Abstract: The present disclosure provides data processing methods and apparatuses, an electronic device and a storage medium. The method includes: obtaining a product sample set; obtaining combination features in specified dimensions of the product sample set by processing a second parameter based on a preset dimension reduction algorithm; obtaining influence scores respectively for the combination features in specified dimensions based on a first parameter and the combination features in specified dimensions; obtaining at least one combination feature ranked top by sorting the combination features based on the influence scores, and taking a raw parameter corresponding to the at least one combination feature as a cause of the product defect.

Abstract: Provided are a method of verifying process data of a display panel, a device, a storage medium, and a product, which relates to a field of process verification technology. The method of verifying the process data of the display panel includes: generating, based on design data of a process of the display panel, simulation process data for performing the process; performing, by using a process model, a simulation of performing the process based on the simulation process data; and verifying, by using a measurement model, whether the simulation process data is applicable to actual production based on the simulation. The process model is constructed based on actual process data generated in an actual manufacturing process of the display panel, and the measurement model is constructed based on actual process data and actual measurement data which are generated in the actual manufacturing process of the display panel.

Abstract: The present disclosure provides a method for processing defect information of a product, which includes the following steps of: acquiring defect information on a current film layer and defect information on historical film layers; determining whether defect information exists at a target location of the historical film layer if defect information exists at a target location of the current film layer; if defect information exists for a corresponding location to the target location in at least one of the historical film layers, deleting the defect information detected at the target location in the current film layer; and if no defect information exists for the target location in any of the historical film layers, retaining the defect information detected at the target location in the current film layer.

Abstract: The present disclosure discloses a silicon nanowire chip and silicon nanowire chip-based mass spectrometry detection method. The detection method includes the following steps: step 1 of manufacturing a silicon nanowire chip, comprising: subjecting a monocrystalline silicon wafer to a surface washing pretreatment, a metal-assisted etching and a post-alkali etching to obtain a silicon nanowire chip with a tip, and performing a surface chemical modification or a nanomaterial modification on the silicon nanowire chip; step 2 of evaluating mass spectrometry performance of the silicon nanowire chip; and step 3 of performing a tip-contact sampling and in-situ ionization mass spectrometry detection.

Abstract: A data processing method includes: acquiring sample data of each sample of samples produced within a preset time period, the sample data including a value, which is acquired at each acquisition time, of a device parameter of a device through which the sample passes, and a test result of the sample; dividing sample data of the samples into data of positive samples and data of negative samples according to test results of the samples; determining a sample segment point of each sample according to values of the device parameter, so as to obtain N value groups of target values corresponding to each sample; and determining a related quantized value according to a difference between an M-th value group of a positive sample and an M-th value group of a negative sample.

Abstract: A data processing method includes: obtaining a defect type of a sample set in response to a first input of a user on a first interface, the sample set including samples, each sample having a first parameter used to represent a defect degree of the sample with regard to the defect type and a second parameter used to represent device informations of sample production devices through which the sample passes; calculating yield purity indexes of sample production devices on the samples based on first parameters and second parameters of the samples, so as to obtain influencing parameters of the sample production devices, an influencing parameter of each sample production device being used to represent an influence degree to which the sample production device affects an occurrence of the defect type on the samples; and displaying the influencing parameters of the sample production devices on a second interface.

Abstract: A data processing method, includes: obtaining sample data in response to a user's input operation on a graphical interface, the sample data including characteristic data and detection data of samples; displaying a sample distribution diagram on the graphical interface based on the sample data; obtaining a focus threshold used for classifying positive and negative samples, the focus threshold being determined based on the detection data of the samples; displaying a mark of the focus threshold in the sample distribution diagram on the graphical interface; distinguishing data display effects of the positive and negative samples based on the focus threshold; and determining a cause of abnormality of the samples based on the positive and negative samples.

Abstract: A data processing method is disclosed, the method comprising: after data synchronization, obtaining data offset of synchronous data related to a data integration task to be performed, the data offset representing deviation of the synchronous data from corresponding source data; determining whether the synchronous data is complete based on the data offset; in response to the synchronous data being complete, performing the data integration task to the synchronous data.

Abstract: The present disclosure provides a method for processing defect information of a product, which includes the following steps of: acquiring defect information on a current film layer and defect information on historical film layers; determining whether defect information exists at a target location of the historical film layer if defect information exists at a target location of the current film layer; if defect information exists for a corresponding location to the target location in at least one of the historical film layers, deleting the defect information detected at the target location in the current film layer; and if no defect information exists for the target location in any of the historical film layers, retaining the defect information detected at the target location in the current film layer.

Abstract: Provided are a method of production scheduling for a product, including: acquiring basic data for performing a production scheduling for the product; determining at least one production process from a plurality of production processes of the product as a bottleneck process according to the basic data; performing the production scheduling for the product using a linear programming solution model to obtain a first scheduling result of the product; merging a plurality of first entries corresponding to same products having production dates falling within a same time range into a second entry to obtain a plurality of second entries, wherein each of the second entries includes a production quantity of a same product in a time range; and acquiring orders corresponding to each product and sorting the orders of the product according to at least one of an order delivery date and an order priority to obtain an order sorting result.

Abstract: A data processing method, comprising: acquiring a production record corresponding to each sample of a plurality of samples, the production record including process information, a production time corresponding to the process information, and an index value; determining a high-incidence time period of defects according to index values and production times corresponding to the process information in acquired production records of a plurality of samples; determining an influence degree of the process information on sudden defect according to the high-incidence time period of defects and the acquired production records.

