Patents by Inventor Jianping Zou
Jianping Zou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11629052Abstract: The present disclosure belongs to the field of single-atom catalytic degradation of refractory organic pollutants, and provides a single-atom catalyst for activation of persulfate to generate pure singlet oxygen (1O2) as well as a preparation method and an application thereof. The single-atom catalyst of the present disclosure includes supports and single iron atoms loaded on the support; the supports are graphitic carbon nitride nanosheets; the single iron atoms are bound to the supports in the form of a Fe—N4 coordination structure. The present disclosure employs graphitic carbon nitride nanosheets as the supports, so that the single iron atoms have a uniform surrounding environment and the persulfate is only converted into 1O2 when being activated; 1O2 has good selectivity and anti-interference ability, so the single-atom catalyst provided in the present disclosure may have excellent selectivity and anti-interference performance in the degradation of organic pollutants.Type: GrantFiled: June 28, 2021Date of Patent: April 18, 2023Assignee: Nanchang Hangkong UniversityInventors: Jianping Zou, Longshuai Zhang, Xunheng Jiang, Zi'ai Zhong, Feiyao Wu, Wenjing Luo, Shunpeng Zhu, Ruilin Long, Haiyan Liu
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Publication number: 20220315425Abstract: The present disclosure belongs to the field of single-atom catalytic degradation of refractory organic pollutants, and provides a single-atom catalyst for activation of persulfate to generate pure singlet oxygen (1O2) as well as a preparation method and an application thereof. The single-atom catalyst of the present disclosure includes supports and single iron atoms loaded on the support; the supports are graphitic carbon nitride nanosheets; the single iron atoms are bound to the supports in the form of a Fe—N4 coordination structure. The present disclosure employs graphitic carbon nitride nanosheets as the supports, so that the single iron atoms have a uniform surrounding environment and the persulfate is only converted into 1O2 when being activated; 1O2 has good selectivity and anti-interference ability, so the single-atom catalyst provided in the present disclosure may have excellent selectivity and anti-interference performance in the degradation of organic pollutants.Type: ApplicationFiled: June 28, 2021Publication date: October 6, 2022Applicant: Nanchang Hangkong UniversityInventors: Jianping ZOU, Longshuai ZHANG, Xunheng JIANG, Zi'ai ZHONG, Feiyao WU, Wenjing LUO, Shunpeng ZHU, Ruilin LONG, Haiyan LIU
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Patent number: 11401288Abstract: A method for preparing a ?-amino phosphonic acid derivative includes: dissolving N-(arylvinyl)benzamide, dialkyl phosphite, manganese acetate, and potassium carbonate in a solvent and reacting at room temperature to obtain (2-benzamido-1-arylvinyl)dialkyl-phosphonate derivative; and hydrolyzing (2-benzamido-1-arylethyl)dialkylphosphonate derivative to obtain ?-amino phosphonic acid derivative. The N-(arylvinyl)benzamide derivative is used as starting material. The raw materials are easy to obtain and are of many different types. A method of preparing ?-aminophosphonic acid derivative includes: dissolving N-(arylvinyl)benzamide, dialkyl phosphite, manganese acetate and potassium carbonate in a solvent, reacting at room temperature to obtain (2-benzamide-1-arylvinyl) dialkyl phosphonate derivative, and then reducing and hydrolyzing the compound to obtain ?-aminophosphonic acid derivative.Type: GrantFiled: January 12, 2021Date of Patent: August 2, 2022Assignee: SOOCHOW UNIVERSITYInventors: Jianping Zou, Dongliang Zhang, Chengkun Li, Guoyu Zhang, Zekun Tao
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Patent number: 11126172Abstract: Described herein are methods, apparatuses, and systems for reducing equipment repair time. In one embodiment, a computer implemented method includes collecting test substrate data or other metrology data and fault detection data for maintenance recovery of at least one manufacturing tool in a manufacturing facility and determining a relationship between tool parameter settings for the manufacturing tool and the test substrate data. The method further includes utilizing virtual metrology predictive algorithms and at least some collected data to obtain a metrology prediction and applying multivariate run-to-run (R2R) control modeling to obtain a state estimation including a current operating region of the at least one manufacturing tool. Applying multivariate run-to-run (R2R) control modeling to obtain tool parameter adjustments for at least one manufacturing tool to reduce maintenance recovery time and to reduce requalification time.Type: GrantFiled: August 12, 2019Date of Patent: September 21, 2021Assignee: Applied Materials, Inc.Inventors: Jimmy Iskandar, Jianping Zou, Parris C. M. Hawkins, James Moyne
