Patents by Inventor Jin Mo JAE

Jin Mo JAE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12347720
    Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing for providing a treating space for treating a substrate within; a support unit for supporting the substrate in the treating space; a bottom supply port for supplying a process fluid to the treating space; and a filler member positioned below the substrate supported on the support unit in the treating space, and wherein the filler member forms a buffer space facing the bottom supply port, and a passage is formed between the filler member and an inner wall of the housing and flows the process fluid which is introduced to the buffer space in a direction of the substrate.
    Type: Grant
    Filed: October 24, 2022
    Date of Patent: July 1, 2025
    Assignee: Semes Co., Ltd.
    Inventors: Jin Woo Jung, Jin Mo Jae, Sang Min Lee, Young Hun Lee, Yong Hyun Choi, Yong Joon Im, Seung Hoon Oh
  • Patent number: 12234555
    Abstract: An apparatus for treating a substrate includes a vessel having a sealable process space formed therein in which the substrate is accommodated, a supply port that is provided inside a wall of the vessel and that supplies a process fluid into the process space, an exhaust port provided inside the wall of the vessel and spaced apart from the supply port, and a buffer member provided in the process space, the buffer member being provided in a position overlapping with the supply port and the exhaust port when viewed from above. The buffer member includes a sidewall portion that is located outward of the supply port and the exhaust port and that makes contact with the wall of the vessel and an upper wall portion having a through-hole formed therein to correspond to a center of the substrate, the through-hole forming a straight flow path in an up/down direction.
    Type: Grant
    Filed: October 18, 2021
    Date of Patent: February 25, 2025
    Assignee: SEMES CO., LTD.
    Inventors: Jin Mo Jae, Seung Hoon Oh, Young Seop Choi, Mi So Park, Jong Hyeon Woo
  • Patent number: 12060942
    Abstract: A sealing member for use in sealing a chamber for treating a substrate, the sealing member inserted in a groove formed in the chamber, includes a bottom part, a top part opposite the bottom part, an inner part connecting a first side of the bottom part to the top part, an outer part opposite the inner part and connecting a second side of the bottom part to the top part, and a recessed portion between the top part and the outer part.
    Type: Grant
    Filed: December 8, 2021
    Date of Patent: August 13, 2024
    Assignee: SEMES CO., LTD.
    Inventors: Seung Hoon Oh, Sang Min Lee, Jong Doo Lee, Jin Mo Jae, Young Hun Lee
  • Patent number: 11794220
    Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.
    Type: Grant
    Filed: July 9, 2020
    Date of Patent: October 24, 2023
    Assignee: Semes Co., Ltd.
    Inventors: Inhwang Park, Gui Su Park, Young Hun Lee, Youngseop Choi, Seung Hoon Oh, Jonghyeon Woo, Jin Mo Jae
  • Patent number: 11721575
    Abstract: An apparatus for supporting a substrate includes a rotatable spin head that supports the substrate, a hollow shaft that is connected with the spin head and that transmits torque to the spin head, a nozzle assembly that is disposed in an interior space of the spin head so as not to rotate and that supplies a treatment liquid to a backside of the substrate, and a sealing member that seals a gap between the spin head and the nozzle assembly using a magnetic fluid.
    Type: Grant
    Filed: June 19, 2020
    Date of Patent: August 8, 2023
    Assignee: SEMES CO., LTD.
    Inventors: Inhwang Park, Gui Su Park, Young Hun Lee, Youngseop Choi, Seung Hoon Oh, Jonghyeon Woo, Jin Mo Jae
  • Publication number: 20230129923
    Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing for providing a treating space for treating a substrate within; a support unit for supporting the substrate in the treating space; a bottom supply port for supplying a process fluid to the treating space; and a filler member positioned below the substrate supported on the support unit in the treating space, and wherein the filler member forms a buffer space facing the bottom supply port, and a passage is formed between the filler member and an inner wall of the housing and flows the process fluid which is introduced to the buffer space in a direction of the substrate.
    Type: Application
    Filed: October 24, 2022
    Publication date: April 27, 2023
    Applicant: SEMES CO., LTD.
