Patents by Inventor Jin-Han Cho

Jin-Han Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120319030
    Abstract: Disclosed is a multifunctional colloidal nanocomposite derived from nucleophilic substitution-induced layer-by-layer assembly in organic media. The multifunctional colloidal nanocomposite includes: silica colloids coated with aminopropyltrimethoxysilane; and a plurality of nanoparticle layers highly densely adsorbed onto the coated silica colloids. The multifunctional colloidal nanocomposite has a highly dense multilayer structure in which 2-bromo-2-methylpropionic acid (BMPA)-stabilized quantum dot nanoparticles and an amine-functionalized polymer are adsorbed onto silica colloids using a nucleophilic substitution reaction-based layer-by-layer assembly method. Due to this structure, the multifunctional colloidal nanocomposite can be dispersed in various organic solvents, including polar and nonpolar organic solvents.
    Type: Application
    Filed: June 19, 2012
    Publication date: December 20, 2012
    Inventor: Jin Han CHO
  • Patent number: 6881444
    Abstract: The present invention provides a process for fabricating ultrathin monolayers or ultrathin multilayer films, the process comprising the steps of: introducing positive or negative charge or a material capable of hydrogen-bonding to a substrate and placing the substrate on a spinner(pretreating step); introducing a material (A) bindable with the material deposited on the substrate, and spinning the substrate at 500 rpm to 30000 rpm for 4 to 200 seconds(first coating step); dropping washing solvent onto the substrate after completion of the first coating and spinning the substrate at 500 rpm to 30000 rpm for 4 to 200 sec to remove weakly-bound material (A) and form a thin film (A)(first washing step); introducing another material (B) bindable with the material (A) coated on the substrate and further coating it in the same condition as of the first coating(second coating step), dropping washing solvent onto the substrate after completion of the second coating and spinning the substrate at 500 rpm to 30000 rpm for
    Type: Grant
    Filed: January 18, 2002
    Date of Patent: April 19, 2005
    Inventors: Jong-Dal Hong, Kook-Heon Char, Jin-Han Cho
  • Publication number: 20030026898
    Abstract: The present invention provides a process for fabricating ultrathin monolayers or ultrathin multilayer films, the process comprising the steps of: introducing positive or negative charge or a material capable of hydrogen-bonding to a substrate and placing the substrate on a spinner(pretreating step); introducing a material (A) bindable with the material deposited on the substrate, and spinning the substrate at 500 rpm to 30000 rpm for 4 to 200 seconds(first coating step); dropping washing solvent onto the substrate after completion of the first coating and spinning the substrate at 500 rpm to 30000 rpm for 4 to 200 sec to remove weakly-bound material (A) and form a thin film (A)(first washing step); introducing another material (B) bindable with the material (A) coated on the substrate and further coating it in the same condition as of the first coating(second coating step), dropping washing solvent onto the substrate after completion of the second coating and spinning the substrate at 500 rpm to 30000 rpm for
    Type: Application
    Filed: January 18, 2002
    Publication date: February 6, 2003
    Inventors: Jong-Dal Hong, Kook-Heon Char, Jin-Han Cho