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Publication number: 20210221831Abstract: Disclosed are a trifluoromethyl alkenylphosphonate derivative and preparation method therefor. The preparation method comprises the following steps: dissolving an acetylene derivative, an iodine compound, and a phosphorus reagent in a solvent for reaction at the temperature from the room temperature to 100° C. to obtain the trifluoromethyl alkenylphosphonate derivative. In the present invention, the acetylene derivative is used as a starting material, and the raw materials are easily available and diversified; products obtained by using the method of the present invention have various types and can be directly used and also used for other further reactions; moreover, the method disclosed in the present invention has the advantages of short steps, mild reaction conditions, simple reaction operation and post-treatment processes, and high yield, and is suitable for large-scale production.Type: ApplicationFiled: April 9, 2021Publication date: July 22, 2021Inventors: Jianping ZOU, Chengkun LI, Dongliang ZHANG, Zekun TAO, Jianan LI
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Patent number: 11022968Abstract: Described herein are methods, apparatuses, and systems for reducing equipment repair time. Disclosed methods include collecting data including test substrate data or other metrology data and fault detection data for maintenance recovery of at least one manufacturing tool in a manufacturing facility. Disclosed methods include determining a relationship between tool parameter settings for the at least one manufacturing tool and at least some collected data including the test substrate data. The disclosure includes utilizing virtual metrology predictive algorithms and at least some collected data to obtain a metrology prediction and applying multivariate run-to-run (R2R) control modeling to obtain a tool parameter adjustment for at least one target parameter for the at least one manufacturing tool. The disclosure further includes applying the R2R control modeling to obtain tool parameter adjustments for at least one manufacturing tool.Type: GrantFiled: August 12, 2019Date of Patent: June 1, 2021Assignee: Applied Materials, Inc.Inventors: Jimmy Iskandar, Jianping Zou, Parris C. M. Hawkins, James Moyne
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Publication number: 20210130377Abstract: The present invention discloses the preparation method of ?-phosphonyl-enamine derivative. The preparation method comprising the following steps: dissolving the enamine derivative, organic phosphine compound, manganese acetate and potassium carbonate in the solvent, reacting at room temperature to obtain the ?-phosphonyl-enamine derivative. The enamine derivative was as the starting material, and the raw materials are easy to obtain and a great many varieties. The various forms of the products obtained therein can be directly applied and can be used in further reactions. The reaction conditions are mild, the reaction speed is high, the reaction operation and the post-treatment process are simple, the production is convenient, and the method is suitable for large-scale production.Type: ApplicationFiled: January 11, 2021Publication date: May 6, 2021Inventors: Jianping ZOU, Dongliang ZHANG, Chengkun LI, Guoyu ZHANG, Zekun TAO
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Publication number: 20210130376Abstract: A method for preparing a ?-amino phosphonic acid derivative includes: dissolving N-(arylvinyl)benzamide, dialkyl phosphite, manganese acetate, and potassium carbonate in a solvent and reacting at room temperature to obtain (2-benzamido-1-arylvinyl)dialkyl-phosphonate derivative; and hydrolyzing (2-benzamido-1-arylethyl) dialkylphosphonate derivative to obtain ?-amino phosphonic acid derivative. The N-(arylvinyl) benzamide derivative is used as starting material. The raw materials are easy to obtain and are of many different types. A method of preparing ?-aminophosphonic acid derivative includes: dissolving N-(arylvinyl)benzamide, dialkyl phosphite, manganese acetate and potassium carbonate in a solvent, reacting at room temperature to obtain (2-benzamide-1-arylvinyl) dialkyl phosphonate derivative, and then reducing and hydrolyzing the compound to obtain ?-aminophosphonic acid derivative.Type: ApplicationFiled: January 12, 2021Publication date: May 6, 2021Inventors: Jianping ZOU, Dongliang ZHANG, Chengkun LI, Guoyu ZHANG, Zekun TAO
