Abstract: In an exposure apparatus, exposure light from a lamp (continuous light source) (9) is applied at an exposure station (exposure section) (2) to a substrate (4), which is being transferred at a fixed speed in a fixed direction by a substrate transfer section (5), through a mask (11) arranged on an optical axis (optical path) (S) of an exposure optical system (3). At the time of exposing an image of an opening section (11a) of the mask (11) on the substrate (4), the front edge and the side edge (pattern edge) of a pixel (reference pattern) (18) previously formed on the substrate (4) are photographed by a linear CCD (20) of an imaging section (6), and a reference position in the transfer direction and a direction vertical to such direction on the substrate (4) is detected.

Abstract: A production method of a substrate for a liquid crystal display in which an exposure pattern of a color filter or a black matrix is formed in a predetermined position of a TFT substrate at a high level of precision. Therefore the production method includes following steps: applying a photosensitive material for a color filter or a black matrix onto a TFT substrate; image-capturing a pixel region by an imaging unit while transporting the TFT substrate coated with the photosensitive material at a predetermined velocity by a transporting unit; detecting a reference position preset in the pixel region image-captured by the imaging unit at an image processing section of a control unit; and controlling irradiation timing of a light source in an exposure optical system by a lamp controller with reference to the detected reference position, and forming an exposure pattern of a color filter or a black matrix at a predetermined position of the TFT substrate.

Abstract: In an exposure apparatus, exposure light from a lamp (continuous light source) (9) is applied at an exposure station (exposure section) (2) to a substrate (4), which is being transferred at a fixed speed in a fixed direction by a substrate transfer section (5), through a mask (11) arranged on an optical axis (optical path) (S) of an exposure optical system (3). At the time of exposing an image of an opening section (11a) of the mask (11) on the substrate (4), the front edge and the side edge (pattern edge) of a pixel (reference pattern) (18) previously formed on the substrate (4) are photographed by a linear CCD (20) of an imaging section (6), and a reference position in the transfer direction and a direction vertical to such direction on the substrate (4) is detected.

Abstract: A production method of a substrate for a liquid crystal display in which an exposure pattern of a color filter or a black matrix is formed in a predetermined position of a TFT substrate at a high level of precision. Therefore the production method includes following steps: applying a photosensitive material for a color filter or a black matrix onto a TFT substrate; image-capturing a pixel region by an imaging unit while transporting the TFT substrate coated with the photosensitive material at a predetermined velocity by a transporting unit; detecting a reference position preset in the pixel region image-captured by the imaging unit at an image processing section of a control unit; and controlling irradiation timing of a light source in an exposure optical system by a lamp controller with reference to the detected reference position, and forming an exposure pattern of a color filter or a black matrix at a predetermined position of the TFT substrate.