Patents by Inventor Jianjun JIA

Jianjun JIA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Simulation of lithography using multiple-sampling of angular distribution of source radiation
    Patent number: 11506984
    Abstract: A method including: determining a first simulated partial image formed, by a lithographic projection apparatus, from a first radiation portion propagating along a first group of one or more directions; determining a second simulated partial image formed, by the lithographic projection apparatus, from a second radiation portion propagating along a second group of one or more directions; and determining an image by incoherently adding the first partial image and the second partial image, wherein the first group of one or more directions and the second group of one or more directions are different.
    Type: Grant
    Filed: May 13, 2016
    Date of Patent: November 22, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Rafael C. Howell, Jianjun Jia
  • Pattern placement error aware optimization
    Patent number: 10386727
    Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors.
    Type: Grant
    Filed: March 3, 2015
    Date of Patent: August 20, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Jianjun Jia, Xiaofeng Liu, Cuiping Zhang
  • SIMULATION OF LITHOGRAPHY USING MULTIPLE-SAMPLING OF ANGULAR DISTRIBUTION OF SOURCE RADIATION
    Publication number: 20180120709
    Abstract: A method including: determining a first simulated partial image formed, by a lithographic projection apparatus, from a first radiation portion propagating along a first group of one or more directions; determining a second simulated partial image formed, by the lithographic projection apparatus, from a second radiation portion propagating along a second group of one or more directions; and determining an image by incoherently adding the first partial image and the second partial image, wherein the first group of one or more directions and the second group of one or more directions are different.
    Type: Application
    Filed: May 13, 2016
    Publication date: May 3, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen HSU, Rafael C. HOWELL, Jianjun JIA
  • PATTERN PLACEMENT ERROR AWARE OPTIMIZATION
    Publication number: 20170082927
    Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors.
    Type: Application
    Filed: March 3, 2015
    Publication date: March 23, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen HSU, Jianjun JIA, Xiaofeng LIU, Youping ZHANG