Patents by Inventor Jin Cai
Jin Cai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230300702Abstract: This disclosure generally relates performing UE authentication and registration with the core network, and in particular, to supporting secure interactions between the UE and the target AMF when the UE is re-allocated to the target AMF from an initial AMF. The Access Network element stores a candidate AMF list, and optionally, the original Registration Request message from the UE. The initial AMF, once determines an AMF re-allocation is needed, instruct the UE to re-start the registration procedure with the core network according to the stored candidate AMF list. With the solutions provided in this disclosure, the message interactions between the UE and the target AMF are integrity protected, without the need to upgrade the UE and without using an indirect connection of the core network.Type: ApplicationFiled: May 24, 2023Publication date: September 21, 2023Applicant: ZTE CorporationInventors: Shilin YOU, Jiyan CAI, Jinguo ZHU, Yuze LIU, Jin PENG, Zhen XING, Zhaoji LIN
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Publication number: 20230235964Abstract: The present invention provides a fog dissipation device and a cooling tower, and relates to the technical field of cooling towers. The fog dissipation device comprises: a first flow path and a second flow path which are stacked to exchange heat between a first air flow and a second air flow flowing from bottom to top; a first outflow port through which the first air flow flowing out of the first flow path is discharged to the upper side of the fog dissipation device; and, a second outflow port through which the second air flow flowing out of the second flow path is discharged to the upper side of the fog dissipation device, wherein the first outflow port and the second outflow port are alternately stacked. The fog dissipation device can play a role in water-saving fog dissipation. The cooling tower comprises the fog dissipation device described above.Type: ApplicationFiled: November 17, 2020Publication date: July 27, 2023Inventors: Jin Peng LI, Liang Cai CHEN, Zhen Xing LIN, Jin LI, Yan LIU, Gang SUN, Min LIU, Juan DU
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Publication number: 20230232240Abstract: Provided are a subscription data update method and apparatus, a node, and a storage medium, where the method includes: in a case where a first network function node determines that authentication and key management for applications (AKMA) subscription data of a user is updated, determining, by the first network function node, a second network function node storing an AKMA context of the user; sending, by the first network function node, a subscription data management notification message to the second network function node; and receiving, by the first network function node, a subscription data management notification response message sent by the second network function node; where the subscription data management notification response message is sent after the second network function node deletes the AKMA context of the user according to the subscription data management notification message.Type: ApplicationFiled: November 16, 2022Publication date: July 20, 2023Applicant: ZTE CorporationInventors: Shilin YOU, Jiyan CAI, Zhaoji LIN, Jin PENG, Yuze LIU, Zhen XING, Jigang WANG, Min LIU
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Publication number: 20230134741Abstract: A device includes a vertical stack of semiconductor nanostructures, a gate structure, a first epitaxial region and a dielectric structure. The gate structure wraps around the semiconductor nanostructures. The first epitaxial region laterally abuts a first semiconductor nanostructure of the semiconductor nanostructures. The dielectric structure laterally abuts a second semiconductor nanostructure of the semiconductor nanostructures and vertically abuts the first epitaxial region.Type: ApplicationFiled: May 3, 2022Publication date: May 4, 2023Inventors: Yu-Xuan HUANG, Hou-Yu CHEN, Jin CAI, Zhi-Chang LIN, Chih-Hao WANG
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Publication number: 20230039440Abstract: A device includes a substrate. A channel region of a transistor overlies the substrate and a source/drain region is in contact with the channel region. The source/drain region is adjacent to the channel region along a first direction. A source/drain contact is disposed on the source/drain region. A gate electrode is disposed on the channel region and a gate contact is disposed on the gate electrode. A first low-k dielectric layer is disposed between the gate contact and the source/drain contact along the first direction.Type: ApplicationFiled: March 15, 2022Publication date: February 9, 2023Inventors: Meng-Huan JAO, Huan-Chieh SU, Yi-Bo LIAO, Cheng-Chi CHUANG, Jin CAI, Chih-Hao WANG
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Publication number: 20230037927Abstract: An integrated circuit includes a two-dimensional transistor having a channel region having lateral ends in contact with first and second source/drain regions. The transistor includes a gate dielectric that is aligned with the lateral ends of the channel region. The transistor includes a gate metal on the gate dielectric. The gate metal has a relatively small lateral overlap of the first and second source/drain regions.Type: ApplicationFiled: January 21, 2022Publication date: February 9, 2023Inventors: Cheng-Ting CHUNG, Jin CAI
