Patents by Inventor Jiangshan Zhao
Jiangshan Zhao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12287241Abstract: Provided are a device (4) and a method for online measuring a spectrum for a laser device. The device (4) for online measuring a spectrum for a laser device includes: a first optical path assembly (G1) and a second optical path assembly (G2), and the second optical path assembly (G2) and the first optical path assembly (G1) constitute a measurement optical path. The second optical path assembly (G2) includes: an FP etalon (15) and a grating (18). The homogenized laser beam passes through the FP etalon (15) to generate an interference fringe. The grating (18) is arranged after the FP etalon (15), or is arranged before the FP etalon (15) in the measurement optical path, and is configured to disperse the laser beam passing through the FP etalon (15).Type: GrantFiled: December 16, 2020Date of Patent: April 29, 2025Assignee: Beijing RSLaser Opto-Electroncis Technology Co., Ltd.Inventors: Guangyi Liu, Rui Jiang, Xiaoquan Han, Jiangshan Zhao, Pengfei Sha, Qingqing Yin, Hua Zhang, Xinyue Hu
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Patent number: 11971307Abstract: According to the present disclosure, there is provided a device (2) and a method for measuring a wavelength for a laser device. The device (2) for measuring a wavelength for a laser device includes: a first optical path assembly and a second optical path assembly. The first optical path assembly and the second optical path assembly constitute a laser wavelength measurement optical path. The second optical path assembly includes: an FP etalon assembly (11) and an optical classifier (13). The homogenized laser beam passes through the FP etalon assembly (11) to generate an interference fringe. The optical classifier (13) is arranged after the FP etalon assembly (11) in the laser wavelength measurement optical path, and configured to deflect the laser beam passing through the FP etalon assembly (11).Type: GrantFiled: December 11, 2020Date of Patent: April 30, 2024Assignee: Beijing RSLaserOpto-Electronics Technology Co. LtdInventors: Guangyi Liu, Rui Jiang, Xiaoquan Han, Jiangshan Zhao, Pengfei Sha, Qingqing Yin, Hua Zhang
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Publication number: 20230194348Abstract: Provided are a device (4) and a method for online measuring a spectrum for a laser device. The device (4) for online measuring a spectrum for a laser device includes: a first optical path assembly (G1) and a second optical path assembly (G2), and the second optical path assembly (G2) and the first optical path assembly (G1) constitute a measurement optical path. The second optical path assembly (G2) includes: an FP etalon (15) and a grating (18). The homogenized laser beam passes through the FP etalon (15) to generate an interference fringe. The grating (18) is arranged after the FP etalon (15), or is arranged before the FP etalon (15) in the measurement optical path, and is configured to disperse the laser beam passing through the FP etalon (15).Type: ApplicationFiled: December 16, 2020Publication date: June 22, 2023Inventors: Guangyi LIU, Rui JIANG, Xiaoquan HAN, Jiangshan ZHAO, Pengfei SHA, Qingqing YIN, Hua ZHANG, Xinyue HU
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Publication number: 20230144290Abstract: According to the present disclosure, there is provided a device (2) and a method for measuring a wavelength for a laser device. The device (2) for measuring a wavelength for a laser device includes: a first optical path assembly and a second optical path assembly. The first optical path assembly and the second optical path assembly constitute a laser wavelength measurement optical path. The second optical path assembly includes: an FP etalon assembly (11) and an optical classifier (13). The homogenized laser beam passes through the FP etalon assembly (11) to generate an interference fringe. The optical classifier (13) is arranged after the FP etalon assembly (11) in the laser wavelength measurement optical path, and configured to deflect the laser beam passing through the FP etalon assembly (11).Type: ApplicationFiled: December 11, 2020Publication date: May 11, 2023Inventors: Guangyi LIU, Rui JIANG, Xiaoquan HAN, Jiangshan ZHAO, Pengfei SHA, Qingqing YIN, Hua ZHANG
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Publication number: 20180212397Abstract: The present disclosure provides an excimer laser system. A master oscillator chamber may generate laser pulses with a narrowed line width and a small energy by means of a line width narrowing module, as a seed light. The seed light is refracted by a master oscillator wavefront engineering box and then incident into a power amplifier chamber through a beam splitting system. The beam splitting system, a first high reflectance mirror, a second high reflectance mirror and a third high reflectance mirror may constitute a quadrilateral annular optical path, The power amplifier chamber may have a first pair of Brewster windows and a second pair of Brewster windows, wherein the first pair of Brewster windows is located in a first optical path of the annular optical path along with a discharging electrode of the power amplifier chamber, and the second pair of Brewster windows is located in a second optical path of annular optical path which is parallel to a first amplification optical path.Type: ApplicationFiled: July 22, 2015Publication date: July 26, 2018Inventors: Yu WANG, Yi ZHOU, Xingliang SONG, Pengfei SHA, Yuanyuan FAN, Jiangshan ZHAO, Haiyan SHI, Hui LI, Jinbin DING, Yaoying SHAN, Qian WANG, Qianwei CAI, Zhuojun PENG
