Patents by Inventor Jin Mo JAE
Jin Mo JAE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12347720Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing for providing a treating space for treating a substrate within; a support unit for supporting the substrate in the treating space; a bottom supply port for supplying a process fluid to the treating space; and a filler member positioned below the substrate supported on the support unit in the treating space, and wherein the filler member forms a buffer space facing the bottom supply port, and a passage is formed between the filler member and an inner wall of the housing and flows the process fluid which is introduced to the buffer space in a direction of the substrate.Type: GrantFiled: October 24, 2022Date of Patent: July 1, 2025Assignee: Semes Co., Ltd.Inventors: Jin Woo Jung, Jin Mo Jae, Sang Min Lee, Young Hun Lee, Yong Hyun Choi, Yong Joon Im, Seung Hoon Oh
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Patent number: 12234555Abstract: An apparatus for treating a substrate includes a vessel having a sealable process space formed therein in which the substrate is accommodated, a supply port that is provided inside a wall of the vessel and that supplies a process fluid into the process space, an exhaust port provided inside the wall of the vessel and spaced apart from the supply port, and a buffer member provided in the process space, the buffer member being provided in a position overlapping with the supply port and the exhaust port when viewed from above. The buffer member includes a sidewall portion that is located outward of the supply port and the exhaust port and that makes contact with the wall of the vessel and an upper wall portion having a through-hole formed therein to correspond to a center of the substrate, the through-hole forming a straight flow path in an up/down direction.Type: GrantFiled: October 18, 2021Date of Patent: February 25, 2025Assignee: SEMES CO., LTD.Inventors: Jin Mo Jae, Seung Hoon Oh, Young Seop Choi, Mi So Park, Jong Hyeon Woo
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Patent number: 12060942Abstract: A sealing member for use in sealing a chamber for treating a substrate, the sealing member inserted in a groove formed in the chamber, includes a bottom part, a top part opposite the bottom part, an inner part connecting a first side of the bottom part to the top part, an outer part opposite the inner part and connecting a second side of the bottom part to the top part, and a recessed portion between the top part and the outer part.Type: GrantFiled: December 8, 2021Date of Patent: August 13, 2024Assignee: SEMES CO., LTD.Inventors: Seung Hoon Oh, Sang Min Lee, Jong Doo Lee, Jin Mo Jae, Young Hun Lee
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Patent number: 11794220Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.Type: GrantFiled: July 9, 2020Date of Patent: October 24, 2023Assignee: Semes Co., Ltd.Inventors: Inhwang Park, Gui Su Park, Young Hun Lee, Youngseop Choi, Seung Hoon Oh, Jonghyeon Woo, Jin Mo Jae
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Patent number: 11721575Abstract: An apparatus for supporting a substrate includes a rotatable spin head that supports the substrate, a hollow shaft that is connected with the spin head and that transmits torque to the spin head, a nozzle assembly that is disposed in an interior space of the spin head so as not to rotate and that supplies a treatment liquid to a backside of the substrate, and a sealing member that seals a gap between the spin head and the nozzle assembly using a magnetic fluid.Type: GrantFiled: June 19, 2020Date of Patent: August 8, 2023Assignee: SEMES CO., LTD.Inventors: Inhwang Park, Gui Su Park, Young Hun Lee, Youngseop Choi, Seung Hoon Oh, Jonghyeon Woo, Jin Mo Jae
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Publication number: 20230129923Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing for providing a treating space for treating a substrate within; a support unit for supporting the substrate in the treating space; a bottom supply port for supplying a process fluid to the treating space; and a filler member positioned below the substrate supported on the support unit in the treating space, and wherein the filler member forms a buffer space facing the bottom supply port, and a passage is formed between the filler member and an inner wall of the housing and flows the process fluid which is introduced to the buffer space in a direction of the substrate.Type: ApplicationFiled: October 24, 2022Publication date: April 27, 2023Applicant: SEMES CO., LTD.Inventors: Jin Woo JUNG, Jin Mo JAE, Sang Min LEE, Young Hun LEE, Yong Hyun CHOI, Yong Joon IM, Seung Hoon OH
