Patents by Inventor Jin-Seock Kim
Jin-Seock Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10611962Abstract: An etchant composition is presented. The composition includes: 18 wt % to 25 wt % of a first organic acid compound; 15 wt % to 20 wt % of a second organic acid compound; 8.1 wt % to 9.9 wt % of an inorganic acid compound; 1 wt % to 4.9 wt % of a sulfonic acid compound; 10 wt % to 20 wt % of a hydrogen sulfate salt compound; 1 wt % to 5 wt % of a nitrogen-containing dicarbonyl compound; 1 wt % to 5 wt % of an amino acid derivative compound; 0.1 wt % to 2 wt % of an iron-containing oxidizing agent compound; and a balance amount of water.Type: GrantFiled: April 22, 2019Date of Patent: April 7, 2020Assignee: Samsung Display Co., Ltd.Inventors: Jong Hee Park, Ki Tae Kim, Jin Seock Kim, Gyu-Po Kim, Hyun-Cheol Shin, Dae-Woo Lee, Sang-Hyuk Lee
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Publication number: 20200067016Abstract: A display device includes: a substrate including a display area and a non-display area around the display area; a light-emitting element disposed in the display area; an encapsulating layer sealing the light-emitting element; and a dam disposed in the non-display area. The dam includes a first layer and a second layer on the first layer, the first layer includes a first portion with a first height and a second portion with a second height that is less than the first height, and the second layer covers a lateral surface of the first portion.Type: ApplicationFiled: March 26, 2019Publication date: February 27, 2020Inventors: Gwui-Hyun PARK, Jin Seock KIM, Pil Soon HONG, Chul Won PARK
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Publication number: 20200058727Abstract: An manufacturing method of a display device may include the following steps: forming a transistor on a substrate; forming an insulating layer on the transistor; forming a conductive layer including silver on the insulating layer; forming a photosensitive member on the conductive layer; forming an electrode of a light-emitting element by etching the conductive layer; performing plasma treatment on a structure that comprises the electrode, the plasma treatment using a gas including a halogen; and removing a product that is resulted from the plasma treatment.Type: ApplicationFiled: July 24, 2019Publication date: February 20, 2020Inventors: Sang Gab KIM, Hyun Min CHO, Tae Sung KIM, Yu-Gwang JEONG, Su Bin BAE, Jin Seock KIM, Sang Gyun KIM, Hyo Min KO, Kil Won CHO, Han Sol LEE
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Publication number: 20190355791Abstract: An OLED display device includes a substrate including a display region and a pad region, a display structure in the display region on the substrate, and a pad electrode structure in the pad region on the substrate, the pad electrode structure having a first pad electrode on the substrate, a first insulation layer covering opposite lateral portions of the first pad electrode and exposing a portion of an upper surface of the first pad electrode, a second pad electrode on the first pad electrode and on the first insulation layer, the second pad electrode having a step portion where the first pad electrode and the first insulation layer are overlapped, and a third pad electrode on the second pad electrode and on the first insulation layer, the third electrode covering the second pad electrode.Type: ApplicationFiled: August 2, 2019Publication date: November 21, 2019Inventors: Jin-Seock KIM, Jong-Hee PARK, Bong-Won LEE, Seung-Bae KANG, Sang-Gab KIM, Jeong-Min PARK, Hyun-Eok SHIN
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Publication number: 20190322935Abstract: An etchant composition is presented. The composition includes: 18 wt % to 25 wt % of a first organic acid compound; 15 wt % to 20 wt % of a second organic acid compound; 8.1 wt % to 9.9 wt % of an inorganic acid compound; 1 wt % to 4.9 wt % of a sulfonic acid compound; 10 wt % to 20 wt % of a hydrogen sulfate salt compound; 1 wt % to 5 wt % of a nitrogen-containing dicarbonyl compound; 1 wt % to 5 wt % of an amino acid derivative compound; 0.1 wt % to 2 wt % of an iron-containing oxidizing agent compound; and a balance amount of water.Type: ApplicationFiled: April 22, 2019Publication date: October 24, 2019Inventors: Jong Hee PARK, Ki Tae KIM, Jin Seock KIM, Gyu-Po KIM, Hyun-Cheol SHIN, Dae-Woo LEE, Sang-Hyuk LEE
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Patent number: 10381418Abstract: An OLED display device includes a substrate including a display region and a pad region, a display structure in the display region on the substrate, and a pad electrode structure in the pad region on the substrate, the pad electrode structure having a first pad electrode on the substrate, a first insulation layer covering opposite lateral portions of the first pad electrode and exposing a portion of an upper surface of the first pad electrode, a second pad electrode on the first pad electrode and on the first insulation layer, the second pad electrode having a step portion where the first pad electrode and the first insulation layer are overlapped, and a third pad electrode on the second pad electrode and on the first insulation layer, the third electrode covering the second pad electrode.Type: GrantFiled: August 16, 2017Date of Patent: August 13, 2019Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Jin-Seock Kim, Jong-Hee Park, Bong-Won Lee, Seung-Bae Kang, Sang-Gab Kim, Jeong-Min Park, Hyun-Eok Shin