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Patent number: 9350135Abstract: The present disclosure proposes a flow guide device for a discharge cavity having a symmetrical configuration and including two pairs of electrodes; the flow guide device comprises two rotors which correspond to one pair of the two pairs of electrodes, respectively, installed positions of which are symmetrical about a symmetrical plane of the discharge cavity and is beneath the electrodes, a rotational axis of which is parallel to an axial direction of the electrodes which is parallel to a base plane of the discharge cavity, and the two rotors have opposite rotation directions and identical rotation speeds. The flow guide device further comprises a spoiler plate and a flow guide plate so that the discharge gas flow passes through the discharge cavity in a manner of high speed and uniform cycling when flowing through the discharge region. Thus, the discharge quality is guaranteed so as to improve the energy and reliability of the laser.Type: GrantFiled: February 7, 2013Date of Patent: May 24, 2016Assignee: ACADEMY OF OPTO-ELECTRONICS, CHINESE ACADEMY OF SCIENCESInventors: Bin Liu, Jinbin Ding, Kuibo Wang, Yu Wang, Yi Zhou, Jiangshan Zhao
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Patent number: 9252557Abstract: A single-cavity dual-electrode discharge cavity and an excimer laser including such a discharge cavity are disclosed. The discharge cavity may comprise a cavity body and two sets of main discharge electrodes. The cavity body may comprise a left chamber and a right chamber arranged to form a symmetric dual-chamber cavity. The left and right chambers can interface and communicate with each other at a plane of symmetry of the entire discharge cavity. The two sets of main discharge electrodes can be disposed in the left and right chambers on the upper side, respectively. According to the present disclosure, the single-cavity configuration can be used to achieve functions of dual-cavity configurations, such as MOPA, MOPO, and MOPRA. Thus, it is possible to reduce system complexities and also ensure synchronization of discharging in the discharge cavity.Type: GrantFiled: September 27, 2013Date of Patent: February 2, 2016Assignee: Academy of Opto-Electronics, Chinese Academy of SciencesInventors: Yu Wang, Yi Zhou, Jinbin Ding, Bin Liu, Lijia Zhang, Jiangshan Zhao, Pengfei Sha
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Publication number: 20150333468Abstract: The present disclosure proposes a flow guide device for a discharge cavity having a symmetrical configuration and including two pairs of electrodes; the flow guide device comprises two rotors which correspond to one pair of the two pairs of electrodes, respectively, installed positions of which are symmetrical about a symmetrical plane of the discharge cavity and is beneath the electrodes, a rotational axis of which is parallel to an axial direction of the electrodes which is parallel to a base plane of the discharge cavity, and the two rotors have opposite rotation directions and identical rotation speeds. The flow guide device further comprises a spoiler plate and a flow guide plate so that the discharge gas flow passes through the discharge cavity in a manner of high speed and uniform cycling when flowing through the discharge region. Thus, the discharge quality is guaranteed so as to improve the energy and reliability of the laser.Type: ApplicationFiled: February 7, 2013Publication date: November 19, 2015Inventors: Bin LIU, Jinbin DING, Kuibo WANG, Yu WANG, Yi ZHOU, Jiangshan ZHAO
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Publication number: 20140023101Abstract: A single-cavity dual-electrode discharge cavity and an excimer laser including such a discharge cavity are disclosed. The discharge cavity may comprise a cavity body and two sets of main discharge electrodes. The cavity body may comprise a left chamber and a right chamber arranged to form a symmetric dual-chamber cavity. The left and right chambers can interface and communicate with each other at a plane of symmetry of the entire discharge cavity. The two sets of main discharge electrodes can be disposed in the left and right chambers on the upper side, respectively. According to the present disclosure, the single-cavity configuration can be used to achieve functions of dual-cavity configurations, such as MOPA, MOPO, and MOPRA. Thus, it is possible to reduce system complexities and also ensure synchronization of discharging in the discharge cavity.Type: ApplicationFiled: September 27, 2013Publication date: January 23, 2014Applicant: Academy of Opto-Electronics, Chinese Academy of SciencesInventors: Yu Wang, Yi Zhou, Jinbin Ding, Bin Liu, Lijia Zhang, Jiangshan Zhao, Pengfei Sha