Abstract: A display device is provided, including: a back plate; a plastic frame connected to the back plate; a backlight module; a privacy film on a light emitting side of the backlight module; and a dimming sheet on a side of privacy film away from the back plate, wherein the dimming sheet is configured to be capable of adjusting a viewing angle of the display device. The plastic frame includes a first surface and a side end face, the first surface is a surface of the plastic frame close to the dimming sheet, the side end face is a side face of the plastic frame close to the dimming sheet, the plastic frame further includes a chamfered portion at a transition position between the side end face and the first surface, and the chamfered portion has a rough surface that is configured for diffracting the light incident on the chamfered portion.

Abstract: The present disclosure relates to the field of epoxide resin, and more particularly to an epoxide with a low total chlorine content and no heavy metal residues, and a preparation method thereof. Disclosed is an epoxide prepared from raw materials including an unsaturated cycloaliphatic compound containing a double bond, hydrogen peroxide, an organic acid compound, a solvent and an alkaline salt; wherein a molar ratio of the organic acid compound to the unsaturated cycloaliphatic compound containing a double bond is (1-1.5):1. The obtained epoxides obtained in the present disclosure have a high purity, a high yield, a low solvent content, low chroma, and a low chlorine and metal ion content; the reaction system is simple, environmentally friendly, safe and controllable, and the production cost is low, which can meet the technical and economic requirements and are suitable for large-scale industrial production.

Abstract: A system and method for capturing resource usage information in a network for namespaces in which pods operate are described herein. A data structure specifies a topology that includes a gateway and routing addresses in a network whose usage is to be captured. The data structure is provided to an API of a master node controlling the pods. A controller in the master node enforces the data structure and reports results back to the API.

Abstract: The present disclosure relates to the field of epoxide synthesis, and particularly to a safe, environmentally friendly and controllable method for preparing cycloaliphatic diepoxides. The method comprises the steps of: mixing a diene compound, a carboxylic acid, an alkaline salt, and a solvent, and cooling; dropwise adding a hydrogen peroxide solution thereto over 1-12 h; standing for layering to obtain an underlayer of an organic phase 1, washing the organic phase 1 with a washing liquid, and standing for layering to obtain an underlayer of an organic phase 2; and purifying the organic phase 2. The reaction system of the present disclosure is simple, environmentally friendly, safe and controllable, and the production cost is low, which can meet the technical and economic requirements. The obtained cycloaliphatic diepoxides have high purity, high yield, low solvent content, low chroma and low halogen content, which are suitable for large-scale industrial production.

Abstract: A radiation effect shielding calculation method based on a three-dimensional spacecraft model is provided.

Abstract: A radiation effect shielding calculation method based on a three-dimensional spacecraft model is provided.

Abstract: The present disclosure relates to the field of epoxide resin, and more particularly to an epoxide with a low total chlorine content and no heavy metal residues, and a preparation method thereof. Disclosed is an epoxide prepared from raw materials including an unsaturated cycloaliphatic compound containing a double bond, hydrogen peroxide, an organic acid compound, a solvent and an alkaline salt; wherein a molar ratio of the organic acid compound to the unsaturated cycloaliphatic compound containing a double bond is (1-1.5):1. The obtained epoxides obtained in the present disclosure have a high purity, a high yield, a low solvent content, low chroma, and a low chlorine and metal ion content; the reaction system is simple, environmentally friendly, safe and controllable, and the production cost is low, which can meet the technical and economic requirements and are suitable for large-scale industrial production.

Abstract: A new type of fine metal mask (FMM) used in OLED production and the method of manufacturing it, wherein the FMM includes a frame made of a metal substrate with a plurality of through holes, a layer of fine mask electroformed on the surface of the frame so that said fine mask and said frame are seamlessly integrated, said fine mask is divided into a pattern area and a border area, and the pattern area corresponds to the through holes on the frame, and the method of manufacturing such an FMM comprising the steps of: A. providing a metal substrate by cutting an invar alloy or stainless steel plate to a desired size; B. providing an fine mask by adding a photoresist layer on the metal substrate, exposing a desired pattern onto said photoresist layer, and electroforming a metal base layer and a metal layer with a low thermal expansion coefficient; and C.