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Publication number: 20180371625Abstract: A phosphoric acid-free etchant composition and a method of forming a wiring, the composition including about 40 wt % to about 60 wt % of an organic acid compound; about 6 wt % to about 12 wt % of a glycol compound; about 1 wt % to about 10 wt % of nitric acid, sulfuric acid, or hydrochloric acid; about 1 wt % to about 10 wt % of a nitrate salt compound; and water, all wt % being based on a total weight of the phosphoric acid-free etchant composition.Type: ApplicationFiled: May 4, 2018Publication date: December 27, 2018Inventors: Jong Hee PARK, Jin Seock KIM, Bong Won LEE, Sang-woo KIM, Il-Ryong PARK, Bong-Yeon WON, Dae-woo LEE
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Publication number: 20180061895Abstract: An OLED display device includes a substrate including a display region and a pad region, a display structure in the display region on the substrate, and a pad electrode structure in the pad region on the substrate, the pad electrode structure having a first pad electrode on the substrate, a first insulation layer covering opposite lateral portions of the first pad electrode and exposing a portion of an upper surface of the first pad electrode, a second pad electrode on the first pad electrode and on the first insulation layer, the second pad electrode having a step portion where the first pad electrode and the first insulation layer are overlapped, and a third pad electrode on the second pad electrode and on the first insulation layer, the third electrode covering the second pad electrode.Type: ApplicationFiled: August 16, 2017Publication date: March 1, 2018Inventors: Jin-Seock KIM, Jong-Hee PARK, Bong-Won LEE, Seung-Bae KANG, Sang-Gab KIM, Jeong-Min PARK, Hyun-Eok SHIN
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Publication number: 20180053788Abstract: A backplane for a display device having a light emitting portion and a pad portion and a method of manufacturing the backplane for a display device, the backplane including a drain electrode in the light emitting portion on a substrate; a pad electrode in the pad portion on the substrate; a passivation layer in the light emitting portion to partially cover the drain electrode, the passivation layer exposing a portion of the drain electrode; a first pixel electrode in the light emitting portion on the passivation layer and the exposed drain electrode; and a second pixel electrode on the first pixel electrode, wherein: the second pixel electrode is formed of a material that is etchable by a first etching material, and the first pixel electrode is formed of a material that is not etchable by the first etching material.Type: ApplicationFiled: August 11, 2017Publication date: February 22, 2018Inventors: Bong-Won LEE, Jong-Hee PARK, Jin-Seock KIM, Seung-Bae KANG
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Patent number: 8916767Abstract: A solar cell and a method of fabricating the same are provided according to one or more embodiments. According to an embodiment, the solar cell includes a substrate, a back electrode layer formed on the substrate, a light absorbing layer formed on the back electrode layer, and a transparent electrode layer formed on the light absorbing layer, wherein the light absorbing layer is comprised of copper (Cu), gallium (Ga), indium (In), sulfur (S), and selenium (Se) and includes a first concentration region in which concentrations of sulfur (S) gradually decrease in the light absorbing layer going in a first direction from the back electrode layer to the transparent electrode layer.Type: GrantFiled: December 10, 2009Date of Patent: December 23, 2014Assignees: Samsung SDI Co., Ltd., Samsung Display Co., Ltd.Inventors: Gug-Il Jun, Woo-Su Lee, Dong-Seop Kim, Jin-Seock Kim, Byoung-Dong Kim, Kang-Hee Lee, Dong-Gi Ahn, Byung-Joo Lee, Hyoung-Jin Park, In-Ki Kim
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Publication number: 20120122262Abstract: A thin film solar cell module includes a front substrate; a plurality of thin film solar cells disposed on the front substrate; a rear substrate disposed on the thin film solar cells; a plurality of inter-connection terminals electrically connected to the thin film solar cells, respectively, and exposed to an exterior surface of at least one of the front and rear substrates; and a connector electrically connecting the inter-connection terminals in a series or parallel configuration.Type: ApplicationFiled: January 18, 2012Publication date: May 17, 2012Inventors: Yeon-Il Kang, Jin-Seock Kim, Czang-Ho Lee, Hee-Chan Lee, Ku-Hyun Kang
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Publication number: 20120112542Abstract: A method of electrically eliminating defective solar cell units that are disposed within an integrated solar cells module and a method of trimming an output voltage of the integrated solar cells module are provided, where the solar cells module has a large number (e.g., 50 or more) of solar cell units integrally disposed therein and initially connected in series one to the next. The method includes providing a corresponding plurality of repair pads, each integrally extending from a respective electrode layer of the solar cell units, and providing a bypass conductor integrated within the module and extending adjacent to the repair pads. Pad-to-pad spacings and pad-to-bypass spacings are such that pad-to-pad connecting bridges may be selectively created between adjacent ones of the repair pads and such that pad-to-bypass connecting bridges may be selectively created between the repair pads and the adjacently extending bypass conductor.Type: ApplicationFiled: January 20, 2012Publication date: May 10, 2012Applicants: SAMSUNG SDI CO., LTD., SAMSUNG ELECTRONICS CO., LTD.Inventors: Myung-Hun SHIN, Dong-Uk Choi, Byoung-June Kim, Jin-Seock Kim, Czang-Ho Lee, Seung-Jae Jung, Joon-Young Seo
