Abstract: The present disclosure provides a double-sided passivated contact cell, where a front side and a rear side of the double-sided passivated contact cell each are provided with a tunnel layer, a doped polysilicon layer, and a passivation layer sequentially from an inside to an outside; and for the doped polysilicon layer at the front side and the doped polysilicon layer at the rear side, one of the doped polysilicon layer at the front side and the doped polysilicon layer at the rear side is a boron and carbon co-doped polysilicon layer, and the other of the doped polysilicon layer at the front side and the doped polysilicon layer at the rear side is a phosphorus and carbon co-doped polysilicon layer. The present disclosure further provides a preparation method of the double-sided passivated contact cell.

Abstract: The present disclosure provides a double-sided passivated contact cell, where a front side and a rear side of the double-sided passivated contact cell each are provided with a tunnel layer, a doped polysilicon layer, and a passivation layer sequentially from an inside to an outside; and for the doped polysilicon layer at the front side and the doped polysilicon layer at the rear side, one of the doped polysilicon layer at the front side and the doped polysilicon layer at the rear side is a boron and carbon co-doped polysilicon layer, and the other of the doped polysilicon layer at the front side and the doped polysilicon layer at the rear side is a phosphorus and carbon co-doped polysilicon layer. The present disclosure further provides a preparation method of the double-sided passivated contact cell.

Abstract: A method is disclosed of fabricating all-dielectric flat lens with low refractive index comprising: selecting dielectric substrate material and lens structure material; determining incident wavelength; calculating phase modulation corresponding to each pillar unit; periodically sampling circular area of dielectric substrate with radius to obtain plurality of sampling points; calculating phase modulation required at position of each sampling point; obtaining pillar corresponding to each sampling point; arranging different dielectric pillars with low refractive index and same thickness are arranged on dielectric substrate, thereby obtaining all dielectric flat lens with low refractive index.

Abstract: A method is disclosed of fabricating all-dielectric flat lens with low refractive index comprising: selecting dielectric substrate material and lens structure material; determining incident wavelength; calculating phase modulation corresponding to each pillar unit; periodically sampling circular area of dielectric substrate with radius to obtain plurality of sampling points; calculating phase modulation required at position each sampling point; obtaining pillar corresponding to each sampling point; arranging different dielectric pillars with low refractive index and same thickness are arranged on dielectric substrate, thereby obtaining all dielectric flat lens with low refractive index.