Patents by Inventor Jimmy Vishnipolsky
Jimmy Vishnipolsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8207504Abstract: A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses an EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged to scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and (c) a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.Type: GrantFiled: November 19, 2010Date of Patent: June 26, 2012Assignee: Applied Materials Israel, Ltd.Inventors: Chaim Braude, Mariano Abramson, Adam Baer, Jimmy Vishnipolsky, Yuri Belenky
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Publication number: 20110121193Abstract: A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses a EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.Type: ApplicationFiled: November 19, 2010Publication date: May 26, 2011Applicant: APPLIED MATERIALS ISRAEL LIMITEDInventors: Chaim Braude, Mariano Abramson, Adam Baer, Jimmy Vishnipolsky, Yuri Belenky
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Patent number: 7842935Abstract: A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.Type: GrantFiled: July 17, 2006Date of Patent: November 30, 2010Assignee: Applied Materials Israel, Ltd.Inventors: Meir Aloni, Mula Friedman, Jimmy Vishnipolsky, Gilad Almogy, Alon Litman, Yonatan Lehman, Doron Meshulach, Ehud Tirosh
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Patent number: 7595490Abstract: A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.Type: GrantFiled: September 1, 2006Date of Patent: September 29, 2009Assignee: ICT, Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbHInventors: Fang Zhou, Pavel Adamec, Jürgen Frosien, Jimmy Vishnipolsky
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Patent number: 7521700Abstract: A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.Type: GrantFiled: July 17, 2006Date of Patent: April 21, 2009Assignee: Applied Materials, Israel, Ltd.Inventors: Meir Aloni, Mula Friedman, Jimmy Vishnipolsky, Gilad Almogy, Alon Litman, Yonatan Lehman, Doron Meshulach, Ehud Tirosh
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Publication number: 20070158588Abstract: A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.Type: ApplicationFiled: September 1, 2006Publication date: July 12, 2007Inventors: Fang Zhou, Pavel Adamec, Jurgen Frosien, Jimmy Vishnipolsky
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Patent number: 7164142Abstract: Electrical lead-through systems from atmospheric into vacuum environments are presented. Electrical feed-through structures (EFTS) comprised of a multiplicity of parallel connection lines used to operate e-beam tip-array sources in high vac environments for chip lithography are disclosed. In one embodiment, an EFTS comprises a sheet of insulating material having conductive tracks extending along potions of the sheet and a vacuum seal separating one portion from another portion of the sheet so as to maintain a pressure differential among multiple portions of the sheet.Type: GrantFiled: February 8, 2002Date of Patent: January 16, 2007Assignee: Applied Materials, Inc.Inventors: Jimmy Vishnipolsky, Efim Vinnitsky, Eliyahu Almog
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Publication number: 20060243918Abstract: A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.Type: ApplicationFiled: July 17, 2006Publication date: November 2, 2006Inventors: Meir Aloni, Mula Friedman, Jimmy Vishnipolsky, Gilad Almogy, Alon Litman, Yonatan Lehman, Doron Meshulach, Ehud Tirosh
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Publication number: 20060243922Abstract: A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.Type: ApplicationFiled: July 17, 2006Publication date: November 2, 2006Inventors: Meir Aloni, Mula Friedman, Jimmy Vishnipolsky, Gilad Almogy, Alon Litman, Yonatan Lehman, Doron Meshulach, Ehud Tirosh
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Patent number: 7098468Abstract: A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.Type: GrantFiled: September 11, 2003Date of Patent: August 29, 2006Assignee: Applied Materials, Inc.Inventors: Meir Aloni, Mula Friedman, Jimmy Vishnipolsky, Gilad Almogy, Alon Litman, Yonatah Lehman, Doron Meshulach, Ehud Tirosh
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Publication number: 20050274911Abstract: A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.Type: ApplicationFiled: September 11, 2003Publication date: December 15, 2005Inventors: Meir Aloni, Mula Friedman, Jimmy Vishnipolsky, Gilad Almogy, Alon Litman, Yonatah Lehman, Doron Meshulach, Ehud Tirosh
