Abstract: The present disclosure provides data processing methods and apparatuses, an electronic device and a storage medium. The method includes: obtaining a product sample set; obtaining combination features in specified dimensions of the product sample set by processing a second parameter based on a preset dimension reduction algorithm; obtaining influence scores respectively for the combination features in specified dimensions based on a first parameter and the combination features in specified dimensions; obtaining at least one combination feature ranked top by sorting the combination features based on the influence scores, and taking a raw parameter corresponding to the at least one combination feature as a cause of the product defect.

Abstract: The present disclosure provides a method for processing defect information of a product, which includes the following steps of: acquiring defect information on a current film layer and defect information on historical film layers; determining whether defect information exists at a target location of the historical film layer if defect information exists at a target location of the current film layer; if defect information exists for a corresponding location to the target location in at least one of the historical film layers, deleting the defect information detected at the target location in the current film layer; and if no defect information exists for the target location in any of the historical film layers, retaining the defect information detected at the target location in the current film layer.

Abstract: The present disclosure provides a method for processing defect information of a product, which includes the following steps of: acquiring defect information on a current film layer and defect information on historical film layers; determining whether defect information exists at a target location of the historical film layer if defect information exists at a target location of the current film layer; if defect information exists for a corresponding location to the target location in at least one of the historical film layers, deleting the defect information detected at the target location in the current film layer; and if no defect information exists for the target location in any of the historical film layers, retaining the defect information detected at the target location in the current film layer.

Abstract: The present disclosure relates to an image processing method, an image processing device, and a storage medium. The method comprises: acquiring an image to be processed; acquiring, by performing an encoding processing on the image to be processed, probability distribution data of features of a person object in the image to be processed as target probability distribution data, the features being used for identifying an identity of the person object; and acquiring, by performing retrieving in a database using the target probability distribution data, images in the database having probability distribution data matching the target probability distribution data as a target image. Corresponding device, processor and storage medium are also disclosed.

Abstract: A method for manufacturing color filter, a color filter, and a display device including the color filter are disclosed. The method for manufacturing a color filter includes: forming a black matrix on a transparent substrate; forming a photosensitive resist layer on the transparent substrate with the black matrix; disposing a reflection sheet capable of reflecting light on a first side of the transparent substrate to be exposed, the first side being provided with the black matrix; disposing a mask on a second side of the transparent substrate to be exposed, the second side being not provided with the black matrix; and carrying out an exposing process from the second side of the transparent substrate.

Abstract: A method for manufacturing color filter, a color filter, and a display device including the color filter are disclosed. The method for manufacturing a color filter includes: forming a black matrix on a transparent substrate; forming a photosensitive resist layer on the transparent substrate with the black matrix; disposing a reflection sheet capable of reflecting light on a first side of the transparent substrate to be exposed, the first side being provided with the black matrix; disposing a mask on a second side of the transparent substrate to be exposed, the second side being not provided with the black matrix; and carrying out an exposing process from the second side of the transparent substrate.