Patents by Inventor Jin-II Lee

Jin-II Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130230860
    Abstract: The present invention relates to an automatic real-time quantitative amplification system which can perform analysis of various biological samples, and more particularly to an automatic real-time quantitative amplification system in which a plurality of decks for respectively accommodating biological samples are put in a deck storing/transferring device, whereby it is possible to automatically analyze an amount or existence of a target substance containing a target nucleic acid in the biologic sample, such as a particular gene, a particular, a particular pathogenic bacterium and a particular protein, by amplifying the target nucleic acid purified by some processes of purification, purification after culture, or purification after reaction of the target substance contained in the bio-logical sample and then checking an amount of the amplified target nucleic acid.
    Type: Application
    Filed: October 27, 2011
    Publication date: September 5, 2013
    Applicant: BIONEER CORPORATION
    Inventors: Han Oh Park, Kwon Sic Kim, Yang Won Lee, Jin II Lee, Byung Rae Jeong, Jong Hoon Kim
  • Patent number: 7807497
    Abstract: Example embodiments may provide phase-change material layers and a method of forming a phase-change material layer and devices using the same by generating a plasma including helium and/or argon in a reaction chamber, forming a first material layer on the object by introducing a first source gas including a first material, forming a first composite material layer on the object by introducing a second source gas including a second material into the reaction chamber, forming a third material layer on the first composite material layer by introducing a third source gas including a third material, and forming a second composite material layer on the first composite material layer by introducing a fourth source gas including a fourth material. Example embodiment phase-change material layers including carbon may be more easily and/or quickly formed at lower temperatures under the helium/argon plasma environment by providing the source gases for various feeding times.
    Type: Grant
    Filed: July 12, 2007
    Date of Patent: October 5, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin-II Lee, Sung-Lae Cho, Young-Lim Park, Hye-Young Park
  • Publication number: 20090278107
    Abstract: The phase change memory device includes a first electrode and a second electrode and a first phase change material pattern and a second phase change material pattern interposed between the first electrode and the second electrode, wherein the first and second phase change material patterns have respectively different electrical characteristics.
    Type: Application
    Filed: May 7, 2009
    Publication date: November 12, 2009
    Inventors: Do-Hyung Kim, Jun-Soo Bae, Dong-Hyun Im, Sung-Lae Cho, Jin-II Lee, Hye-Young Park, Hee-Ju Shin
  • Publication number: 20080017841
    Abstract: Example embodiments may provide phase-change material layers and a method of forming a phase-change material layer and devices using the same by generating a plasma including helium and/or argon in a reaction chamber, forming a first material layer on the object by introducing a first source gas including a first material, forming a first composite material layer on the object by introducing a second source gas including a second material into the reaction chamber, forming a third material layer on the first composite material layer by introducing a third source gas including a third material, and forming a second composite material layer on the first composite material layer by introducing a fourth source gas including a fourth material. Example embodiment phase-change material layers including carbon may be more easily and/or quickly formed at lower temperatures under the helium/argon plasma environment by providing the source gases for various feeding times.
    Type: Application
    Filed: July 12, 2007
    Publication date: January 24, 2008
    Inventors: Jin-II Lee, Sung-Lae Cho, Young-Lim Park, Hye-Young Park