Patents by Inventor Jiayue YUAN

Jiayue YUAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LASER FOCUSSING MODULE
    Publication number: 20220206397
    Abstract: A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); •—a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).
    Type: Application
    Filed: April 3, 2020
    Publication date: June 30, 2022
    Applicants: ASML Netherlands B.V., Trumpf Lasersystems For Semiconductor Manufacturing GmbH
    Inventors: Ruud Antonius Catharina Maria BEERENS, Nico Johannes Antonius BOONEN, Stefan Michael Bruno BÄUMER, Tolga Mehmet ERGIN, Andreas Kristian HOPF, Derk Jan Wilfred KLUNDER, Martin Anton LAMBERT, Stefan PIEHLER, Manisha RANJAN, Frank Bernhard SPERLING, Andrey Sergeevich TYCHKOV, Jasper WITTE, Jiayue YUAN