Abstract: A regenerative thermal oxidizer (RTO) with three or more chambers. Each chamber would be in a unique mode, (inlet, outlet, purge). Each chamber has its gas flow determined by two poppet valves which define which mode the chamber will be in: inlet mode, output mode, or purge mode.

Abstract: A regenerative thermal oxidizer (RTO) with three or more chambers. Each chamber would be in a unique mode, (inlet, outlet, purge). Each chamber has its gas flow determined by two poppet valves which define which mode the chamber will be in: inlet mode, output mode, or purge mode.

Abstract: An electrically controlled valve which can be operated using a programable controller. A cooperating pair of the electrically controlled valves can be used in a Regenerative Thermal Oxidizer (RTO). The electrically controlled valve has two seats, and a blade which can move between a first position contacting the first seat and a second position contacting the second seat. The blade is moved by an actuator which is controlled by a variable frequency drive (VFD). A control computer continuously monitors the operation of both valves and halts operation of the system upon detecting a fault (error). The motion of the blade is programmed such that force of impact on the seat is reduced. Once the blade is seated, a brake is engaged which maintains the stationary position while utilizing relatively low power.

Abstract: A system for the formation of circuit patterns on a large flat panel display (78) using plasma assisted chemical etching to achieve a uniform or controllably nonuniform etch depth over the entire area of the display. An overlying film (60) is provided on a large flat panel display substrate (12) with a photolithographic mask (62) overlying the film and having a predetermined pattern of openings (64) therethrough. The substrate is placed adjacent a plasma etching tool which has a projected area which is smaller than the area of the surface of the substrate. The etching tool is scanned across the surface of the substrate to transfer the pattern of the photolithographic mask into the film on the surface thereof. Thereafter, the photolithographic mask is removed from the surface of the overlying film.