Abstract: A light guiding plate includes a light incident portion into which light is incident from a light source, a light reflecting pattern to reflect the light provided from the light incident portion, and a light transmitting surface to transmit the light reflected by the light reflecting pattern to a display panel. The light reflecting pattern includes light reflecting sections each of which has a first light reflecting plane that is inclined with respect to the light transmitting surface to face toward the light source, and a second light reflecting plane that is inclined with respect to the light transmitting surface and connected with an edge of the first light reflecting plane so that the light reflection sections each form a prism shape. The light reflecting sections respectively having the second light reflecting planes that are configured to have different areal sizes to control reflectivity of the respective light reflecting sections.

Abstract: Disclosed are an illumination device capable of improving an optical efficiency of a light generated from a light source and a reflection type liquid crystal device using the, illumination device. Between at least one light source and a first light guiding plate, which is provided to uniformly project the light incident from a first side towards a second side, a second light guiding plate for projecting the incident light towards the first side of the first light guiding plate is provided. A distance between a light projecting portion of the second light guiding plate and a light reflecting portion opposite the light projecting portion becomes narrow as an amount of light flux of the light emitted from at least one light source decreases. Accordingly, the light efficiency can be improved by increasing the probability of variation in optical routes for the light generated from each light source, though the number of the light sources disposed at a side of the second light guiding plate is increased.

Abstract: Disclosed are an illumination device capable of improving an optical efficiency of a light generated from a light source and a reflection type liquid crystal device using the illumination device. Between at least one light source and a first light guiding plate, which is provided to uniformly project the light incident from a first side towards a second side, a second light guiding plate for projecting the incident light towards the first side of the first light guiding plate is provided. A distance between a light projecting portion of the second light guiding plate and a light reflecting portion opposite the light projecting portion becomes narrow as an amount of light flux of the light emitted from at least one light source decreases. Accordingly, the light efficiency can be improved by increasing the probability of variation in optical routes for the light generated from each light source, though the number of the light sources disposed at a side of the second light guiding plate is increased.

Abstract: The present invention relates to norbornene monomers with a novel functional group containing an organometal as shown in the following Formula (I) or (II), a photoresist containing its polymers, manufacturing method thereof, and a method of forming photoresist patterns. Unlike existing polymers for photoresist matrix, polymers made by norbornene monomers described in the present invention is a chemical amplification type induced by photosensitive acids and can result in difference in silicon content between the exposed area and unexposed area due to dissociation of side chain containing silicon. The difference in the silicon content results in different etch rate with respect to oxygen plasma which makes dry developing possible.

Abstract: Disclosed are a light guiding plate, a liquid crystal display device using the same, and a method for displaying an image thereof. The light reflection path is varied in the guiding plate, such that a portion of the light supplied to a bright region of an effective display area is shifted into a dark region, thereby obtaining a uniform brightness distribution over the entire effective display area. The liquid crystal display device can display information with improved brightness, so that the display quality is improved.

Abstract: There is a vinyl 4-hydroxybenzal-vinylalcohol-vinyl acetate copolymer, a 4-t-butoxycarbonyloxybenzal-vinyl alcohol-vinyl acetate copolymer and a vinyl 4-t-butoxycarbonyloxybenzal-vinyl 4-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer suitable for photoresist and methods for preparing the same. The latter two polymers contain 4-hydroxybenzal groups all or parts of which are protected with t-butoxycarbonyl group. Superior in transparency, thermal stability, mechanical strength, and adhesiveness to silicon wafer, the photoresists prepared from the protected copolymers can enhance the resolution of fine circuit by virtue of low weight loss upon the thermal treatment after exposure.

Abstract: Disclosed are an illumination device capable of improving an optical efficiency of a light generated from a light source and a reflection type liquid crystal device using the illumination device. Between at least one light source and a first light guiding plate, which is provided to uniformly project the light incident from a first side towards a second side, a second light guiding plate for projecting the incident light towards the first side of the first light guiding plate is provided. A distance between a light projecting portion of the second light guiding plate and a light reflecting portion opposite the light projecting portion becomes narrow as an amount of light flux of the light emitted from at least one light source decreases. Accordingly, the light efficiency can be improved by increasing the probability of variation in optical routes for the light generated from each light source, though the number of the light sources disposed at a side of the second light guiding plate is increased.

Abstract: Disclosed are a light guide plate, a front illumination type liquid crystal display device using the same, and a method for displaying an image therein. A light reflection pattern is formed on a light reflection surface of the light guide plate so as to change an optical distribution and prevent the moire phenomenon. The light reflection pattern prevents the light from being leaked through a side of the light guide plate, so an effective display area is not divided into a bright area, a boundary area, and a dark area. It is possible to change the optical distribution and to prevent the moire phenomenon, so the liquid crystal display device can display an image with an improved brightness uniformity.

Abstract: There is disclosed an improved reflection type liquid crystal display. The reflection type LCD includes: a light source part for generating a light beam; and a light guiding part established at one side of the light source part, for guiding the light beam generated from the light source part uniformly; an LCD panel part disposed below the light guiding part, for forming an image. The reflection type LCD realizes uniform and high luminance even at a low power consumption. The light guiding part of the reflection type LCD has a pattern formed at one surface of the light guiding part and having a specific configuration and shape, thereby preventing the occurrence of the Moire fringes. In addition, The light guiding part allows the light beam generated from the light source to be uniformly incident onto the LCD panel part, thereby realizing reflection type LCDs having uniform and high luminance even at very low power consumption.

