Patents by Inventor Jin-O Choi
Jin-O Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10273365Abstract: The current disclosure relates to a nanocomposites coating including metal oxide nanocrystals, the nanocomposites further include a mixture of acrylates monomers and oligomers to provide a curable coating that provides high refractive index, high transmittance, and high temperature stability.Type: GrantFiled: March 14, 2014Date of Patent: April 30, 2019Assignee: PIXELLIGENT TECHNOLOGIES LLCInventors: Wei Xu, Selina Thomas Monickam, Jin-O Choi, Xia Bai, Linfeng Gou, Zehra Serpil Gonen-Williams, Zhiyun Chen, Gregory D. Cooper
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Publication number: 20140322549Abstract: The current disclosure relates to a nanocomposites coating including metal oxide nanocrystals, the nanocomposites further include a mixture of acrylates monomers and oligomers to provide a curable coating that provides high refractive index, high transmittance, and high temperature stability.Type: ApplicationFiled: March 14, 2014Publication date: October 30, 2014Applicant: PIXELLIGENT TECHNOLOGIES LLCInventors: Wei XU, Selina Thomas MONICKAM, Jin-O CHOI, Xia BAI, Linfeng GOU, Zehra Serpil GONEN-WILLIAMS, Zhiyun CHEN, Gregory D. COOPER
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Patent number: 6780960Abstract: A method of making a solution of a polyimide from a diamine monomer and a dianhydride monomer is disclosed. A solution or slurry of one of the monomers in a solvent that boils at a temperature between about 80° C. and about 160° C. is prepared. The solution or slurry is heated to a temperature between about 80° C. and about 160° C. and the other monomer is slowly added to the solution or slurry. Polyamic acid that is formed quickly imidizes to form the polyimide.Type: GrantFiled: July 22, 2002Date of Patent: August 24, 2004Assignee: Sumitomo Bakelite Company LimitedInventors: Michael C. Hausladen, Jin-O Choi
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Patent number: 6635138Abstract: Disclosed is a method of immobilizing the fingers of circuitry. A coating is formed of a liquid adhesive on the surface of a release film in a pattern of strips in positions perpendicular to and across the positions the fingers of the circuitry will have when the pattern of adhesive is bonded to it. The coating is rendered non-tacky and is bonded across and between the fingers and the release film is removed from the coating.Type: GrantFiled: August 5, 1999Date of Patent: October 21, 2003Assignee: Sumitomo Bakelite Company LimitedInventor: Jin-O Choi
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Publication number: 20020188088Abstract: A method of making a solution of a polyimide from a diamine monomer and a dianhydride monomer is disclosed. A solution or slurry of one of the monomers in a solvent that boils at a temperature between about 80° C. and about 160° C. is prepared. The solution or slurry is heated to a temperature between about 80° C. and about 160° C. and the other monomer is slowly added to the solution or slurry. Polyamic acid that is formed quickly imidizes to form the polyimide.Type: ApplicationFiled: July 22, 2002Publication date: December 12, 2002Inventors: Michael C. Hausladen, Jin-O Choi
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Patent number: 6451955Abstract: A method of making a solution of a polyimide from a diamine monomer and a dianhydride monomer is disclosed. A solution or slurry of one of the monomers in a solvent that boils at a temperature between about 80° C. and about 160° C. is prepared. The solution or slurry is heated to a temperature between about 80° C. and about 160° C. and the other monomer is slowly added to the solution or slurry. Polyamic acid that is formed quickly imidizes to form the polyimide.Type: GrantFiled: September 28, 2000Date of Patent: September 17, 2002Assignee: Sumitomo Bakelite Company LimitedInventors: Michael C. Hausladen, Jin-O Choi
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Patent number: 6156820Abstract: Disclosed is a solution of a hot melt adhesive which comprises an organic solvent and a fully imidized polyamideimidesiloxane. The polyamideimidesiloxane is the reaction product of dianhydride monomer with diamine monomer. About 0.5 to about 30 mole % of the monomers are siloxane-containing diamine or dianhydride monomers. Up to about 50 mole % of the diamine monomer is aliphatic diamine that contains neither siloxane groups nor amide linkages, and about 40 to about 99 mole % of the diamine monomer is aromatic diamine that does not contain siloxane groups. The aromatic diamine is (1) about 50 to about 100 mole % unsymmetrical aromatic diamine that has at least two aromatic rings, two amine groups on different aromatic rings, and contains an amide linkage in the chain and (2) up to about 50 mole % of aromatic diamine that contains neither siloxane groups nor amide linkages. A tape is made by forming a coating of the solution on a film.Type: GrantFiled: December 28, 1998Date of Patent: December 5, 2000Assignee: Occidental Chemical CorporationInventor: Jin-O Choi
