Abstract: A laser annealing method includes selecting a reference intensity from a plurality of intensities of a plurality of peaks; where the reference intensity is used to determine a pulse shape of laser irradiation during laser annealing, setting the pulse shape by setting an intensity ratio of a first peak having a smallest peak occurrence time among the plurality of peaks to less than about 100 percent relative to the reference intensity, and irradiating a laser beam having the pulse shape to a stage.

Abstract: A laser beam irradiation apparatus includes a laser light source, a controller for controlling energy of light generated by the laser source, a first optical system for adjusting a shape of light that has passed through the controller, a scanner for adjusting the direction of light that has passed through the first optical system, and an F-theta lens for reducing a beam that has passed through the scanner.

Abstract: A laser annealing apparatus includes a plurality of lasers, a laser controller that controls the plurality of lasers such that a plurality of laser beams generated from the plurality of lasers is emitted at different timings, beam mixer optics that outputs a processing beam by mixing the plurality of laser beams of which output timings are adjusted, and focus optics that outputs the processing beam of which focus is adjusted. The processing beam includes a first processing laser beam having a first pulse, a second processing laser beam having a second pulse following the first pulse, and a third processing laser beam having a third pulse following the second pulse. A first peak of the first pulse is smaller than a second peak of the second pulse, and a third peak of the third pulse is smaller than the second peak.

Abstract: A laser crystallization apparatus according to an embodiment includes: a light source unit which irradiates a laser beam; and a path conversion unit which converts the laser beam incident from the light source unit into a linear beam having a long axis parallel to a first direction and a short axis parallel to a second direction. The linear beam propagates in a third direction perpendicular to the first direction and the second direction, the path conversion unit includes an incident window extending parallel to a first length direction, an emission window extending parallel to a second direction, a first reflection unit disposed at the same side with the incident window, and a second reflection unit disposed at the same side with the emission window, and the second length direction extends parallel to the first direction in a view of the third direction.

Abstract: A laser crystallization apparatus according to an embodiment includes a light source unit irradiating a laser beam; and an optical unit to which the laser beam is incident, wherein the optical unit includes a first portion and a second portion bonded to each other on a bonded surface, and a first width of the first portion and a second width of the second portion are the same as each other on the bonded surface based on a direction parallel to the incident direction of the laser beam.

Abstract: A deposition apparatus includes a vacuum chamber, a substrate disposed in the vacuum chamber, a deposition source disposed in the vacuum chamber and facing the substrate to provide a deposition material onto the substrate, a laser oscillator generating a first laser beam, and an optical unit connected to a first side of the vacuum chamber and splitting the first laser beam to generate a plurality of mask laser beams. The mask laser beams are irradiated into the vacuum chamber to be disposed between the substrate and the deposition source. The deposition material making contact with the mask laser beams is oxidized, and the deposition material passing through the mask laser beams is deposited on the substrate.

Abstract: A laser beam irradiation apparatus includes a laser light source, a controller for controlling energy of light generated by the laser source, a first optical system for adjusting a shape of light that has passed through the controller, a scanner for adjusting the direction of light that has passed through the first optical system, and an F-theta lens for reducing a beam that has passed through the scanner.

Abstract: A deposition apparatus includes a vacuum chamber, a substrate disposed in the vacuum chamber, a deposition source disposed in the vacuum chamber and facing the substrate to provide a deposition material onto the substrate, a laser oscillator generating a first laser beam, and an optical unit connected to a first side of the vacuum chamber and splitting the first laser beam to generate a plurality of mask laser beams. The mask laser beams are irradiated into the vacuum chamber to be disposed between the substrate and the deposition source. The deposition material making contact with the mask laser beams is oxidized, and the deposition material passing through the mask laser beams is deposited on the substrate.

Abstract: A laser beam irradiation apparatus includes a laser light source, a controller for controlling energy of light generated by the laser source, a first optical system for adjusting a shape of light that has passed through the controller, a scanner for adjusting the direction of light that has passed through the first optical system, and an F-theta lens for reducing a beam that has passed through the scanner.