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Publication number: 20230035940Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a body; a fluid supply unit for supplying a treating fluid to a treating space within the body; and a fluid exhaust line for exhausting the treating fluid from the treating space, and wherein the body includes: a first body; a second body relatively moving with respect to the first body; and an anti-friction member for preventing a friction between the first body and the second body, and wherein the anti-friction member is configured continuously cover at least two surfaces among surfaces of the first body and the second body.Type: ApplicationFiled: July 27, 2022Publication date: February 2, 2023Applicant: SEMES CO., LTD.Inventors: Jong Doo LEE, Seung Hoon OH, Jin Mo JAE, Ki Bong KIM, Young Hun LEE
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Publication number: 20220390172Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber providing an inner space; a fluid supply unit configured to supply a drying fluid to the inner space; and a fluid exhaust unit configured to exhaust the drying fluid from the inner space, and wherein the fluid exhaust unit includes an exhaust line connected to the chamber; a pressure adjusting member installed at the exhaust line and configured to maintain a pressure of the inner space at a set pressure; and a heating member installed at the pressure adjusting member or a back end of the pressure adjusting member.Type: ApplicationFiled: May 27, 2022Publication date: December 8, 2022Applicant: SEMES CO., LTD.Inventors: Jin Mo JAE, Seung Hoon OH
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Publication number: 20220186379Abstract: An apparatus for treating a substrate includes a vessel having a sealable process space formed therein in which the substrate is accommodated, a supply port that is provided inside a wall of the vessel and that supplies a process fluid into the process space, an exhaust port provided inside the wall of the vessel and spaced apart from the supply port, and a buffer member provided in the process space, the buffer member being provided in a position overlapping with the supply port and the exhaust port when viewed from above. The buffer member includes a sidewall portion that is located outward of the supply port and the exhaust port and that makes contact with the wall of the vessel and an upper wall portion having a through-hole formed therein to correspond to a center of the substrate, the through-hole forming a straight flow path in an up/down direction.Type: ApplicationFiled: October 18, 2021Publication date: June 16, 2022Applicant: SEMES CO., LTD.Inventors: Jin Mo JAE, Seung Hoon OH, Young Seop CHOI, Mi So PARK, Jong Hyeon WOO
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Publication number: 20220178446Abstract: A sealing member for use in sealing a chamber for treating a substrate, the sealing member inserted in a groove formed in the chamber, includes a bottom part, a top part opposite the bottom part, an inner part connecting a first side of the bottom part to the top part, an outer part opposite the inner part and connecting a second side of the bottom part to the top part, and a recessed portion between the top part and the outer part.Type: ApplicationFiled: December 8, 2021Publication date: June 9, 2022Applicant: SEMES CO., LTD.Inventors: SEUNG HOON OH, SANG MIN LEE, JONG DOO LEE, JIN MO JAE, YOUNG HUN LEE
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Publication number: 20220088644Abstract: A unit for removing an adhesive layer formed in a processing chamber includes an ultrasonic generator, and a wiper soaked in a cleaning liquid. The wiper is provided to surround the ultrasonic generator.Type: ApplicationFiled: September 23, 2021Publication date: March 24, 2022Applicant: SEMES CO., LTD.Inventors: SEUNG HOON OH, JIN MO JAE, HWAN BIN KIM
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Publication number: 20210008606Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.Type: ApplicationFiled: July 9, 2020Publication date: January 14, 2021Applicant: SEMES CO., LTD.Inventors: Inhwang PARK, Gui Su PARK, Young Hun LEE, Youngseop CHOI, Seung Hoon OH, Jonghyeon WOO, Jin Mo JAE
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Publication number: 20200402836Abstract: An apparatus for supporting a substrate includes a rotatable spin head that supports the substrate, a hollow shaft that is connected with the spin head and that transmits torque to the spin head, a nozzle assembly that is disposed in an interior space of the spin head so as not to rotate and that supplies a treatment liquid to a backside of the substrate, and a sealing member that seals a gap between the spin head and the nozzle assembly using a magnetic fluid.Type: ApplicationFiled: June 19, 2020Publication date: December 24, 2020Applicant: SEMES CO., LTD.Inventors: Inhwang PARK, Gui Su PARK, Young Hun LEE, Youngseop CHOI, Seung Hoon OH, Jonghyeon WOO, Jin Mo JAE