Patents by Inventor Jianjiang Lu

Jianjiang Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7820587
    Abstract: A hydrogen detector with a porous layer of alumina. Pores with average pore diameters in the range of from about 10 to about 200 nanometers (nms) and average pore depths in the range of from about 10 to about 1000 nms have Pd nanoparticles in the pores forming a film. Electrodes on the Pd film measure changes in electrical resistance of the Pd film in the presence of hydrogen. Pd may be in the form of nanotubes. The alumina is anodized for various times to form the nanowalls or pores and vary the pore depths.
    Type: Grant
    Filed: November 28, 2006
    Date of Patent: October 26, 2010
    Assignee: UChicago Argonne, LLC
    Inventors: Hsien-Hau Wang, Jianjiang Lu, Shufang Yu
  • Publication number: 20070151850
    Abstract: A hydrogen detector with a porous layer of alumina. Pores with average pore diameters in the range of from about 10 to about 200 nanometers (nms) and average pore depths in the range of from about 10 to about 1000 nms have Pd nanoparticles in the pores forming a film. Electrodes on the Pd film measure changes in electrical resistance of the Pd film in the presence of hydrogen. Pd may be in the form of nanotubes. The alumina is anodized for various times to form the nanowalls or pores and vary the pore depths.
    Type: Application
    Filed: November 28, 2006
    Publication date: July 5, 2007
    Applicant: UChicago Argonne, LLC
    Inventors: Hsien-Hau Wang, Jianjiang Lu, Shufang Yu