Patents by Inventor Jinkyu ROH

Jinkyu ROH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240161442
    Abstract: A method and apparatus with object detector training is provided. The method includes obtaining first input data and second input data from a target object; obtaining second additional input data by performing data augmentation on the second input data; extracting a first feature to a shared embedding space by inputting the first input data to a first encoder; extracting a second feature to the shared embedding space by inputting the second input data to a second encoder; extracting a second additional feature to the shared embedding space by inputting thesecond additional input data to the second encoder; identifying a first loss function based on the first feature, the second feature, and the second additional feature; identifying a second loss function based on the second feature and the second additional feature; and updating a weight of the second encoder based on the first loss function and the second loss function.
    Type: Application
    Filed: August 17, 2023
    Publication date: May 16, 2024
    Applicants: SAMSUNG ELECTRONICS CO., LTD., Korea University Research and Business Foundation
    Inventors: Sujin JANG, Sangpil KIM, Jinkyu KIM, Wonseok ROH, Gyusam CHANG, Dongwook LEE, Dae Hyun JI
  • Patent number: 11168253
    Abstract: A silicon layer etchant composition and associated methods, the composition including about 1 wt % to about 20 wt % of an alkylammonium hydroxide; about 1 wt % to about 30 wt % of an amine compound; about 0.01 wt % to about 0.2 wt % of a nonionic surfactant including both a hydrophobic group and a hydrophilic group; and water, all wt % being based on a total weight of the silicon layer etchant composition.
    Type: Grant
    Filed: January 6, 2020
    Date of Patent: November 9, 2021
    Assignees: SAMSUNG ELECTRONICS CO., LTD., DONGWOO FINE-CHEM CO., LTD.
    Inventors: Changsu Jeon, Jungmin Oh, Hyosan Lee, Hoon Han, Jinkyu Roh, Hyojoong Yoon, Dongwun Shin
  • Publication number: 20200216757
    Abstract: A silicon layer etchant composition and associated methods, the composition including about 1 wt % to about 20 wt % of an alkylammonium hydroxide; about 1 wt % to about 30 wt % of an amine compound; about 0.01 wt % to about 0.2 wt % of a nonionic surfactant including both a hydrophobic group and a hydrophilic group; and water, all wt % being based on a total weight of the silicon layer etchant composition.
    Type: Application
    Filed: January 6, 2020
    Publication date: July 9, 2020
    Applicant: Dongwoo Fine-Chem Co., Ltd.
    Inventors: Changsu JEON, Jungmin OH, Hyosan LEE, Hoon HAN, Jinkyu ROH, Hyojoong YOON, Dongwun SHIN