened to its surface at intervals, and the light-transmitting holes are directly opposite to the light-transmitting area. The present invention further provides a method of manufacturing a micro light emitting diode display device. A color display purpose is achieved, which reduces the times of transferring the light-emitting diodes, simplifies the manufacturing process, and reduces technical difficulty for transferring micro LED.

Abstract: A photo-resistor draw device includes a photo-resistor bottle, a sealing cover arranged on an inlet of the bottle, an air tube passing through the sealing cover and being inserted within the photo-resistor bottle, and a photo-resistor draw tube. The photo-resistor bottle further includes a stirring component for stirring the photo-resistors. As the novel photo-resistor draw device includes the stirring component for preventing the high-precision photo-resistor from being subsided. Not only the stability of the color filter products may be enhanced, but also the defects may be eliminated. As such, the yield rate of the products is improved.

Abstract: A naked-eye 3D lens display device and a method for manufacturing the same are disclosed. The present disclosure relates to the technical field of 3D display, and particularly to a naked-eye 3D display technology. The technical problem that the lens of the display device in the prior art cannot be switched between 3D display mode and 2D display mode can be solved. The two electromagnetic shielding films are arranged facing each other. The frame and spacers are arranged between the two electromagnetic shielding films, and the frame and spacers and the two electromagnetic shielding films form a closed space. The electronically controlled magnetic poles are respectively arranged on two inner walls of the electromagnetic shielding films facing each other. The liquid medium is distributed in the closed space. The transparent magnetic particles are arranged in the liquid medium in the closed space. The display screen is fixed on an outer wall of either of the two electromagnetic shielding films.

Abstract: The present disclosure discloses a color film substrate and a manufacturing method thereof, increase a translucent pattern with one layer has groove structure between the substrate and the color blocking pattern, and increase the contact area between the color blocking pattern and the translucent pattern through the groove structure, by means of the contact of the translucent pattern and the substrate, thereby increasing the contact area between the color blocking pattern and the substrate, it is possible to avoid the color blocking pattern peeling, to improve the quality of the product.

Abstract: The present disclosure proposes a method of fabricating a color filter. The method includes: forming a permeable film on a glass substrate and drying the permeable film; and covering a black mask with a first hollow area, a red mask with a second hollow area, a green mask with a third hollow area, and a blue mask with a fourth hollow area on the dried permeable film successively, and only one of the four masks being covered each time; putting the permeable film covered by the masks into a particle solution corresponding to a respective color successively for forming the color filter comprising a black shielding area, a red area, a green area, and a blue area. The color filter is fabricated in a simpler manufacturing process. The thickness of the black shielding area of the color filter is accordance to the thickness of the RGB primary color area.

Abstract: The present disclosure discloses a color film substrate and a manufacturing method thereof, increase a translucent pattern with one layer has groove structure between the substrate and the color blocking pattern, and increase the contact area between the color blocking pattern and the translucent pattern through the groove structure, by means of the contact of the translucent pattern and the substrate, thereby increasing the contact area between the color blocking pattern and the substrate, it is possible to avoid the color blocking pattern peeling, to improve the quality of the product.

Abstract: A naked-eye 3D lens display device and a method for manufacturing the same are disclosed. The present disclosure relates to the technical field of 3D display, and particularly to a naked-eye 3D display technology. The technical problem that the lens of the display device in the prior art cannot be switched between 3D display mode and 2D display mode can be solved. The two electromagnetic shielding films are arranged facing each other. The frame and spacers are arranged between the two electromagnetic shielding films, and the frame and spacers and the two electromagnetic shielding films form a closed space. The electronically controlled magnetic poles are respectively arranged on two inner walls of the electromagnetic shielding films facing each other. The liquid medium is distributed in the closed space. The transparent magnetic particles are arranged in the liquid medium in the closed space. The display screen is fixed on an outer wall of either of the two electromagnetic shielding films.

Abstract: A method for manufacturing a color filter, a color filter, and a liquid crystal display panel are disclosed. The method for manufacturing the color filter comprises: coating a substrate with a first light resistance material and performing corresponding treatment, so as to form a black matrix layer with a plurality of space areas; coating said black matrix layer with a light resistance material different from said first light resistance material, performing treatment with a laser beam at predetermined positions, and then performing exposing, developing, and solidifying treatments, so as to form a color resistance layer in said space areas; and coating said color resistance layer with a conductive material to form a conductive film, thus obtaining said color filter.

Abstract: The present disclosure proposes a method of fabricating a color filter. The method includes: forming a permeable film on a glass substrate and drying the permeable film; and covering a black mask with a first hollow area, a red mask with a second hollow area, a green mask with a third hollow area, and a blue mask with a fourth hollow area on the dried permeable film successively, and only one of the four masks being covered each time; putting the permeable film covered by the masks into a particle solution corresponding to a respective color successively for forming the color filter comprising a black shielding area, a red area, a green area, and a blue area. The color filter is fabricated in a simpler manufacturing process. The thickness of the black shielding area of the color filter is accordance to the thickness of the RGB primary color area.

Abstract: An exposure method and an exposure machine according to the present disclosure, which can achieve higher exposure accuracy, belong to the technical field of display. The exposure method comprises the following steps: a mask is placed at a first position above a substrate to be exposed; a first region of a photoresist on the substrate is exposed; the mask is moved to a second position above the substrate; and a second region of the photoresist on the substrate is exposed. As a result, an overlapped region between the first region and the second region of the photoresist is exposed twice. The present disclosure is applicable to the manufacturing of a liquid crystal display device.