Patents by Inventor Jin-Mo Kang

Jin-Mo Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • TRANSMITTING DEVICE, RECEIVING DEVICE, AND TRANSCEIVING METHOD THEREOF
    Publication number: 20140204962
    Abstract: A transmitting device which transmits a plurality of streams is provided. The transmitting device comprises: a first multimedia data consisting of multimedia contents; a first synchronization information for synchronization of a second multimedia data consisting of multimedia contents; a first transmitting data including a first signaling data for the first multimedia data and a second signaling data for the second multimedia data, a data generating unit generating a second transmitting data including a second synchronization information for synchronization of the second multimedia data and the first multimedia data, a first transmitting unit transmitting the first transmitting data supplied from the data generating unit to a receiving device through a broadcasting network, and a second transmitting unit transmitting the second transmitting data supplied from the data generating unit to the receiving device through an IP network.
    Type: Application
    Filed: August 13, 2012
    Publication date: July 24, 2014
    Applicants: KOREAN BROADCASTING SYSTEM, SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hong-seok Park, Byung-sun Kim, Sang-jin Hahm, Jin-mo Kang, Keun-sik Lee, Jae-jun Lee, Yong-seok Jang, Hee-jean Kim, Dae-jong Lee, Yu-sung Joo
  • Methods of forming patterns in semiconductor devices using photo resist patterns
    Patent number: 7553606
    Abstract: Disclosed is a method of forming patterns in semiconductor devices by using photo resist patterns. These methods comprise forming photo resist patterns on a substrate. Inferior patterns are selected among the photo resist patterns. The inferior patterns are eliminated or shrunken by irradiating the selected inferior patterns with an electron beam.
    Type: Grant
    Filed: October 4, 2006
    Date of Patent: June 30, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Gun Kang, Jin-Mo Kang, Jae-Ho Lee, Jun-Seop Lee
  • Methods of forming patterns in semiconductor devices using photo resist patterns
    Publication number: 20070196769
    Abstract: Disclosed is a method of forming patterns in semiconductor devices by using photo resist patterns. These methods comprise forming photo resist patterns on a substrate. Inferior patterns are selected among the photo resist patterns. The inferior patterns are eliminated or shrunken by irradiating the selected inferior patterns with an electron beam.
    Type: Application
    Filed: October 4, 2006
    Publication date: August 23, 2007
    Inventors: Sung-Gun Kang, Jin-Mo Kang, Jae-Ho Lee, Jun-Seop Lee