Patents by Inventor Jin Linh

Jin Linh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Post-CMP cleaning system
    Publication number: 20060277702
    Abstract: A method and system for cleaning the wafer after CMP is disclosed. A brush module having at least two brushes placed adjacent to each other and having the wafer placed in between. A dummy roller is in contact with an edge of the wafer and follows a rotation of the wafer, wherein when the wafer is rotated, the brushes clean both sides of the wafer, and the dummy roller detects a rotation speed and a rotation direction of the wafer for adjusting the rotation of the wafer.
    Type: Application
    Filed: June 14, 2005
    Publication date: December 14, 2006
    Inventors: Bih-tiao Lin, Jin Linh