Abstract: There is a vinyl 4-hydroxybenzal-vinylalcohol-vinyl acetate copolymer, a 4-t-butoxycarbonyloxybenzal-vinyl alcohol-vinyl acetate copolymer and a vinyl 4-t-butoxycarbonyloxybenzal-vinyl 4-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer suitable for photoresist and methods for preparing the same. The latter two polymers contain 4-hydroxybenzal groups all or parts of which are protected with t-butoxycarbonyl group. Superior in transparency, thermal stability, mechanical strength, and adhesiveness to silicon wafer, the photoresists prepared from the protected copolymers can enhance the resolution of fine circuit by virtue of low weight loss upon the thermal treatment after exposure.

Abstract: Copolymers containing N-vinyllactam derivatives protected at 3-position are provided and represented by the following formula. The copolymers are used as a photoresist material suitable for deep uv process so that high sensitivity and resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in PED stability can be accomplished by use of the photoresist.

Abstract: The present invention relates to a polymer prepared by synthesizing monomer having a derivative of cholic acid, deoxycholic acid or lithocholic acid bonded to norbornene, and then homopolymerizing these monomer, copolymerizing these monomer with maleic anhydride, or copolymerizing these monomer, maleic anhydride and 2-hydroxyethyl 5-norbornene-2-carboxylate and/or 5-norbornene-2carboxylic acid, and its use as a photoresist. The polymer synthesized according to the present invention is dissolved in a solvent, together with a photo-acid generator, and filtered through a filter to make a photoresist solution which can be used to produce a lithographic image on a silicon wafer.

Abstract: There is a vinyl 4-hydroxybenzal-vinylalcohol-vinyl acetate copolymer, a 4-t-butoxycarbonyloxybenzal-vinyl alcohol-vinyl acetate copolymer and a vinyl 4-t-butoxycarbonyloxybenzal-vinyl 4-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer suitable for photoresist and methods for preparing the same. The latter two polymers contain 4-hydroxybenzal groups all or parts of which are protected with t-butoxycarbonyl group. Superior in transparency, thermal stability, mechanical strength, and adhesiveness to silicon wafer, the photoresists prepared from the protected copolymers can enhance the resolution of fine circuit by virtue of low weight loss upon the thermal treatment after exposure.

Abstract: Disclosed is photoresist using dioxaspiro ring-substitued acryl derivatives, represented by the following chemical formula I or II. As matrix polymers, homopolymers of dioxaspiro ring-substitued acryl monomers or their copolymers with acryl monomers are provided. The deprotection of the dioxaspiro rings from the matrix polymers, usually accomplished by the action of a photoacid generator, causes a great change in the water solubility of the matrix, thereby allowing the matrix to be used for the photoresist required to have high sensitivity, resolution and contrast.

Abstract: Organometal-containing acrylate or methacrylate derivatives and photoresists comprising the polymers thereof. Unlike conventional matrix polymers of photoresist, the polymers induce a difference in silicon content between exposed regions and unexposed regions of photoresists by releasing their silicon-containing side chains with the aid of acid in a chemical amplification manner. The difference in silicon content causes the exposed regions to be etched at a different rate from that of the unexposed regions under oxygen plasma.

Abstract: Copolymers containing N-vinyllactam derivatives protected at 3-position are provided and represented by the following formula. The copolymers are used as a photoresist material suitable for deep uv process so that high sensitivity and resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in PED stability can be accomplished by use of the photoresist.

Abstract: N-vinyllactam derivatives protected at the 3-position are provided and represented by the following formula (I). These are polymerized into homo- and copolymers for use in microlithography of semiconductor manufacture. The polymers are used as a photoresist material suitable for a deep UV process so that pictures of high sensitivity and high resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in pattern formation can be accomplished through the use of the photoresist of the invention.

Abstract: A vinyl 4-tetrahydropyranyloxybenzal-vinyl 4-hydroxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer, a vinyl 4-tetrahydropyranyloxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer and a preparation method thereof are provided. The copolymers have excellent transparency because they are very low in optical absorbance in the deep uv range. In addition, the acetal structure in the backbone and in the substituted groups endows the photoresist of the copolymer with superior dry etch resistance.

Abstract: A vinyl 4-tetrahydropyranyloxybenzal-vinyl 4-hydroxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer, a vinyl 4-tetrahydropyranyloxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer and a preparation method thereof are provided. The copolymers have excellent transparency because they are very low in optical absorbance in the deep uv range. In addition, the acetal structure in the backbone and in the substituted groups endows the photoresist of the copolymer with superior dry etch resistance.

Abstract: N-vinyllactam derivatives protected at the 3-position are provided and represented by the following formula (I). These are polymerized into homo- and copolymers for use in microlithography of semiconductor manufacture. The polymers are used as a photoresist material suitable for a deep UV process so that pictures of high sensitivity and high resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in pattern formation can be accomplished through the use of the photoresist of the invention.