Abstract: Disclosed are heat-ray cutoff compounds, films and method using them. The heat-ray compound is produced by dispersing conductive nanoparticles in an amphoteric solvent with acids and dispersion sol, which provides a low cost production for the heat-ray cutoff films because it is able to any resin binder without sorting the kinds of resin binders (hydrolic or alcoholic, or anti-hydrolic).

Abstract: A bus arbitration system, medium, and method. The bus arbitration system can arbitrate access to a bus for a plurality of masters, requesting the use of a bus to which at least one slave is connected, and may include a bus use granting unit that outputs a plurality of bus grant signals for granting the use of the bus to the plurality of masters that request the use of the bus at the same time, a simultaneous processing available signal selecting unit that selects a predetermined number of operation instruction signals having a predetermined similarity, from among a plurality of operation instruction signals that are input from the masters, in response to the bus grant signals, and an operation instructing unit that simultaneously transmits the selected operation instruction signals to the slave through the bus.

Abstract: A reflective photomask for EUV light is disclosed. The reflective photomask may include a projecting pattern selectively formed on a substrate and a reflective layer on the substrate and the projecting pattern.

Abstract: In a method of forming fine patterns, a photocurable coating layer is formed on a substrate. A first surface of a template makes contact with the photocurable coating layer. The first surface of the template includes at least two first patterns having a first dispersion degree of sizes, and at least one portion of the first surface of the template includes a photo attenuation member. A light is irradiated onto the photocurable coating layer through the template to form a cured coating layer including second patterns having a second dispersion degree of sizes. The second patterns are generated from the first patterns and the second dispersion degree is less than the first dispersion degree. The template is separate from the cured coating layer. A size dispersion degree of the patterns used in a nanoimprint lithography process may be adjusted by the light attenuation member, so that the fine patterns may be formed to have an improved size dispersion degree.

Abstract: A method of detecting reticle error may include using an optical source of an exposure unit to cause light to be incident on a reticle installed in the exposure unit, and detecting the reticle error using only 0th diffraction light from among diffraction lights transmitted through the reticle. A method of detecting reticle error may include: installing a reticle, including a mask substrate and mask patterns having a critical dimension formed on the mask substrate, in an exposure unit to cause light to be incident on the reticle; exposing a photoresist film disposed on a wafer in the exposure unit using only 0th diffraction light from among diffraction lights transmitted through the reticle; developing the exposed photoresist film; and analyzing a thickness change, an image, or the thickness change and image of the developed photoresist film, in order to detect the reticle error at a wafer level.

Abstract: A rendering apparatus and method are provided. The rendering method includes: reading a block, corresponding to a fragment, from among compressed blocks stored in a depth buffer, by considering frequency information corresponding to the fragment and prepared in advance; and performing a depth test for the fragment by considering the restored block.

Abstract: The present invention relates to compositions for functional films, and more particularly to compositions for functional films such as a heat ray screening film compatible with hydrolic or alcoholic and anti-hydrolic resin binder, a near infrared screening film, a chrominance correcting film, a conductive film, a magnetic film, a ferromagnetic film, a dielectric film, a ferroelectric film, an electrochromic film, an electroluminescence film, an insulating film, a reflecting film, a reflection preventing film, a catalyst film, a photocatalyst film, a light selectively absorbing film, a hard film, and a heat resisting film, films formed therefrom, and a method of forming the compositions and the films.

Abstract: A photomask and a method of controlling a transmittance and phase of light using the photomask are disclosed. The photomask comprises a transparent substrate, and a plurality of lattices formed on the back face of the transparent substrate. The plurality of lattices are binary lattices, each having a duty ratio and a tilt angle. The duty ratio and tilt angle are controlled together in order to simultaneously control transmittance and phase of light transmitted through the photomask.

Abstract: A bus arbitration system, medium, and method. The bus arbitration system can arbitrate access to a bus for a plurality of masters, requesting the use of a bus to which at least one slave is connected, and may include a bus use granting unit that outputs a plurality of bus grant signals for granting the use of the bus to the plurality of masters that request the use of the bus at the same time, a simultaneous processing available signal selecting unit that selects a predetermined number of operation instruction signals having a predetermined similarity, from among a plurality of operation instruction signals that are input from the masters, in response to the bus grant signals, and an operation instructing unit that simultaneously transmits the selected operation instruction signals to the slave through the bus.

Abstract: A reflective photomask for EUV light is disclosed. The reflective photomask may include a projecting pattern selectively formed on a substrate and a reflective layer on the substrate and the projecting pattern.

Abstract: A phase shift mask (PSM) is provided. The PSM includes a light-transmitting substrate, a light-blocking region, a first light-transmitting region, and a second light-transmitting region. The light-blocking region is formed in the light-transmitting substrate. The first light-transmitting region is formed as both a first phase shift region for transmitting 0°-phase shifted light and as a first polarization region for TE-polarizing the transmitted light. The second light-transmitting region contacts the first light-transmitting region to form a boundary. The second light-transmitting region is formed in the light-transmitting substrate as a second phase shift region for transmitting 180°-phase shifted light and as a second polarization region for TM-polarizing the transmitted light to prevent a phase conflict at the boundary.