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Publication number: 20200004234Abstract: Described herein are methods, apparatuses, and systems for reducing equipment repair time. In one embodiment, a computer implemented method includes collecting, with a system, data including test substrate data or other metrology data and fault detection data for maintenance recovery of at least one manufacturing tool in a manufacturing facility and determining, with the system, a relationship between tool parameter settings for the at least one manufacturing tool and at least some collected data including the test substrate data. The method further includes utilizing zero or more virtual metrology predictive algorithms and at least some collected data to obtain a metrology prediction and applying multivariate run-to-run (R2R) control modeling to obtain a state estimation including a current operating region of the at least one manufacturing tool based on the test substrate data and obtain at least one tool parameter adjustment for at least one target parameter for the at least one manufacturing tool.Type: ApplicationFiled: August 12, 2019Publication date: January 2, 2020Inventors: Jimmy ISKANDAR, Jianping ZOU, Parris C.M. HAWKINS, James MOYNE
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Publication number: 20190361429Abstract: Described herein are methods, apparatuses, and systems for reducing equipment repair time. In one embodiment, a computer implemented method includes collecting, with a system, data including test substrate data or other metrology data and fault detection data for maintenance recovery of at least one manufacturing tool in a manufacturing facility and determining, with the system, a relationship between tool parameter settings for the at least one manufacturing tool and at least some collected data including the test substrate data. The method further includes utilizing zero or more virtual metrology predictive algorithms and at least some collected data to obtain a metrology prediction and applying multivariate run-to-run (R2R) control modeling to obtain a state estimation including a current operating region of the at least one manufacturing tool based on the test substrate data and obtain at least one tool parameter adjustment for at least one target parameter for the at least one manufacturing tool.Type: ApplicationFiled: August 12, 2019Publication date: November 28, 2019Inventors: Jimmy ISKANDAR, Jianping ZOU, Parris C.M. HAWKINS, James MOYNE
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Patent number: 9746841Abstract: A system and method for reducing pilot runs of run-to-run control in a manufacturing facility calculates an unbiased estimation of an independent model intercept based on a state space model associated with the manufacturing facility. A determination is made as to whether to perform a pilot run in the manufacturing facility. Upon determining that the run is to be performed, an indication that the pilot run is to be performed is generated. Pilot run data is received in response to the pilot run being performed, and the state space model is updated based on the received data.Type: GrantFiled: May 2, 2014Date of Patent: August 29, 2017Assignee: Applied Materials, Inc.Inventor: Jianping Zou
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Publication number: 20160342147Abstract: Described herein are methods, apparatuses, and systems for reducing equipment repair time. In one embodiment, a computer implemented method includes collecting, with a system, data including test substrate data or other metrology data and fault detection data for maintenance recovery of at least one manufacturing tool in a manufacturing facility and determining, with the system, a relationship between tool parameter settings for the at least one manufacturing tool and at least some collected data including the test substrate data. The method further includes utilizing zero or more virtual metrology predictive algorithms and at least some collected data to obtain a metrology prediction and applying multivariate run-to-run (R2R) control modeling to obtain a state estimation including a current operating region of the at least one manufacturing tool based on the test substrate data and obtain at least one tool parameter adjustment for at least one target parameter for the at least one manufacturing tool.Type: ApplicationFiled: May 19, 2015Publication date: November 24, 2016Inventors: Jimmy Iskandar, Jianping Zou, Parris C.M. Hawkins, James Moyne
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Publication number: 20150316916Abstract: A system and method for reducing pilot runs of run-to-run control in a manufacturing facility calculates an unbiased estimation of an independent model intercept based on a state space model associated with the manufacturing facility. A determination is made as to whether to perform a pilot run in the manufacturing facility. Upon determining that the run is to be performed, an indication that the pilot run is to be performed is generated. Pilot run data is received in response to the pilot run being performed, and the state space model is updated based on the received data.Type: ApplicationFiled: May 2, 2014Publication date: November 5, 2015Applicant: Applied Materials, Inc.Inventor: Jianping Zou
