Abstract: A software package, a gateway for transmitting the same, and a software update method using the same are provided. A software package includes a binary file, a configuration file, and a hash file. The binary file includes read-only memory (ROM) data of a target controller. A management server generates the configuration file by combining a hash value obtained by hashing the binary file with meta information indicating an update procedure between a gateway and the target controller. The management server generates the hash file by hashing the configuration file. The gateway receives the software package and extract the binary file and the configuration file. The gateway transmits the binary file to the target controller according to the update procedure indicated by the meta information.

Abstract: A vehicular software update system for remotely performing a software update of a vehicle and a method thereof are provided. The vehicular software update system includes a management controller installed in a vehicle and a server that performs a remote software update in cooperation with the management controller. The management controller controls the vehicle to start in response to receiving a request for the remote software update from the server, downloads software for update from the server after controlling the vehicle to start, transmits the downloaded software for update to a performance controller in the background, determines whether the transmission of the software for update in the background is completed based on the vehicle being turned off, and performs a software update of the performance controller using the software for update based on the transmission of the software for update in the background being completed.

Abstract: A vehicular software update system includes a management controller coupled to a vehicle and at least one performance controller that receives software for over-the-air (OTA) update in the background from the management controller. The management controller determines a network load of the vehicle and adjusts a transmission speed of the software for OTA update, the software being transmitted to the at least one performance controller, based on a driving state of the vehicle and the network load of the vehicle.

Abstract: A method for manufacturing a semiconductor device include forming a dielectric layer over an underlying layer; forming an etch barrier over the dielectric layer, wherein a partial via opening is formed in the etch barrier and exposes a lower portion of the etch barrier; forming an assist-etch barrier over the etch barrier to fill the partial via opening; patterning the assist-etch barrier to form an initial trench opening in the assist-etch barrier, wherein the initial trench opening communicates with the partial via opening; patterning the lower portion of the etch barrier exposed by the partial via opening to form a final via opening in the etch barrier; patterning the dielectric layer exposed by the final via opening to form an initial via hole in the dielectric layer; patterning the etch barrier exposed by the initial trench opening to form a final trench opening in the etch barrier; patterning a lower portion of the dielectric layer exposed by the initial via hole to form a final via hole in the dielectr

Abstract: A method for manufacturing a semiconductor device include forming a dielectric layer over an underlying layer; forming an etch barrier over the dielectric layer, wherein a partial via opening is formed in the etch barrier and exposes a lower portion of the etch barrier; forming an assist-etch barrier over the etch barrier to fill the partial via opening; patterning the assist-etch barrier to form an initial trench opening in the assist-etch barrier, wherein the initial trench opening communicates with the partial via opening; patterning the lower portion of the etch barrier exposed by the partial via opening to form a final via opening in the etch barrier; patterning the dielectric layer exposed by the final via opening to form an initial via hole in the dielectric layer; patterning the etch barrier exposed by the initial trench opening to form a final trench opening in the etch barrier; patterning a lower portion of the dielectric layer exposed by the initial via hole to form a final via hole in the dielectr