Abstract: Disclosed herein are a logical qubit execution apparatus and method. The logical qubit execution apparatus may be configured to execute, by a logical execution layer, a quantum circuit including requested logical qubits using a lattice surgery operation, generate, by the logical execution layer, measurement results of the logical qubits by combining measurement results of logical Pauli frames, generate, by a physical execution layer, a physical qubit circuit by converting a logical qubit operation corresponding to the measurement results of the logical qubits into a physical qubit operation, and measure, by the physical execution layer, results of an operation on physical Pauli frames by executing the physical qubit circuit.

Abstract: The present invention discloses an encoding apparatus using a Discrete Cosine Transform (DCT) scanning, which includes a mode selection means for selecting an optimal mode for intra prediction; an intra prediction means for performing intra prediction onto video inputted based on the mode selected in the mode selection means; a DCT and quantization means for performing DCT and quantization onto residual coefficients of a block outputted from the intra prediction means; and an entropy encoding means for performing entropy encoding onto DCT coefficients acquired from the DCT and quantization by using a scanning mode decided based on pixel similarity of the residual coefficients.

Abstract: A method of fabricating a semiconductor device with conductive patterns comprises sequentially forming an etch-target layer and a middle mold layer on a substrate, forming a first upper mold pattern and a second upper mold pattern on the middle mold layer to have top surfaces at different levels, etching the middle mold layer using the first and second upper mold patterns as an etch mask to form first and second middle mold patterns, respectively, forming a third middle mold pattern between the first and second middle mold patterns, and etching the etch-target layer using the first to third middle mold patterns as an etch mask to form conductive patterns.