Patents by Inventor JIANLONG ZHAO

JIANLONG ZHAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11644750
    Abstract: Provided is a negative photoresist used for a semiconductor encapsulation process, belonging to the technical field of semiconductor processing. A negative photoresist formulation includes 40-65 wt % of modified epoxy acrylate, 3-6 wt % of photosensitizer, 100-1000 ppm of leveling agent, and the remainder of solvent; the leveling agent is a solution of a 7:3 mass ratio of polydimethylsiloxane copolymer having a molecular weight of 3000-6000 and propylene glycol monomethyl ether acetate. If the negative photoresist is coated at a thickness of about 50 um, the coating uniformity can be controlled to below 5%, ensuring the quality of exposure such that the thickness of electroplated copper meets requirements.
    Type: Grant
    Filed: December 11, 2019
    Date of Patent: May 9, 2023
    Assignee: Jiangsu Aisen Semiconductor Material Co., Ltd.
    Inventors: Wensheng Xiang, Kun Zhu, Lan Lu, Bing Zhang, Jianlong Zhao
  • Publication number: 20210018838
    Abstract: Provided is a negative photoresist used for a semiconductor encapsulation process, belonging to the technical field of semiconductor processing. A negative photoresist formulation includes 40-65 wt % of modified epoxy acrylate, 3-6 wt % of photosensitizer, 100-1000 ppm of leveling agent, and the remainder of solvent; the leveling agent is a solution of a 7:3 mass ratio of polydimethylsiloxane copolymer having a molecular weight of 3000-6000 and propylene glycol monomethyl ether acetate. If the negative photoresist is coated at a thickness of about 50 um, the coating uniformity can be controlled to below 5%, ensuring the quality of exposure such that the thickness of electroplated copper meets requirements.
    Type: Application
    Filed: December 11, 2019
    Publication date: January 21, 2021
    Applicant: JIANGSU AISEN SEMICONDUCTOR MATERIAL CO., LTD.
    Inventors: Wensheng Xiang, Kun Zhu, Lan Lu, Bing Zhang, Jianlong Zhao
  • Publication number: 20200406307
    Abstract: The invention relates to a twelve-inch and eight-inch compatible furnace tube washing tank mechanism and a furnace tube washing tank device. A driving wheel is arranged at the upper part of a support frame; a first gear on the driving wheel is engaged with a second gear of a driven wheel; two sides of a third gear of the driven wheel are respectively engaged with a fourth gear of a first transmission shaft. The twelve-inch and eight-inch compatible furnace tube washing tank mechanism is compatible with a variety of specifications and is capable of improving the efficiency and reducing the cost.
    Type: Application
    Filed: May 26, 2020
    Publication date: December 31, 2020
    Inventors: LIQIANG WANG, LINHAI GE, SHUANGSHENG DING, JIE LI, JIANLONG ZHAO