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Patent number: 8355810Abstract: A method and system for estimating context offsets for run-to-run control in a semiconductor fabrication facility is described. In one embodiment, contexts associated with a process are identified. The process has one or more threads, and each thread involves one or more contexts. A set of input-output equations describing the process is defined. Each input-output equation corresponds to a thread and includes a thread offset expressed as a summation of individual context offsets. A state-space model is created that describes an evolution of the process using the set of input-output equations. The state-space model allows to estimate individual context offsets.Type: GrantFiled: January 29, 2009Date of Patent: January 15, 2013Assignee: Applied Materials, Inc.Inventor: Jianping Zou
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Publication number: 20100191363Abstract: A method and system for estimating context offsets for run-to-run control in a semiconductor fabrication facility is described. In one embodiment, contexts associated with a process are identified. The process has one or more threads, and each thread involves one or more contexts. A set of input-output equations describing the process is defined. Each input-output equation corresponds to a thread and includes a thread offset expressed as a summation of individual context offsets. A state-space model is created that describes an evolution of the process using the set of input-output equations. The state-space model allows to estimate individual context offsets.Type: ApplicationFiled: January 29, 2009Publication date: July 29, 2010Applicant: Applied Materials, Inc.Inventor: Jianping Zou
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Patent number: 6748280Abstract: A method for a run-to-run (R2R) control system includes processing materials using a process input and producing a process output, storing the process input in a database, the storing including using a timestamp, and storing at least one measurement of the process output in the database aligned with each process input using the timestamp. The method further includes iterating over the data in the database to estimate one or more coefficients for a model, and, if one or more measurements is missing, replacing the missing measurements based on a prediction from said model. The model is updated with said coefficient estimates. The method additionally includes iterating over the data from the database to estimate a process state, and, if one or more of the measurements is missing from the database, replacing the missing measurements based on prediction from the model. The model is updated with said process state estimate.Type: GrantFiled: June 14, 2002Date of Patent: June 8, 2004Assignee: Brooks Automation, Inc.Inventors: Jianping Zou, James A. Mullins, Keith A. Edwards
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Patent number: 6725098Abstract: A method for a run-to-run (R2R) control system includes processing materials using a process input and producing a process output, storing the process input in a database, the storing including using a timestamp, storing at least one measurement of the process output in the database aligned with each process input using the timestamp, iterating over the data from the database to estimate a process state, and, if one or more of the measurements is missing from the database, predicting the missing measurements for the database based on a model, and determining an error for calculating a next process input, the error based on the data in the database.Type: GrantFiled: October 23, 2001Date of Patent: April 20, 2004Assignee: Brooks Automation, Inc.Inventors: Keith A. Edwards, Jianping Zou, James A. Mullins
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Publication number: 20030078680Abstract: A method for a run-to-run (R2R) control system includes processing materials using a process input and producing a process output, storing the process input in a database, the storing including using a timestamp, storing at least one measurement of the process output in the database aligned with each process input using the timestamp, iterating over the data from the database to estimate a process state, and, if one or more of the measurements is missing from the database, predicting the missing measurements for the database based on a model, and determining an error for calculating a next process input, the error based on the data in the database.Type: ApplicationFiled: October 23, 2001Publication date: April 24, 2003Applicant: PRI Automation, Inc.Inventors: Keith A. Edwards, Jianping Zou, James A. Mullins