Abstract: A method and apparatus for analyzing a parameter of a mask plate is provided. A detection parameter of at least one mask pattern is acquired, and the detection parameter includes a deviation coordinate between a measurement coordinate of each alignment mark in a mask pattern manufactured with a mask plate and a preset coordinate of each alignment mark in a layout of the mask pattern. A direction and a vector length of a deviation vector of the deviation coordinate of each alignment mark in the mask pattern are acquired according to the detection parameter. Quality analysis data of the mask plate is generated according to the direction and the vector length of the deviation vector of each alignment mark in the mask pattern.