Abstract: An exposure apparatus capable of preventing a reduction in its accuracy due to, for example, the influence of aging or the influence of heat is disclosed. Also disclosed is a method of controlling the same, and an alignment method for exposure. In one aspect, the exposure apparatus includes a main stage for adjusting a position of a substrate, a beam irradiation unit for irradiating a beam onto a mask, and a beam monitoring unit having a position fixed with respect to the main stage, and for recognizing the beam emitted from the beam irradiation unit and passed through one pattern of the mask.

Abstract: A laser induced thermal imaging device includes a substrate stage configured to support a substrate and a donor film; a beam radiation portion configured to emit a laser beam toward the donor film to image an imaging layer of the donor film on a pixel region on the substrate; an error measurement portion configured to determine a position of the laser beam and a position of the pixel region from the donor film to measure a pattern error; and a stage moving portion configured to move the substrate stage in accordance with the pattern error to correct the pattern error.

Abstract: A laser thermal imaging apparatus includes a substrate stage configured to receive a substrate, a beam irradiation unit over the substrate stage, the beam irradiation unit being configured to irradiate an alignment laser beam onto an alignment mark of the substrate, and a beam observing unit facing the beam irradiation unit, the substrate stage being interposed between the beam observing unit and the beam irradiation unit, the beam observing unit being configured to observe the alignment laser beam and a shadow of the alignment mark formed by the alignment mark.

Abstract: A laser patterning examining apparatus includes a fixing plate, a rotating plate configured to move vertically with respect to the fixing plate and to rotate, a housing connected to the rotating plate, a laser emission unit over the fixing plate and emits a laser beam, a prism unit on the housing and refracts a first portion of the laser beam received from the laser emission unit and transmits a second portion of the laser beam, and a beam profiler on the housing and analyzes the pattern of the first portion refracted by the prism unit.

Abstract: A laser beam irradiation apparatus includes a laser light source, a controller for controlling energy of light generated by the laser source, a first optical system for adjusting a shape of light that has passed through the controller, a scanner for adjusting the direction of light that has passed through the first optical system, and an F-theta lens for reducing a beam that has passed through the scanner.

Abstract: A laser induced thermal imaging device includes a substrate stage configured to support a substrate and a donor film; a beam radiation portion configured to emit a laser beam toward the donor film to image an imaging layer of the donor film on a pixel region on the substrate; an error measurement portion configured to determine a position of the laser beam and a position of the pixel region from the donor film to measure a pattern error; and a stage moving portion configured to move the substrate stage in accordance with the pattern error to correct the pattern error.

Abstract: A deposition apparatus includes a vacuum chamber, a substrate disposed in the vacuum chamber, a deposition source disposed in the vacuum chamber and facing the substrate to provide a deposition material onto the substrate, a laser oscillator generating a first laser beam, and an optical unit connected to a first side of the vacuum chamber and splitting the first laser beam to generate a plurality of mask laser beams. The mask laser beams are irradiated into the vacuum chamber to be disposed between the substrate and the deposition source. The deposition material making contact with the mask laser beams is oxidized, and the deposition material passing through the mask laser beams is deposited on the substrate.

Abstract: An exposure apparatus capable of preventing a reduction in its accuracy due to, for example, the influence of aging or the influence of heat is disclosed. Also disclosed is a method of controlling the same, and an alignment method for exposure. In one aspect, the exposure apparatus includes a main stage for adjusting a position of a substrate, a beam irradiation unit for irradiating a beam onto a mask, and a beam monitoring unit having a position fixed with respect to the main stage, and for recognizing the beam emitted from the beam irradiation unit and passed through one pattern of the mask.

Abstract: A laser patterning examining apparatus includes a fixing plate, a rotating plate configured to move vertically with respect to the fixing plate and to rotate, a housing connected to the rotating plate, a laser emission unit over the fixing plate and emits a laser beam, a prism unit on the housing and refracts a first portion of the laser beam received from the laser emission unit and transmits a second portion of the laser beam, and a beam profiler on the housing and analyzes the pattern of the first portion refracted by the prism unit.

Abstract: A laser thermal imaging apparatus includes a substrate stage configured to receive a substrate, a beam irradiation unit over the substrate stage, the beam irradiation unit being configured to irradiate an alignment laser beam onto an alignment mark of the substrate, and a beam observing unit facing the beam irradiation unit, the substrate stage being interposed between the beam observing unit and the beam irradiation unit, the beam observing unit being configured to observe the alignment laser beam and a shadow of the alignment mark formed by the alignment mark.