Patents by Inventor Jianmiu Qiao

Jianmiu Qiao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for cleaning plasma etch chamber structures
    Patent number: 6841008
    Abstract: A method for cleaning a plasma reactor clamber part (100) may include dipping the chamber part in a solvent (102) that may dissolve a material that has been redistributed on the chamber part by a reactive plasma. A chamber part may then be rinsed (104), ultrasonically cleaned (106) in a ultrasonic cleaning liquid, and then rinsed again with a liquid that may evaporate at a lower temperature than an ultrasonic cleaning liquid (108). A chamber part may then be blown dry (110) and baked (112). In addition, or alternatively, a method may also include plasma cleaning a chamber part (202).
    Type: Grant
    Filed: July 17, 2000
    Date of Patent: January 11, 2005
    Assignee: Cypress Semiconductor Corporation
    Inventors: Walter G. Branco, Jianmiu Qiao