Abstract: The present invention relates to a black matrix mask, a method for manufacturing a black matrix, and an application thereof. The black matrix mask includes a light-shielding layer having a predetermined transmission rate and coated along an edge of a black matrix pattern of the black matrix mask. The present invention also provides methods for manufacturing a black matrix, a color filter, an array substrate, and a liquid crystal display device. The method for manufacturing the black matrix includes: Step 100: using the black matrix mask to subject a black matrix material layer on a base plate to exposure; Step 200: subjecting the exposed black matrix material layer to development; and Step 300: subjecting the developed black matrix material layer to baking to finally form a black matrix on the base plate.

Abstract: The present invention relates to a black matrix mask, a method for manufacturing a black matrix, and an application thereof. The black matrix mask includes a light-shielding layer having a predetermined transmission rate and coated along an edge of a black matrix pattern of the black matrix mask. The present invention also provides methods for manufacturing a black matrix, a color filter, an array substrate, and a liquid crystal display device. The method for manufacturing the black matrix includes: Step 100: using the black matrix mask to subject a black matrix material layer on a base plate to exposure; Step 200: subjecting the exposed black matrix material layer to development; and Step 300: subjecting the developed black matrix material layer to baking to finally form a black matrix on the base plate.

Abstract: The present invention provides a CF substrate manufacturing method and a CF substrate manufactured with the method. Through sequentially forming first, second, and third photoresist layers on the base plate and individually subjecting the first, second, and third photoresist layers to patterning, first, second, and third photoresist matrices that are stacked on each other, a plurality of first photoresist blocks, a plurality of second photoresist blocks, and a plurality of third photoresist blocks are formed such that the first, second, and third photoresist matrices have colors that are mixed to exhibit a color of black to thereby serve as a black matrix and the plurality of first photoresist blocks, the plurality of second photoresist blocks, and the plurality of third photoresist blocks are separated from each other by the black matrix and collectively form a color resist layer.