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Patent number: 11560524Abstract: Disclosed are a pulverized coal preprocessing method and a pulverized coal gasifying method. The pulverized coal preprocessing method comprises the following steps: (1) performing pore broadening on pulverized coal to obtain preprocessed pulverized coal; (2) loading alkali metal ions into the preprocessed pulverized coal under an ion exchange condition to obtain alkali metal loaded pulverized coal. The method further comprises loading a chrome complex into the alkali metal loaded pulverized coal obtained in described step (2). In gasification, the pulverized coal loaded with alkali metal potassium and chrome catalysts obtained by the method has the advantages of high sulphur removal rate, high carbon conversion rate, short gasifying reaction time and high methane production.Type: GrantFiled: October 28, 2019Date of Patent: January 24, 2023Assignees: CHINA PETROLEUM & CHEMICAL CORPORATION, SINOPEC NANJING RESEARCH INSTITUTE OF CHEMICAL INDUSTRY CO., LTD.Inventors: Jinli Wang, Jin Cai, Yang Yu, Yusheng Yin, Haitao Li, Yanfang Zhu, Xianliang Huang, Huijun Wang, Bengang Xu, Jie Zhang, Xueqi Wu, Lin Wu
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Patent number: 11522085Abstract: A ferroelectric semiconductor device and method are described herein. The method includes performing a diffusion anneal process to drive elements of a dopant film through an amorphous silicon layer and into a gate dielectric layer over a fin to form a doped gate dielectric layer with a gradient depth profile of dopant concentrations. The doped gate dielectric layer is crystallized during a post-cap anneal process to form a gradient depth profile of ferroelectric properties within the crystallized gate dielectric layer. A metal gate electrode is formed over the crystallized gate dielectric layer to obtain a ferroelectric transistor with multi-ferroelectric properties between the gate electrode and the channel. The ferroelectric transistor may be used in deep neural network (DNN) applications.Type: GrantFiled: October 18, 2019Date of Patent: December 6, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chia-Cheng Ho, Ming-Shiang Lin, Jin Cai
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Publication number: 20220367718Abstract: A ferroelectric semiconductor device and method are described herein. The method includes performing a diffusion anneal process to drive elements of a dopant film through an amorphous silicon layer and into a gate dielectric layer over a fin to form a doped gate dielectric layer with a gradient depth profile of dopant concentrations. The doped gate dielectric layer is crystallized during a post-cap anneal process to form a gradient depth profile of ferroelectric properties within the crystallized gate dielectric layer. A metal gate electrode is formed over the crystallized gate dielectric layer to obtain a ferroelectric transistor with multi-ferroelectric properties between the gate electrode and the channel. The ferroelectric transistor may be used in deep neural network (DNN) applications.Type: ApplicationFiled: July 27, 2022Publication date: November 17, 2022Inventors: Chia-Cheng Ho, Ming-Shiang Lin, Jin Cai
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Publication number: 20220366977Abstract: A method includes: generating a first difference between a first resistance value of a first memory cell and a first predetermined resistance value; generating a first signal based on the first difference; applying the first signal to the first memory cell to adjust the first resistance value; and after the first signal is applied to the first memory cell, comparing the first resistance value and the first predetermined resistance value, to further adjust the first resistance value until the first resistance value reaches the first predetermined resistance value. A memory device is also disclosed herein.Type: ApplicationFiled: July 28, 2022Publication date: November 17, 2022Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Jau-Yi WU, Win-San KHWA, Jin CAI, Yu-Sheng CHEN
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Publication number: 20220359736Abstract: A method includes etching a dielectric layer to form a dielectric fin, depositing a transition metal dichalcogenide layer on the dielectric fin, and performing an anisotropic etching process on the transition metal dichalcogenide layer. Horizontal portions of the transition metal dichalcogenide layer are removed, and vertical portions of the transition metal dichalcogenide layer on sidewalls of the dielectric fin remain to form a vertical semiconductor ring. The method further includes forming a gate stack on a first portion of the two-dimensional semiconductor vertical semiconductor ring, and forming a source/drain contact plug, wherein the source/drain contact plug contacts sidewalls of a second portion of the vertical semiconductor ring.Type: ApplicationFiled: July 27, 2022Publication date: November 10, 2022Inventors: Sheng-Kai Su, Jin Cai
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Publication number: 20220359031Abstract: A control circuit, a memory system and a control method are provided. The control circuit is configured to control a plurality of memory cells of a memory array. The control circuit comprises a program controller. The program is configured to program a first electrical characteristic distribution and a second electrical characteristic distribution of the memory cells according to error tolerance of a first bit of a data type. A first overlapping area between the first electrical characteristic distribution and the second electrical characteristic distribution is smaller than a first predetermined value.Type: ApplicationFiled: August 23, 2021Publication date: November 10, 2022Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Win-San Khwa, Jen-Chieh Liu, Meng-Fan Chang, Tung-Ying Lee, Jin Cai
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Publication number: 20220352590Abstract: A battery pack includes at least one battery cell configured to provide electrical power to a device, a housing configured to receive the at least one battery cell, a latch cantilevered on the housing and configured to couple the battery pack to the device, an actuator configured to move the latch toward a release position in which the latch is configured to release the battery pack from the device, and a latch insert. At least one of the latch or the actuator is at least partially molded over the latch insert.Type: ApplicationFiled: April 29, 2022Publication date: November 3, 2022Inventors: Richard M. SEBZDA, Gurusiddeshwar GUDIMANI, Cameron R. SCHULZ, John G. MARX, Jin Cai LI
