Patents by Inventor JiHwan Ryu

JiHwan Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SUBSTRATE PROCESSING APPARATUS
    Publication number: 20220243322
    Abstract: Provided is a reactor capable of improving the symmetry of the profile of a thin film deposited on a substrate with an asymmetric exhaust structure, wherein a distance between a gas flow control ring (FCR) and an exhaust unit on one side where an exhaust port is located is greater than a distance between the FCR and the exhaust unit on the opposite side of the exhaust port.
    Type: Application
    Filed: January 26, 2022
    Publication date: August 4, 2022
    Inventors: TaeWoong Kim, JiHwan Ryu, YongWoong Jeong, YoungSim Kim, YoungMin Kim
  • Gas distributor
    Patent number: D930782
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: September 14, 2021
    Assignee: ASM IP Holding B.V.
    Inventors: JiHwan Ryu, HwiMin Nam, Hyeangi Oh
  • Electrode
    Patent number: D940837
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: January 11, 2022
    Assignee: ASM IP Holding B.V.
    Inventors: DongRak Jung, JiHwan Ryu, HwiMin Nam
  • Insulator
    Patent number: D979506
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: February 28, 2023
    Assignee: ASM IP Holding B.V.
    Inventors: DongRak Jung, WooChan Kim, JiHwan Ryu