Patents by Inventor Jie-Tsuen Lan

Jie-Tsuen Lan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6317226
    Abstract: A moire pattern technology about a dot matrix hologram for hiding a moire pattern is invented. In the moire pattern hidden region of a dot matrix hologram, the moire pattern foreground area and the moire pattern background area are formed identically by interlacing bright lines and dark lines. While position shifting is formed between the lines of the two areas. This position shifting is several times of the size of the grating dots. Thus, a moire pattern hidden in the moire pattern hidden region without being processed specially has a poor hiding ability. Often the above moire pattern can be identified by eyes directly without using a decoding film. Therefore, such kinds of moire patterns have poor hidden effects. However, the moire pattern of the present invention can prevent the aforesaid phenomenon by a well designed pretended pattern. Moreover, the appearance of such a dot matrix hologram can be beautified by the addition of the pretended patern.
    Type: Grant
    Filed: September 30, 1999
    Date of Patent: November 13, 2001
    Assignee: Ahead Optoelectronics, Inc.
    Inventors: Sheng-Lie Yeh, Jie-Tsuen Lan, Hsiu-Hung Lin