Patents by Inventor Jim-Chyuan Shieh

Jim-Chyuan Shieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5641595
    Abstract: A method for making color filters containing a color matrix with at least three desired colored layers comprising the steps of: (a) forming a positive energy-accumulable photoresist layer on a transparent electrically conductive substrate; (b) pre-conditioning the energy-accumulable photoresist layer to form at least three regions of different initial levels of exposure energy, from a highest to a lowest; (c) using a developer solution to develop and remove the region of the photoresist layer with the highest level of initial exposure energy to thereby cause a corresponding area of the electrically conductive substrate underlying the photoresist to be uncovered; (d) electrodepositing a photo-curable resin of a desired color and a predetermined exposure energy required for curing onto the uncovered area of the substrate; (e) overall-exposing the photoresist layer to a light source so as to impart an incremental exposure energy to all regions of the photoresist layer; (f) using a developer solution to develop a
    Type: Grant
    Filed: January 16, 1996
    Date of Patent: June 24, 1997
    Assignee: Industrial Technology Research Institute
    Inventors: Pao-Ju Hsieh, Hsien-Kuang Lin, Jim-Chyuan Shieh, Chao-Wen Niu, Chao-Huei Tseng, Hwa-Chi Cheng
  • Patent number: 5523340
    Abstract: An anionic electrodepositable coating composition for making pigment dispersed color filters comprising: (a) a pigment; (b) a first addition copolymer containing pyrrolidone and hydroxy groups; (c) a second addition copolymer containing carboxyl and hydroxy groups; and (d) a low molecular weight amine. The pyrrolidone-containing monomer can be N-vinyl-2-pyrrolidone or a pyrrolidone-containing acrylate-based monomer represented by the following formula: ##STR1## wherein R is hydrogen atom, or methyl or ethyl group, and n is an integer between 1.about.3. The first addition copolymer has a weight average molecular weight between 1,000 and 20,000 and is prepared from a monomer composition comprising about 0.5.about.90 mole percent of a pyrrolidone-containing unsaturated monomer and about 1.about.50 mole percent of a hydroxy-containing unsaturated monomer. The second addition copolymer has a weight average molecular weight between 5,000 and 60,000 and is prepared from a monomer composition comprising about 5.
    Type: Grant
    Filed: January 23, 1995
    Date of Patent: June 4, 1996
    Assignees: Industrial Technology Research Institute, Nan Ya Plastics Corp.
    Inventors: Chao-Wen Niu, Jim-Chyuan Shieh, Pao J. Hsieh, Wen R. Lin, Hsien K. Lin
  • Patent number: 5242780
    Abstract: An electrophoretic positive working photosensitive composition for producing a photoresist pattern on metal base plate comprises a photosensitive compound, in which a photosensitive quinone diazide group is grafted on a polyester, and an acrylic copolymer containing carboxyl group, the composition forms a smooth photoresist film on the plate and has a good adhesion to the surface that no pinehole is found.
    Type: Grant
    Filed: October 18, 1991
    Date of Patent: September 7, 1993
    Assignee: Industrial Technology Research Institute
    Inventors: Hsien-Kuang Lin, Jim-Chyuan Shieh, Dhei-Jhai Lin
  • Patent number: 5229245
    Abstract: A positively working photosensitive composition is disclosed useful for making positively working lithographic printing plates of exceptional wear, printing and solvent-resistant characteristics. The positively working photosensitive composition essentially contains a .beta.-dicarbonyl group and a quinone diazide group.
    Type: Grant
    Filed: July 26, 1991
    Date of Patent: July 20, 1993
    Assignee: Industrial Technology Research Institute
    Inventors: Dhei-Jhai Lin, Hsien-Kuang Lin, Jim-Chyuan Shieh
  • Patent number: 5223373
    Abstract: Disclosed is a photosensitive quinone diazide compound for the preparation of a two component positive working photosensitive electrodeposition composition. As the photosensitive group is grafted on a polyurethane, the photosensitive compound thus synthesized has good flexibility and good compatability with acrylic resin. The electrodeposition composition also has good adhesion to the metal base plate when it is coated thereon by electrodeposition means.
    Type: Grant
    Filed: April 29, 1991
    Date of Patent: June 29, 1993
    Assignee: Industrial Technology Research Institute
    Inventors: Hsien-Kuang Lin, Jim-Chyuan Shieh
  • Patent number: 5019483
    Abstract: An aqueous alkali developable photoresist composition consists of (a) a carboxyl group-containing polymeric binder, (b) 1-15% by weight of a photoinitiator based on the binder, (c) 20-100% by weight based on the binder, of a photo reactive monomer or oligomer containing at least two ethylenically unsaturated double bonds, and (d) 0.05-5% by weight based on the binder of a weak alkali soluble or dispersible thiol compound represented by(X).sub.a R--SH).sub.bwhere a, b are integers equal to or greater than 1, R is an organic moiety of molecular weight less than 500, and X is a carboxyl group-containing moiety or hydrophilic organic polymeric segment with less than 100 repeating unit.
    Type: Grant
    Filed: September 13, 1989
    Date of Patent: May 28, 1991
    Assignee: 501 Industrial Technology Research Institute
    Inventors: Dhei-Jhai Lin, Jim-Chyuan Shieh, Hsien-Kuang Lin