Patents by Inventor Jiann-Sheng Chang

Jiann-Sheng Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240084040
    Abstract: The present invention provides antibody or the antigen-binding portion thereof bind to carbohydrate antigen, such as Globo series antigens (e.g. Globo H, SSEA-4 or SSEA-3). Also disclosed herein are pharmaceutical compositions and methods for the inhibition of cancer cells in a subject in need thereof. The pharmaceutical compositions comprise an antibody or an antigen-binding portion thereof and at least one pharmaceutically acceptable carrier.
    Type: Application
    Filed: February 9, 2022
    Publication date: March 14, 2024
    Inventors: Jiann-Shiun LAI, Hui-Wen CHANG, Yin-Chieh KUO, Chi-Sheng HSIA, Woan Eng CHAN, Ming-Tain LAI
  • Patent number: 8691706
    Abstract: System and method for reducing substrate warpage in a thermal process. An embodiment comprises pre-heating a substrate in a loadlock chamber before performing the thermal process of the substrate. After the thermal process, the substrate is cooled down in a loadlock chamber. The pre-heat and cool-down process reduces the warpage of the substrate caused by the differences in coefficients of thermal expansion (CTEs) of the materials that make up the substrate.
    Type: Grant
    Filed: January 12, 2012
    Date of Patent: April 8, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chen-Hua Yu, Wen-Chih Chiou, Fang Wen Tsai, Kuang-Wei Cheng, Jiann Sheng Chang, Yi Chou Lai, Jiung Wu
  • Publication number: 20130183831
    Abstract: System and method for reducing substrate warpage in a thermal process. An embodiment comprises pre-heating a substrate in a loadlock chamber before performing the thermal process of the substrate. After the thermal process, the substrate is cooled down in a loadlock chamber. The pre-heat and cool-down process reduces the warpage of the substrate caused by the differences in coefficients of thermal expansion (CTEs) of the materials that make up the substrate.
    Type: Application
    Filed: January 12, 2012
    Publication date: July 18, 2013
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chen-Hua Yu, Wen-Chih Chiou, Fang Wen Tsai, Kuang-Wei Cheng, Jiann Sheng Chang, Yi Chou Lai, Jiung Wu
  • Patent number: 6896304
    Abstract: An automatic sensing wafer blade for picking up wafers that is equipped with a sensor capable of self-diagnosing potential failure conditions of the blade and a method for using the wafer blade are described. The automatic sensing wafer blade is equipped with a V-shaped seal ring on a top surface, and a sensor of either a limit switch or a capacitance sensor for sensing the presence or absence of a wafer on top of the wafer blade. The automatic sensing wafer blade is further capable of self-diagnosing any potential failure conditions of the function of the wafer blade due to contaminating particles, or contaminating liquid on the wafer surface, or due to an aged or malfunctioning seal ring on top of the wafer blade.
    Type: Grant
    Filed: September 3, 2002
    Date of Patent: May 24, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hsiao-Yi Li, Chin-Hsin Peng, Cheng-Shun Chan, Jiann-Sheng Chang, Chung-Hao Tseng, Chien-Ling Huang
  • Publication number: 20040041421
    Abstract: An automatic sensing wafer blade for picking up wafers that is equipped with a sensor capable of self-diagnosing potential failure conditions of the blade and a method for using the wafer blade are described. The automatic sensing wafer blade is equipped with a V-shaped seal ring on a top surface, and a sensor of either a limit switch or a capacitance sensor for sensing the presence or absence of a wafer on top of the wafer blade. The automatic sensing wafer blade is further capable of self-diagnosing any potential failure conditions of the function of the wafer blade due to contaminating particles, or contaminating liquid on the wafer surface, or due to an aged or malfunctioning seal ring on top of the wafer blade.
    Type: Application
    Filed: September 3, 2002
    Publication date: March 4, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Li Hsiao, Chin-Hsin Peng, Cheng-Shun Chan, Jiann-Sheng Chang, Chung-Hao Tseng, Chien-Ling Huang