Abstract: Embodiments include a system comprising a gateway that includes a processor coupled to sensors and/or network devices installed at a premises. The system includes a remote server coupled to the gateway and located remote to the premises. The gateway and/or the remote server includes data of the sensors and/or network devices. The system includes an application running on at least one of the gateway and the remote server. The application controls events corresponding to the data and/or the premises in response to content of the data. The system includes a client interface coupled to the gateway and/or the remote server. The client interface presents the data to client devices.

Abstract: A rail maintenance of way machine for a route is provided that includes a single chassis supporting a plurality of working modules. The modules include at least a broom module that can manipulate ballast and loose material that are disposed on a location of the route adjacent to the chassis a spike supply module that can provide a fastener; a tie spiker module that can receive the fastener from the spike supply module and to drive the supplied fastener through an aperture defined by a tie plate and into a replacement tie; and an anchor module that can remove an installed anchor from an installed tie and to install an anchor onto the replacement tie.

Abstract: Systems are provided for damping vibrations from a payload. In an embodiment, and by way of example only, the system includes an isolation strut and a gas line. The isolation strut includes a bellows and a piston. The bellows has a first end and a second end, the first end being enclosed, and the second end attached to the piston to define a chamber. The piston includes a damping annulus therethrough having a gas inlet and a gas outlet. The gas inlet provides flow communication to the chamber of the bellows. The gas line is coupled to the isolation strut and is in fluid communication with the gas outlet thereof. The system is hermetically sealed to contain a gas therein.

Abstract: A method for obtaining a reflectance property indication of a sample which includes making a reflectance measurement of the sample and correcting the reflectance measurement in order to obtain the reflectance property indication. The reflectance measurement represents an observed reflectance of the sample, the reflectance property indication represents a standardized reflectance of the sample, and correcting the reflectance measurement accounts for a difference between the standardized reflectance and the observed reflectance. An apparatus for making a reflectance measurement of a sample which includes a housing defining a viewing port, a temperature control mechanism for controlling the temperature within the interior of the housing, and an optical reflectometer contained within the interior of the housing. The reflectometer has a measurement direction and is movable within the housing so that the measurement direction can be selectively aligned with the viewing port.

Abstract: Systems are provided for damping vibrations from a payload. In an embodiment, and by way of example only, the system includes an isolation strut and a gas line. The isolation strut includes a bellows and a piston. The bellows has a first end and a second end, the first end being enclosed, and the second end attached to the piston to define a chamber. The piston includes a damping annulus therethrough having a gas inlet and a gas outlet. The gas inlet provides flow communication to the chamber of the bellows. The gas line is coupled to the isolation strut and is in fluid communication with the gas outlet thereof. The system is hermetically sealed to contain a gas therein.

Abstract: A method for obtaining a reflectance property indication of a sample which includes making a reflectance measurement of the sample and correcting the reflectance measurement in order to obtain the reflectance property indication. The reflectance measurement represents an observed reflectance of the sample, the reflectance property indication represents a standardized reflectance of the sample, and correcting the reflectance measurement accounts for a difference between the standardized reflectance and the observed reflectance. An apparatus for making a reflectance measurement of a sample which includes a housing defining a viewing port, a temperature control mechanism for controlling the temperature within the interior of the housing, and an optical reflectometer contained within the interior of the housing. The reflectometer has a measurement direction and is movable within the housing so that the measurement direction can be selectively aligned with the viewing port.

Abstract: An intraoral discluder for preventing chronic tension headaches, common migraine headaches, and temporomandibular disorders that are caused or perpetuated by chronic activity of the temporalis muscle. The discluder includes a trough, contoured to encompass at least one maxillary or mandibular incisor, from which extends a protruding platform, for engagement by the opposing incisors. The trough can be retained on the teeth by any adaptable material than can flow around the teeth and then maintain its shape. Once in place in the wearer's mouth, one or two opposing incisors will come into contact with the platform prior to the upper and lower posterior and/or canine teeth coming into contact, regardless of the position of the mandible, thereby reducing the intensity of the activity of the temporalis muscle.

Abstract: A dry process for the cleaning of precision surfaces such as of semiconductor wafers, by using process materials such as carbon dioxide and useful additives such as cosolvents and surfactants, where the process materials are applied exclusively in gaseous and supercritical states. Soak and agitation steps are applied to the wafer, including a rapid decompression of the process chamber after a soak period at higher supercritical pressure, to mechanically weaken break up the polymers and other materials sought to be removed, combined with a supercritical fluid flush to carry away the loose debris.

Abstract: A dry process for the cleaning of precision surfaces such as of semiconductor wafers, by using process materials such as carbon dioxide and useful additives such as cosolvents and surfactants, where the process materials are applied exclusively in gaseous and supercritical states. Soak and agitation steps are applied to the wafer, including a rapid decompression of the process chamber after a soak period at higher supercritical pressure, to mechanically weaken break up the polymers and other materials sought to be removed, combined with a supercritical fluid flush to carry away the loose debris.