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Patent number: 5955245Abstract: Disclosed is a method of forming a pattern on a substrate. A first solution is formed of an organic solvent and monomers of diamine and dianhydride. The monomers are polymerized to form a polyamic acid soluble in the organic solvent. About 20 to about 95% of the amic acid groups in the polyamic acid are imidized to form a partially imidized polyamic acid. A more concentrated solution of the partially imidized polyamic acid is formed. This can be accomplished by precipitating the partially imidized polyamic acid from the first solution and dissolving it in a second organic solvent to form a second solution. The second solution is applied to the substrate and the solvent is evaporated to form a coating of the partially imidized polyamic acid on the substrate. A portion of the coating is removed to form a pattern on the substrate and the remaining partially imidized polyamic acid is fully imidized on the substrate.Type: GrantFiled: October 12, 1993Date of Patent: September 21, 1999Assignee: Occidental Chemical CorporationInventor: Jin-O Choi
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Patent number: 5869161Abstract: Disclosed is a tape which comprises a non-tacky, free-standing, 90 to 100% imidized polyimide film containing 0.1 to 30 wt % of a solvent having a releasable film adhering to at least one side. The film is used to form coatings on substrate or as an adhesive to bond substrates together.Type: GrantFiled: June 17, 1996Date of Patent: February 9, 1999Assignee: Occidental Chemical CorporationInventor: Jin-O Choi
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Patent number: 5744286Abstract: Disclosed is a method of making a polyimide pattern on a substrate. A solution is prepared in an organic solvent of a polyamic acid and about 1 to about 10 wt. % of a photosensitizer that becomes more water soluble when exposed to actinic light. A coating is formed of the solution on a substrate and solvent is evaporated from the coating. A positive photoresist is applied over the coating and is exposed to a pattern of actinic light. The exposed portions of the photoresist are removed as well as the exposed portions of the polyamic acid coating thereunder. The remaining photoresist is removed and the polyamic acid coating is imidized.Type: GrantFiled: February 12, 1996Date of Patent: April 28, 1998Inventor: Jin-o Choi
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Patent number: 5604041Abstract: Disclosed is a method of making a free-standing polyimide film. A solution is prepared of a polyamic acid 20 to 98% imidized in an organic solvent and a coating of the solution is applied to a non-stick substrate. The coating is heated to a temperature high enough to evaporate all but 1 to 20 wt % of the solvent and form a film. The film is removed from the substrate and is heated to evaporate the solvent to less than 1000 ppm.Type: GrantFiled: November 14, 1995Date of Patent: February 18, 1997Inventor: Jin-o Choi
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Patent number: 5554684Abstract: Disclosed is a method of forming a polyimide coating in a pattern on a surface. A first solution is prepared of an organic solvent, and diamine and dianhydride monomers. The monomers are polymerized to form a polyamic acid that is soluble in the organic solvent. About 10 to about 95% of the amic acid groups in the polyamic acid are imidized, forming a partially imidized polyamic acid. A more concentrated solution of the partially imidized polyamic acid is prepared and about 0.1 to about 10 wt % of a thixotrope is mixed with the more concentrated solution to form a paste. A template is placed over the surface and the paste is forced through the template onto the surface. The solvent is evaporated and the partially imidized polyamic acid on the surface is fully imidized.Type: GrantFiled: December 16, 1994Date of Patent: September 10, 1996Assignee: Occidental Chemical CorporationInventors: Jin-O Choi, John A. Tyrell, Paul D. Dubell
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Patent number: 5241041Abstract: Disclosed is a polyimide ammonium salt comprising the reaction product of an ethylenically unsaturated amine with an aromatic polyimide having pendant carboxylic acid groups, said polyimide comprising the reaction product of diamine and aromatic dianhydride, where the diamine comprises an aromatic carboxylic acid diamine having at least one carboxylic acid. A substrate can be coated with the polyimide ammonium salt by forming a composition of a crosslinking agent and a solution of the polyimide salt in an organic solvent, spreading the composition on the substrate, evaporating the solvent to form a coating, exposing at least some of the coating to actinic radiation to crosslink and insolubilize the exposed portions of the coating, and washing the unexposed portions away by dissolving them in an organic solvent.Type: GrantFiled: December 16, 1991Date of Patent: August 31, 1993Assignee: Occidental Chemical CorporationInventors: Jin-O Choi, John A. Tyrell
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Patent number: 5177181Abstract: Disclosed is an aromatic diamine having the general formula ##STR1## where A is a group containing at least one aromatic ring, each Y is independently selected from ##STR2## R is a group containing at least one olefinically unsaturated group, R' is hydrogen, alkyl to C.sub.25, aryl, or R, n is 1 to 4, and the number of olefinic groups in Y is at least 3 when each Y is ##STR3## and otherwise is at least 2. Photosensitive polyamic acids and polyimides can be prepared from the aromatic diamines which can be crosslinked with light to a mask to form patterns on a substrate.Type: GrantFiled: June 6, 1991Date of Patent: January 5, 1993Assignee: Occidental Chemical CorporationInventors: Jerold Rosenfeld, Jin-O Choi, David Y. Tang, John Tyrell