Patents by Inventor Jih Shang Hwang

Jih Shang Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9315068
    Abstract: An electronic handwriting processing method, used to process handwriting written on a writing medium with temperature-dependent color ink, including following steps: provide a temperature varying element; apply said temperature varying element, so that it reaches temperature to make said temperature-dependent color ink to change from a first color to a second color; and contact said handwriting with said temperature varying element, to change its color from said first color to said second color, wherein, one of said first color and said second color is visible, while the other is transparent. An electronic handwriting processing device is also disclosed.
    Type: Grant
    Filed: December 4, 2013
    Date of Patent: April 19, 2016
    Inventor: Jih-Shang Hwang
  • Publication number: 20150151558
    Abstract: An electronic handwriting processing method, used to process handwriting written on a writing medium with temperature-dependent color ink, including following steps: provide a temperature varying element; apply said temperature varying element, so that it reaches temperature to make said temperature-dependent color ink to change from a first color to a second color; and contact said handwriting with said temperature varying element, to change its color from said first color to said second color, wherein, one of said first color and said second color is visible, while the other is transparent. An electronic handwriting processing device is also disclosed.
    Type: Application
    Filed: December 4, 2013
    Publication date: June 4, 2015
    Inventor: Jih-Shang Hwang
  • Patent number: 6960528
    Abstract: Nanotip arrays are formed by exposing a substrate to a process gas mixture that simultaneously forms nanomasks on the substrate surface and etches exposed portions of the substrate surface to form the nanotip array. Components of the process gas mixture form nanocrystallites on the surface of the substrate, thereby masking portions of the substrate from other components of the process gas mixture, which etch exposed portions of the substrate. Accordingly, nanotip arrays formed using this technique can have nanocrytallite endpoints.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: November 1, 2005
    Assignee: Academia Sinica
    Inventors: Kuie-Hsien Chen, Jih Shang Hwang, Debajyoti Das, Hong Chun Lo, Li-Chyong Chen
  • Publication number: 20040056271
    Abstract: Nanotip arrays are formed by exposing a substrate to a process gas mixture that simultaneously forms nanomasks on the substrate surface and etches exposed portions of the substrate surface to form the nanotip array. Components of the process gas mixture form nanocrystallites on the surface of the substrate, thereby masking portions of the substrate from other components of the process gas mixture, which etch exposed portions of the substrate. Accordingly, nanotip arrays formed using this technique can have nanocrytallite endpoints.
    Type: Application
    Filed: September 20, 2002
    Publication date: March 25, 2004
    Inventors: Kuie-Hsien Chen, Jih Shang Hwang, Debajyoti Das, Hong Chun Lo, Li-Chyong Chen