Abstract: The invention provides a red fluorescent material of which the chemical formula is (Li1?a?bMIaMII2b)2+m(Gd1?x?yEuxLny)4?2b(MoO4)7?c?z(WO4)c(A)Z. The invention further provides a preparation method of the red fluorescent material, and an electric light source prepared from the red fluorescent material and a preparation method of the electric light source. The invention has the beneficial effect that the red fluorescent material uses Eu3+ ions as the main activator; under the excitation of near ultraviolet light or blue light emitted by a semiconductor LED chip, the red fluorescent material has high light conversion efficiency, and emits light in a mode of red sharp lines of characteristic 4f electron-configuration 5D0?>7F2 energy level transition of Eu3+; and the red fluorescent material has high color purity, high emissive power and stable performance.

Abstract: A new type of fine metal mask (FMM) used in OLED production and the method of manufacturing it, wherein the FMM includes a frame made of a metal substrate with a plurality of through holes, a layer of fine mask electroformed on the surface of the frame so that said fine mask and said frame are seamlessly integrated, said fine mask is divided into a pattern area and a border area, and the pattern area corresponds to the through holes on the frame, and the method of manufacturing such an FMM comprising the steps of: A. providing a metal substrate by cutting an invar alloy or stainless steel plate to a desired size; B. providing an fine mask by adding a photoresist layer on the metal substrate, exposing a desired pattern onto said photoresist layer, and electroforming a metal base layer and a metal layer with a low thermal expansion coefficient; and C.

Abstract: The invention provides a red fluorescent material of which the chemical formula is (Li1?a?bMIaMII2b)2+m(Gd1?x?yEuxLny)4?2b(MoO4)7?c?z(WO4)c(A)z. The invention further provides a preparation method of the red fluorescent material, and an electric light source prepared from the red fluorescent material and a preparation method of the electric light source. The invention has the beneficial effect that the red fluorescent material uses Eu3+ ions as the main activator; under the excitation of near ultraviolet light or blue light emitted by a semiconductor LED chip, the red fluorescent material has high light conversion efficiency, and emits light in a mode of red sharp lines of characteristic 4f electron-configuration 5D0?>7F2 energy level transition of Eu3+; and the red fluorescent material has high color purity, high emissive power and stable performance.

Abstract: A “texture generator” uses an inverse texture synthesis solution that runs in the opposite direction to traditional forward synthesis techniques to construct 2D texture compactions for use by a graphics processing unit (GPU) of a computer system. These small 2D texture compactions generally summarize an original globally variant texture or image, and are used to reconstruct the original texture or image, or to re-synthesize new textures or images under user-supplied constraints. In various embodiments, the texture generator uses the texture compaction to provide real-time synthesis of globally variant textures on a GPU, where texture memory is generally too small for large textures. Further, the texture generator provides an optimization framework for inverse texture synthesis which ensures that each input region is properly encoded in the output compaction. In addition, the texture generator also computes orientation fields for anisotropic textures containing both low- and high-frequency regions.

Abstract: A “texture generator” uses an inverse texture synthesis solution that runs in the opposite direction to traditional forward synthesis techniques to construct 2D texture compactions for use by a graphics processing unit (GPU) of a computer system. These small 2D texture compactions generally summarize an original globally variant texture or image, and are used to reconstruct the original texture or image, or to re-synthesize new textures or images under user-supplied constraints. In various embodiments, the texture generator uses the texture compaction to provide real-time synthesis of globally variant textures on a GPU, where texture memory is generally too small for large textures. Further, the texture generator provides an optimization framework for inverse texture synthesis which ensures that each input region is properly encoded in the output compaction. In addition, the texture generator also computes orientation fields for anisotropic textures containing both low- and high-frequency regions.