    Inventors: Jin Woo JUNG, Jin Mo JAE, Sang Min LEE, Young Hun LEE, Yong Hyun CHOI, Yong Joon IM, Seung Hoon OH
  • Publication number: 20230035940
    Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a body; a fluid supply unit for supplying a treating fluid to a treating space within the body; and a fluid exhaust line for exhausting the treating fluid from the treating space, and wherein the body includes: a first body; a second body relatively moving with respect to the first body; and an anti-friction member for preventing a friction between the first body and the second body, and wherein the anti-friction member is configured continuously cover at least two surfaces among surfaces of the first body and the second body.
    Type: Application
    Filed: July 27, 2022
    Publication date: February 2, 2023
    Applicant: SEMES CO., LTD.
    Inventors: Jong Doo LEE, Seung Hoon OH, Jin Mo JAE, Ki Bong KIM, Young Hun LEE
  • Publication number: 20220390172
    Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber providing an inner space; a fluid supply unit configured to supply a drying fluid to the inner space; and a fluid exhaust unit configured to exhaust the drying fluid from the inner space, and wherein the fluid exhaust unit includes an exhaust line connected to the chamber; a pressure adjusting member installed at the exhaust line and configured to maintain a pressure of the inner space at a set pressure; and a heating member installed at the pressure adjusting member or a back end of the pressure adjusting member.
    Type: Application
    Filed: May 27, 2022
    Publication date: December 8, 2022
    Applicant: SEMES CO., LTD.
    Inventors: Jin Mo JAE, Seung Hoon OH
  • Publication number: 20220186379
    Abstract: An apparatus for treating a substrate includes a vessel having a sealable process space formed therein in which the substrate is accommodated, a supply port that is provided inside a wall of the vessel and that supplies a process fluid into the process space, an exhaust port provided inside the wall of the vessel and spaced apart from the supply port, and a buffer member provided in the process space, the buffer member being provided in a position overlapping with the supply port and the exhaust port when viewed from above. The buffer member includes a sidewall portion that is located outward of the supply port and the exhaust port and that makes contact with the wall of the vessel and an upper wall portion having a through-hole formed therein to correspond to a center of the substrate, the through-hole forming a straight flow path in an up/down direction.
    Type: Application
    Filed: October 18, 2021
    Publication date: June 16, 2022
    Applicant: SEMES CO., LTD.
    Inventors: Jin Mo JAE, Seung Hoon OH, Young Seop CHOI, Mi So PARK, Jong Hyeon WOO
  • Publication number: 20220178446
    Abstract: A sealing member for use in sealing a chamber for treating a substrate, the sealing member inserted in a groove formed in the chamber, includes a bottom part, a top part opposite the bottom part, an inner part connecting a first side of the bottom part to the top part, an outer part opposite the inner part and connecting a second side of the bottom part to the top part, and a recessed portion between the top part and the outer part.
    Type: Application
    Filed: December 8, 2021
    Publication date: June 9, 2022
    Applicant: SEMES CO., LTD.
    Inventors: SEUNG HOON OH, SANG MIN LEE, JONG DOO LEE, JIN MO JAE, YOUNG HUN LEE
  • Publication number: 20220088644
    Abstract: A unit for removing an adhesive layer formed in a processing chamber includes an ultrasonic generator, and a wiper soaked in a cleaning liquid. The wiper is provided to surround the ultrasonic generator.
    Type: Application
    Filed: September 23, 2021
    Publication date: March 24, 2022
    Applicant: SEMES CO., LTD.
    Inventors: SEUNG HOON OH, JIN MO JAE, HWAN BIN KIM
  • Publication number: 20210008606
    Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.
    Type: Application
    Filed: July 9, 2020
    Publication date: January 14, 2021
    Applicant: SEMES CO., LTD.
    Inventors: Inhwang PARK, Gui Su PARK, Young Hun LEE, Youngseop CHOI, Seung Hoon OH, Jonghyeon WOO, Jin Mo JAE
  • Publication number: 20200402836
    Abstract: An apparatus for supporting a substrate includes a rotatable spin head that supports the substrate, a hollow shaft that is connected with the spin head and that transmits torque to the spin head, a nozzle assembly that is disposed in an interior space of the spin head so as not to rotate and that supplies a treatment liquid to a backside of the substrate, and a sealing member that seals a gap between the spin head and the nozzle assembly using a magnetic fluid.
    Type: Application
    Filed: June 19, 2020
    Publication date: December 24, 2020
    Applicant: SEMES CO., LTD.
    Inventors: Inhwang PARK, Gui Su PARK, Young Hun LEE, Youngseop CHOI, Seung Hoon OH, Jonghyeon WOO, Jin Mo JAE