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Patent number: 11489064Abstract: A method includes etching a dielectric layer to form a dielectric fin, depositing a transition metal dichalcogenide layer on the dielectric fin, and performing an anisotropic etching process on the transition metal dichalcogenide layer. Horizontal portions of the transition metal dichalcogenide layer are removed, and vertical portions of the transition metal dichalcogenide layer on sidewalls of the dielectric fin remain to form a vertical semiconductor ring. The method further includes forming a gate stack on a first portion of the two-dimensional semiconductor vertical semiconductor ring, and forming a source/drain contact plug, wherein the source/drain contact plug contacts sidewalls of a second portion of the vertical semiconductor ring.Type: GrantFiled: May 26, 2020Date of Patent: November 1, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Sheng-Kai Su, Jin Cai
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Publication number: 20220341868Abstract: The present invention relates to the technical field of glucose detection, and in particular to an enzyme-free glucose sensor and a fabrication method and use thereof. In the present invention, Magnolia grandiflora L. leaves are used as a carbon-based catalyst, which serve as a base material to well disperse nickel atoms and improve the catalytic activity of a material. A prepared Ni@NSiC nano-molecular layer is used to modify a pretreated white glassy carbon electrode (GCE) to obtain a highly-active material-modified working electrode Ni@NSiC/GCE, and then glucose is detected through cyclic voltammetry (CV) and chronoamperometry (CA).Type: ApplicationFiled: April 30, 2021Publication date: October 27, 2022Applicant: Jiangsu UniversityInventors: Quan BU, Jin CAI, Hairong LONG, Mei WANG, Hanping MAO
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Publication number: 20220311099Abstract: A battery pack including a housing and a plurality of battery cells at least partially received within the housing. The plurality of battery cells include adjacent first and second battery cells arranged within the housing in a common relative orientation. A separator forms a physical barrier between a portion of the first battery cell and a portion of the second battery cell. An electrically conductive member connects a third battery cell to at least one of the first and second battery cells. The separator supports the electrically conductive member integrally formed therein.Type: ApplicationFiled: March 10, 2022Publication date: September 29, 2022Inventors: Richard M. SEBZDA, Gurusiddeshwar GUDIMANI, David HERNANDEZ, JR., Jin Cai LI
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Publication number: 20220302315Abstract: The various described embodiments provide a transistor with a negative capacitance, and a method of creating the same. The transistor includes a gate structure having a ferroelectric layer. The ferroelectric layer is formed by forming a thick ferroelectric film, annealing the ferroelectric film to have a desired phase, and thinning the ferroelectric film to a desired thickness of the ferroelectric layer. This process ensures that the ferroelectric layer will have ferroelectric properties regardless of its thickness.Type: ApplicationFiled: June 9, 2022Publication date: September 22, 2022Inventors: Feng Yuan, Ming-Shiang Lin, Chia-Cheng Ho, Jin Cai, Tzu-Chung Wang, Tung Ying Lee
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Publication number: 20220302389Abstract: A method includes depositing a dielectric layer over a substrate, forming carbon nanotubes on the dielectric layer, forming a dummy gate stack on the carbon nanotubes, forming gate spacers on opposing sides of the dummy gate stack, and removing the dummy gate stack to form a trench between the gate spacers. The carbon nanotubes are exposed to the trench. The method further includes etching a portion of the dielectric layer underlying the carbon nanotubes, with the carbon nanotubes being suspended, forming a replacement gate dielectric surrounding the carbon nanotubes, and forming a gate electrode surrounding the replacement gate dielectric.Type: ApplicationFiled: May 5, 2021Publication date: September 22, 2022Inventors: Jin Cai, Sheng-Kai Su
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Patent number: 11443803Abstract: A method includes: applying a first signal to memory cells in a memory device, to adjust resistance values of the memory cells; after applying the first signal, applying a second signal to the memory cells other than a first memory cell in the memory cells, to further adjust the resistance values of the memory cells other than the first memory cell. A memory device is also disclosed herein.Type: GrantFiled: November 11, 2020Date of Patent: September 13, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Jau-Yi Wu, Win-San Khwa, Jin Cai, Yu-Sheng Chen
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Patent number: 11430209Abstract: The present disclosure relates to image signal processing methods, apparatus, and devices. One example image signal processing method includes obtaining an image signal, where the image signal is derived based on a sensor signal collected by an image sensor, recognizing, by using a neural network, a scene to which the image signal belongs, determining, by using attribute information of the image signal, whether the scene is accurate, and in response to determining that the scene is accurate, performing enhancement processing on the image signal based on the scene to generate an enhanced image signal.Type: GrantFiled: April 9, 2020Date of Patent: August 30, 2022Assignee: Huawei Technologies Co., Ltd.Inventors: Jin Cai, Guoxiang Liu, Hui Chen