Publication number: 20140084499
Abstract: The present disclosure is directed toward solutions, transparent films prepared from aromatic copolyamides, and a display element, an optical element or an illumination element using the solutions and/or the films. The copolyamides, which contain pendant carboxylic groups are solution cast into films using cresol, xylene, N,N-dimethylacetamide (DMAc), N-methyl-2-pyrrolidinone (NMP), dimethylsulfoxide (DMSO), or butyl cellosolve or other solvents or mixed solvent which has more than two solvents. When the films are thermally cured at temperatures near the copolymer glass transition temperature, after curing, the polymer films display transmittances >80% from 400 to 750 nm, have coefficients of thermal expansion of less than 20 ppm, and are solvent resistant.
Type:
Application
Filed:
September 24, 2013
Publication date:
March 27, 2014
Applicants:
Akron Polymer Systems, Inc., Sumitomo Bakelite Co., Ltd.
Inventors:
Frank W. HARRIS, Dong Zhang, Limin Sun, Jiaokai Jing, Toshimasa Eguchi, Hideo Umeda, Ritsuya Kawasaki, Toshihiko Katayama, Yusuke Inoue, Jun Okada, Fumihiro Maeda, Mizuho Inoue, Manabu Naito
Publication number: 20140083624
Abstract: The present disclosure is directed toward solutions, transparent films prepared from aromatic copolyamides, and a display element, an optical element or an illumination element using the solutions and/or the films. The copolyamides, which contain pendant carboxylic groups are solution cast into films using cresol, xylene, N,N-dimethylacetamide (DMAc), N-methyl-2-pyrrolidinone (NMP), dimethylsulfoxide (DMSO), or butyl cellosolve or other solvents or mixed solvent which has more than two solvents. When the films are thermally cured at temperatures near the copolymer glass transition temperature, after curing, the polymer films display transmittances >80% from 400 to 750 nm, have coefficients of thermal expansion of less than 20 ppm, and are solvent resistant.
Type:
Application
Filed:
September 24, 2013
Publication date:
March 27, 2014
Applicants:
Akron Polymer Systems, Inc., Sumitomo Bakelite Co., Ltd.
Inventors:
Frank W. Harris, Dong Zhang, Limin Sun, Jiaokai Jing, Toshimasa Eguchi, Hideo Umeda, Ritsuya Kawasaki, Toshihiko Katayama, Yusuke Inoue, Jun Okada, Fumihiro Maeda, Mizuho Inoue, Manabu Naito
Publication number: 20120283371
Abstract: A method for casting a styrenic fluoropolymer film on a substrate includes preparing a polymer solution by dissolving the fluoropolymer in a solvent or solvent blend whose Hansen solubility parameters (HSPs. MPa1/2) satisfy the following relations: |SPb?SPp|<5, |SPb?SPs|<4, |SPb(H)?SPp(H)|<7, and 2<|SPb(H)?SPs(H)|<10 wherein SPb, SPp, SPs, are the total Hansen solubility parameters of solvent/solvent blend, fluoropolymer, and substrate, respectively; SPb(H), SPp(H), and, SPs(H) are the hydrogen-bond Hansen solubility parameters of solvent/solvent blend, fluoropolymer, and substrate, respectively; wherein the fluoropolymer comprises a moiety of: wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring.
Type:
Application
Filed:
May 1, 2012
Publication date:
November 8, 2012
Applicant:
AKRON POLYMER SYSTEMS, INC.
Inventors:
BIN WANG, THAUMING KUO, DOUGLAS STEPHENS McWILLIAMS, FRANK W. HARRIS, TED CALVIN GERMROTH, JIAOKAI JING, DONG ZHANG, XIAOLIANG ZHENG