Abstract: Determining a fuel injection amount of an engine system having a crank sensor and airflow sensor includes computing a speed change of engine revolutions per minute and computing a speed change of an intake-air amount. Comparing the speed change of the engine rpm and the speed change of the intake-air amount with reference values, and if vibration and reverse-flow are determined to occur in the intake manifold, correcting the intake-air amount into the present engine speed and computing the present intake-air amount. The fuel injection amount is then determined by using the above computed intake-air amount. This improves the accuracy of determining the credible range of the airflow sensor and increases the range using the airflow sensor.

Abstract: Determining a fuel injection amount of an engine system having a crank sensor and airflow sensor includes computing a speed change of engine revolutions per minute and computing a speed change of an intake-air amount. Comparing the speed change of the engine rpm and the speed change of the intake-air amount with reference values, and if vibration and reverse-flow are determined to occur in the intake manifold, correcting the intake-air amount into the present engine speed and computing the present intake-air amount. The fuel injection amount is then determined by using the above computed intake-air amount. This improves the accuracy of determining the credible range of the airflow sensor and increases the range using the airflow sensor.

Abstract: Disclosed are heat-ray cutoff compounds, films and method using them. The heat-ray compound is produced by dispersing conductive nanoparticles in an amphoteric solvent with acids and dispersion sol, which provides a low cost production for the heat-ray cutoff films because it is able to any resin binder without sorting the kinds of resin binders (hydrolic or alcoholic, or anti-hydrolic).

Abstract: A photomask and a method of controlling a transmittance and phase of light using the photomask are disclosed. The photomask comprises a transparent substrate, and a plurality of lattices formed on the back face of the transparent substrate. The plurality of lattices are binary lattices, each having a duty ratio and a tilt angle. The duty ratio and tilt angle are controlled together in order to simultaneously control transmittance and phase of light transmitted through the photomask.

Abstract: A fuel tank cradle device for forklift trucks is swingable to the lateral side and then foldable into a substantially vertical position, thereby assuring easy and safe change of a used fuel tank with a new one. The cradle device includes a counterweight, a cradle provided with a first body and a second body, the first body pivotally mounted to the counterweight for rotation between a home position above the counterweight and a rotated position outside of the counterweight, the second body capable of replaceably supporting a fuel tank and foldably connected to the first body so that the second body can be moved between an unfolded position and a downwardly folded position with respect to first body, and a locking arrangement for locking the cradle to the counterweight while the first body of the cradle is at the home position.

Abstract: A fuel tank cradle device for forklift trucks is swingable to the lateral side and then foldable into a substantially vertical position, thereby assuring easy and safe change of a used fuel tank with a new one. The cradle device includes a counterweight, a cradle provided with a first body and a second body, the first body pivotally mounted to the counterweight for rotation between a home position above the counterweight and a rotated position outside of the counterweight, the second body capable of replaceably supporting a fuel tank and foldably connected to the first body so that the second body can be moved between an unfolded position and a downwardly folded position with respect to first body, and a locking arrangement for locking the cradle to the counterweight while the first body of the cradle is at the home position.

Abstract: A method of fabricating a phase shift mask is provided in which light shield film patterns for setting a phase shift region and a phase non-shift region are simultaneously formed on a substrate. A groove is formed in the substrate set as the phase shift region. The light shield film pattern, which contacts the groove and is formed on a region of the substrate set as the phase non-shift region, is removed. A phase shift layer can be formed between the substrate and the light shield film pattern. In this case, regions set by the light shield film pattern become opposite to when the phase shift layer is not formed. That is, a phase shift region is changed into a phase non-shift region, and the phase non-shift region is changed into the phase shift region.

Abstract: A method of fabricating a phase shift mask is provided in which light shield film patterns for setting a phase shift region and a phase non-shift region are simultaneously formed on a substrate. A groove is formed in the substrate set as the phase shift region. The light shield film pattern, which contacts the groove and is formed on a region of the substrate set as the phase non-shift region, is removed. A phase shift layer is formed between the substrate and the light shield film pattern. In this case, regions set by the light shield film pattern become opposite to when the phase shift layer is not formed. That is, a phase shift region is changed into a phase non-shift region, and the phase non-shift region is changed into the phase shift region.

Abstract: Apparatus and method for measuring an aerial image whereby influences of various defects existing on patterns formed on a photomask as well as the surface of the photomask substrate can be inspected. The aerial image measuring apparatus includes an optical transmitting device, an optical reflecting device and an aerial image forming device. The optical reflecting device includes a beam splitter and a reflecting mirror. The reflecting mirror switches the path of light so that the light transmitted along the reflected light path is irradiated to the surface of the photomask on which the patterns are formed. According to an aerial image measuring method of the present invention, either transmitted light or reflected light is selected for analysis, the selected light is converted into an electrical signal to form an aerial image, and the aerial image is measured.