Abstract: A data management platform for intelligently managing data is provided. The data management platform includes an ETL module configured to extract, cleanse, transform, or load data; a data lake configured to store a first group of data formed by extracting raw data from a plurality of data sources by the ETL module; a data warehouse configured to store a second group of data formed by cleansing and standardizing on the first group of data; a general data layer configured to store a third group of data formed by subjecting the second group of data to data fusion; and a data mart configured to store a fourth group of data formed by transforming the third group of data by the ETL module. The general data layer is a distributed data storage storing information available for querying. The data mart is a database of NoSQL type storing information available for computational processing.

Abstract: A universal nanochip for mass spectrometry analysis and preparing method and application of the same, relates to a technical field of mass spectrometry analysis. A main material of the nanochip is a silicon-based semiconductor material, array-type spotting wells are distributed at a surface of the main material, and an inner surface of the spotting well is of a nanostructure; the surface of the main material has a regional hydrophobic modification, and inside the array-type spotting well is a hydrophilic region and outside the spotting well is a hydrophobic region; or outside the array-type spotting well is a hydrophilic region and inside the spotting well is a hydrophobic region. The nanostructure can extract molecules on a surface of a biological tissue sample to be tested, and improves laser energy absorption and utilization, thereby improving ionization efficiency and enhancing mass spectrum signals. The universal nanochip can be widely applied to clinical inspection.

Abstract: A method for querying a product history is disclosed. The method includes receiving a product query request including at least one product query parameter for a target product to a product graph database that stores a relational map constructed based on a manufacturing process of the target product and describing entities including product entities and manufacturing entities and entity relations therebetween involved in the manufacturing process, querying the product graph database according to the product query parameter to obtain product history data of the target product by searching for a product entity corresponding to the target product as a target product entity in the relational map according to the parameter, searching for associated manufacturing entities of the target product entity according to the entity relations, obtaining the product history data based on the associated manufacturing entities, and sending a notification message to notify obtained product history data.

Abstract: A data processing method includes: obtaining a defect type of a sample set in response to a first input of a user on a first interface, the sample set including samples, each sample having a first parameter used to represent a defect degree of the sample with regard to the defect type and a second parameter used to represent device informations of sample production devices through which the sample passes; calculating yield purity indexes of sample production devices on the samples based on first parameters and second parameters of the samples, so as to obtain influencing parameters of the sample production devices, an influencing parameter of each sample production device being used to represent an influence degree to which the sample production device affects an occurrence of the defect type on the samples; and displaying the influencing parameters of the sample production devices on a second interface.

Abstract: A high-capacity and long-life negative electrode hydrogen storage material of La—Mg—Ni type for secondary rechargeable nickel-metal hydride battery and a method for preparing the same are provided in the present invention. A chemical formula of the negative electrode hydrogen storage material of La—Mg—Ni type is La1-x-yRexMgy(Ni1-a-bAlaMb)z, wherein Re is at least one of Ce, Pr, Nd, Sm, Y, and M is at least one of Ti, Cr, Mo, Nb, Ga, V, Si, Zn, Sn; 0?x?0.10, 0.3?y?0.5, 0<a?0.05, 0?b?0.02, 2.3?z<3.0. The negative electrode hydrogen storage material of La—Mg—Ni type in the present invention has excellent charge-discharge capacity and cycle life. The negative electrode hydrogen storage material of La—Mg—Ni type can be applied in both common secondary rechargeable nickel-metal hydride battery and secondary rechargeable nickel-metal hydride battery with ultra-low self-discharge and long-term storage performance.

Abstract: The disclosure provides a preparation method for a graphene material-based resistive gas sensor array and an application method thereof. The preparation method includes: adding a metal salt solution to a graphene oxide solution to obtain a mixed suspension, adjusting a pH of the mixed suspension and dispersing the mixed suspension under ultrasound, incubating the mixed suspension on a shaker, then washing it with deionized water followed by dispersing it in a deionized water to obtain metal ion-induced graphene oxide self-assembled suspension, and preparing a plurality of parts of the suspension by varying the preparation conditions; and adding the plurality of parts of metal ion-induced graphene oxide self-assembled suspension respectively to fingers of a multi-site interdigitated electrode array, and drying naturally, reducing the plurality of parts of the suspension at 60 to 120° C. for 3 to 30 min. The disclosure achieves uniform loading of a graphene material on a substrate.

Abstract: A method for speech synthesis includes obtaining text to be synthesized and an identifier of a speaker, the text being written in a first language; obtaining pronunciation information of each character in the text; generating linguistic features of the text by performing feature extraction on the pronunciation information of each character in the text based on the first language; and obtaining a target speech in a second language other than the first language, by performing speech synthesis based on the linguistic features and the identifier of the speaker.

Abstract: A data management platform for intelligently managing data is provided. The data management platform includes an ETL module configured to extract, cleanse, transform, or load data; a data lake configured to store a first group of data formed by extracting raw data from a plurality of data sources by the ETL module; a data warehouse configured to store a second group of data formed by cleansing and standardizing on the first group of data; a general data layer configured to store a third group of data formed by subjecting the second group of data to data fusion; and a data mart configured to store a fourth group of data formed by transforming the third group of data by the ETL module. The general data layer is a distributed data storage storing information available for querying. The data mart is a database of NoSQL type storing information available for computational processing.

Abstract: The present disclosure discloses a silicon nanowire chip and silicon nanowire chip-based mass spectrometry detection method. The detection method includes the following steps: step 1 of manufacturing a silicon nanowire chip, comprising: subjecting a monocrystalline silicon wafer to a surface washing pretreatment, a metal-assisted etching and a post-alkali etching to obtain a silicon nanowire chip with a tip, and performing a surface chemical modification or a nanomaterial modification on the silicon nanowire chip; step 2 of evaluating mass spectrometry performance of the silicon nanowire chip; and step 3 of performing a tip-contact sampling and in-situ ionization mass spectrometry detection.