Patents by Inventor Jin J. Wang

Jin J. Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200075313
    Abstract: Systems and processes for oxide removal from titanium nitride surfaces are provided. In one example implementation, A method includes placing a workpiece on a workpiece support in a processing chamber. The workpiece can have a titanium nitride layer. The method can include performing a plasma-based oxide removal process on the titanium nitride layer. The plasma-based oxide removal process can include: generating one or more species by inducing a plasma in a process gas with a plasma source; and exposing the workpiece to species generated in the plasma. The process gas can include a mixture of a first gas and a second gas. The first gas can include one or more of a hydrogen containing gas and a nitrogen containing gas. The second gas can include a fluorine containing gas.
    Type: Application
    Filed: August 7, 2019
    Publication date: March 5, 2020
    Inventors: Jin J. Wang, Hua Chung