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Patent number: 6932873Abstract: A work-piece deflection management system including: (a) a first and a second vacuum chambers, each said vacuum chamber having an air-bearing seal circumscribing one of its sides, and (b) a work-piece plate; wherein the air-bearing seals are aligned to face one-another with the work-piece plate respectively there-between, allowing the work-piece to be laterally slid with respect to the air-bearing seals while maintaining a first predefined vacuum level within the first vacuum chamber and maintaining a second predefined vacuum level within the second vacuum chamber.Type: GrantFiled: July 30, 2002Date of Patent: August 23, 2005Assignee: Applied Materials Israel, Ltd.Inventors: Betsalel Tzvi Rechav, Jimmy Vishnipolsky, Efim Vinnitsky
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Patent number: 6894435Abstract: A method for scanning a specimen 105 with beams 102 of charged particles of a source group. Thereby, a plurality of target points 402 is scanned with a charged particle beam emitted by a source 106 and the same plurality of target points is scanned with at least one further charged particle beam emitted by at least one further source. Further, the charged particle beams from the source and the at least one further source are emitted on the same target point at different times. Additionally, a multiple charged particle beam source and a data feed system are provided. A source array 104 comprises at least one logical emitting unit 106, wherein patterning information is shifted in a shift circuit 140, and redundancy emitting units 106, wherein individual redundancy emitting units obtain patterning information from the shift register.Type: GrantFiled: November 6, 2002Date of Patent: May 17, 2005Assignee: Applied Materials, Inc.Inventors: David Aviel, Jimmy Vishnipolsky, Radel Ben-Av
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Publication number: 20040085024Abstract: A method for scanning a specimen 105 with beams 102 of charged particles of a source group. Thereby, a plurality of target points 402 is scanned with a charged particle beam emitted by a source 106 and the same plurality of target points is scanned with at least one further charged particle beam emitted by at least one further source. Further, the charged particle beams from the source and the at least one further source are emitted on the same target point at different times. Additionally, a multiple charged particle beam source and a data feed system are provided. A source array 104 comprises at least one logical emitting unit 106, wherein patterning information is shifted in a shift circuit 140, and redundancy emitting units 106, wherein individual redundancy emitting units obtain patterning information from the shift register.Type: ApplicationFiled: November 6, 2002Publication date: May 6, 2004Inventors: David Aviel, Jimmy Vishnipolsky, Radel Ben-Av
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Publication number: 20040020438Abstract: A work-piece deflection management system including: (a) a first and a second vacuum chambers, each said vacuum chamber having an air-bearing seal circumscribing one of its sides, and (b) a work-piece plate; wherein the air-bearing seals are aligned to face one-another with the work-piece plate respectively there-between, allowing the work-piece to be laterally slid with respect to the air-bearing seals while maintaining a first predefined vacuum level within the first vacuum chamber and maintaining a second predefined vacuum level within the second vacuum chamber.Type: ApplicationFiled: July 30, 2002Publication date: February 5, 2004Applicant: APPLIED MATERIALS, INC.Inventors: Betsalel Tzvi Rechav, Jimmy Vishnipolsky, Efim Vinnitsky
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Publication number: 20030150630Abstract: Electrical lead-through systems from atmospheric into vacuum environments are presented. Electrical feed-through structures (EFTS) comprised of a multiplicity of parallel connection lines used to operate e-beam tip-array sources in high vac environments for chip lithography are disclosed. In one embodiment, an EFTS comprises a sheet of insulating material having conductive tracks extending along potions of the sheet and a vacuum seal separating one portion from another portion of the sheet so as to maintain a pressure differential among multiple portions of the sheet.Type: ApplicationFiled: February 8, 2002Publication date: August 14, 2003Applicant: APPLIED MATERIALS, INC.Inventors: Jimmy Vishnipolsky, Efim Vinnitsky, Eliyahu Almog