Patents by Inventor Jin-kyu So

Jin-kyu So has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8912505
    Abstract: An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.
    Type: Grant
    Filed: October 4, 2012
    Date of Patent: December 16, 2014
    Assignees: Samsung Electronics Co., Ltd., Seoul National University Industry Foundation
    Inventors: Chan Wook Baik, Anurag Srivastava, Jong Min Kim, Sun Il Kim, Young Mok Son, Gun Sik Park, Jin Kyu So
  • Patent number: 8304743
    Abstract: An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: November 6, 2012
    Assignees: Samsung Electronics Co., Ltd., Seoul National University Industry Foundation
    Inventors: Chan Wook Baik, Anurag Srivastava, Jong Min Kim, Sun Il Kim, Young Mok Son, Gun Sik Park, Jin Kyu So
  • Publication number: 20090289542
    Abstract: An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.
    Type: Application
    Filed: October 10, 2008
    Publication date: November 26, 2009
    Inventors: Chan Wook Baik, Anurag Srivastava, Jong Min Kim, Sun Il Kim, Young Mok Son, Gun Sik Park, Jin Kyu So
  • Patent number: 7609805
    Abstract: A mask used for a Lithographie, Galvanofomung, and Abformung (LIGA) process, a method for manufacturing the mask, and a method for manufacturing a microstructure using a LIGA process.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: October 27, 2009
    Assignees: Samsung Electronics Co., Ltd., Seoul National University Industry Foundation
    Inventors: Chan-wook Baik, Yong-wan Jin, Gun-sik Park, Jong-min Kim, Young-min Shin, Jin-kyu So
  • Publication number: 20080166640
    Abstract: A mask used for a Lithographie, Galvanofomung, and Abformung (LIGA) process, a method for manufacturing the mask, and a method for manufacturing a microstructure using a LIGA process.
    Type: Application
    Filed: August 30, 2007
    Publication date: July 10, 2008
    Inventors: Chan-wook Baik, Yong-wan Jin, Gun-sik Park, Jong-min Kim, Young-min Shin, Jin-kyu So