Patents by Inventor Jian Hua Ma

Jian Hua Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of Increasing Enzyme Stability and Activity for Pulp and Paper Production
    Publication number: 20150267349
    Abstract: Wood pulp is treated with an esterase formulation in combination with a metal ion or cationic polymer to increase the stability or activity or both of esterase enzymes at high temperature, or at extreme pH ranges of acidic and alkaline conditions. The treatment by esterase together with metals ion or cationic polymer can be used to treat pitch containing pulp at high temperatures prior to, during or after refining of wood chip/pulp, in order to enhance the reduction of pitch problems and facilitate in the manufacture of paper.
    Type: Application
    Filed: June 8, 2015
    Publication date: September 24, 2015
    Inventors: Xiang H. Wang, Jian Hua Ma, Chengliang Jiang, Howard Kaplan
  • Method of increasing enzyme stability and activity for pulp and paper production
    Patent number: 9051692
    Abstract: Wood pulp is treated with an esterase formulation in combination with a metal ion or cationic polymer to increase the stability or activity or both of esterase enzymes at high temperature, or at extreme pH ranges of acidic and alkaline conditions. The treatment by esterase together with metals ion or cationic polymer can be used to treat pitch containing pulp at high temperatures prior to, during or after refining of wood chip/pulp, in order to enhance the reduction of pitch problems and facilitate in the manufacture of paper.
    Type: Grant
    Filed: January 6, 2009
    Date of Patent: June 9, 2015
    Assignee: Enzymatic Deinking Technologies, L.L.C.
    Inventors: Xiang H. Wang, Jian Hua Ma, Chengliang Jiang, Howard Kaplan
  • METHOD OF INCREASING ENZYME STABILITY AND ACTIVITY FOR PULP AND PAPER PRODUCTION
    Publication number: 20100170646
    Abstract: Wood pulp is treated with an esterase formulation in combination with a metal ion or cationic polymer to increase the stability or activity or both of esterase enzymes at high temperature, or at extreme pH ranges of acidic and alkaline conditions. The treatment by esterase together with metals ion or cationic polymer can be used to treat pitch containing pulp at high temperatures prior to, during or after refining of wood chip/pulp, in order to enhance the reduction of pitch problems and facilitate in the manufacture of paper.
    Type: Application
    Filed: January 6, 2009
    Publication date: July 8, 2010
    Inventors: Xiang H. Wang, Jian Hua Ma, Chengliang Jiang, Howard Kaplan
  • Chemical vapor deposition (CVD) calibration method providing enhanced uniformity
    Patent number: 6926920
    Abstract: A chemical vapor deposition (CVD) method for forming a microelectronic layer provides a source material dispensing nozzle employed within a chemical vapor deposition (CVD) apparatus which is employed within the chemical vapor deposition (CVD) method. The source material dispensing nozzle is calibrated to provide a calibrated source material dispensing nozzle. The calibrated source material dispensing nozzle is employed within the chemical vapor deposition (CVD) apparatus while employing the chemical vapor deposition (CVD) method for forming a chemical vapor deposition (CVD) deposited microelectronic layer upon the substrate positioned within the chemical vapor deposition (CVD) apparatus.
    Type: Grant
    Filed: June 11, 2002
    Date of Patent: August 9, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Shi Sheng Jang, Jian Hua Ma, Ko Chin Chung, Cheng Chung Wang
  • Chemical vapor deposition (CVD) method and calibration apparatus providing enhanced uniformity
    Publication number: 20030226502
    Abstract: Within a chemical vapor deposition (CVD) method for forming a microelectronic layer there is provided a source material dispensing nozzle employed within a chemical vapor deposition (CVD) apparatus which is employed within the chemical vapor deposition (CVD) method for forming the chemical vapor deposition (CVD) deposited microelectronic layer upon a substrate positioned within the chemical vapor deposition (CVD) apparatus. There is then calibrated the source material dispensing nozzle to provide a calibrated source material dispensing nozzle. There is then employed the calibrated source material dispensing nozzle within the chemical vapor deposition (CVD) apparatus while employing the chemical vapor deposition (CVD) method for forming the chemical vapor deposition (CVD) deposited microelectronic layer upon the substrate positioned within the chemical vapor deposition (CVD) apparatus.
    Type: Application
    Filed: June 11, 2002
    Publication date: December 11, 2003
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shi Sheng Jang, Jian Hua Ma, Ko Chin Chung, Cheng Chung Wang