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Patent number: 7972883Abstract: In a method of manufacturing a photoelectric device, a transparent conductive layer is formed on a substrate, and the transparent conductive layer is partially etched using an etching solution including hydrofluoric acid. Thus, a transparent electrode having a concavo-convex pattern on its surface is formed. When the transparent conductive layer is partially etched, a haze of the transparent electrode may be controlled by adjusting an etching time of the transparent conductive layer. Also, since the etching solution is sprayed to the transparent conductive layer to etch the transparent conductive layer, the concavo-convex pattern on the surface of the transparent electrode may be easily formed even though the size of the substrate increases.Type: GrantFiled: March 9, 2009Date of Patent: July 5, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Seung-Jae Jung, Byoung-June Kim, Jin-Seock Kim, Czang-Ho Lee, Myung-Hun Shin, Joon-Young Seo, Dong-Uk Choi, Byoung-Kyu Lee
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Publication number: 20100154872Abstract: A solar cell and a method of fabricating the same are provided according to one or more embodiments. According to an embodiment, the solar cell includes a substrate, a back electrode layer formed on the substrate, a light absorbing layer formed on the back electrode layer, and a transparent electrode layer formed on the light absorbing layer, wherein the light absorbing layer is comprised of copper (Cu), gallium (Ga), indium (In), sulfur (S), and selenium (Se) and includes a first concentration region in which concentrations of sulfur (S) gradually decrease in the light absorbing layer going in a first direction from the back electrode layer to the transparent electrode layer.Type: ApplicationFiled: December 10, 2009Publication date: June 24, 2010Inventors: Gug-Il JUN, Woo-Su Lee, Dong-Seop Kim, Jin-Seock Kim, Byoung-Dong Kim, Kang-Hee Lee, Dong-Gi Ahn, Byung-Joo Lee, Hyoung-Jin Park, In-Ki Kim
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Publication number: 20100051082Abstract: A thin film solar cell module includes a front substrate; a plurality of thin film solar cells disposed on the front substrate; a rear substrate disposed on the thin film solar cells; a plurality of inter-connection terminals electrically connected to the thin film solar cells, respectively, and exposed to an exterior surface of at least one of the front and rear substrates; and a connector electrically connecting the inter-connection terminals in a series or parallel configuration.Type: ApplicationFiled: April 9, 2009Publication date: March 4, 2010Applicant: Samsung Electronics Co., Ltd.Inventors: Yeon-Il KANG, Jin-Seock KIM, Czang-Ho LEE, Hee-Chan LEE, Ku-Hyun KANG
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Publication number: 20090233399Abstract: In a method of manufacturing a photoelectric device, a transparent conductive layer is formed on a substrate, and the transparent conductive layer is partially etched using an etching solution including hydrofluoric acid. Thus, a transparent electrode having a concavo-convex pattern on its surface is formed. When the transparent conductive layer is partially etched, a haze of the transparent electrode may be controlled by adjusting an etching time of the transparent conductive layer. Also, since the etching solution is sprayed to the transparent conductive layer to etch the transparent conductive layer, the concavo-convex pattern on the surface of the transparent electrode may be easily formed even though the size of the substrate increases.Type: ApplicationFiled: March 9, 2009Publication date: September 17, 2009Inventors: Seung-Jae Jung, Byoung-June Kim, Jin-Seock Kim, Czang-Ho Lee, Myung-Hun Shin, Joon-Young Seo, Dong-Uk Choi, Byoung-Kyu Lee
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Publication number: 20090229596Abstract: A method of electrically eliminating defective solar cell units that are disposed within an integrated solar cells module and a method of trimming an output voltage of the integrated solar cells module are provided, where the solar cells module has a large number (e.g., 50 or more) of solar cell units integrally disposed therein and initially connected in series one to the next. The method includes providing a corresponding plurality of repair pads, each integrally extending from a respective electrode layer of the solar cell units, and providing a bypass conductor integrated within the module and extending adjacent to the repair pads. Pad-to-pad spacings and pad-to-bypass spacings are such that pad-to-pad connecting bridges may be selectively created between adjacent ones of the repair pads and such that pad-to-bypass connecting bridges may be selectively created between the repair pads and the adjacently extending bypass conductor.Type: ApplicationFiled: March 9, 2009Publication date: September 17, 2009Inventors: Myung-Hun Shin, Dong-Uk Choi, Byoung-June Kim, Jin-Seock Kim, Czang-Ho Lee, Seung-Jae Jung, Joon-Young Seo
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Patent number: 6211127Abstract: A photoresist stripping composition suitable for both of the single wafer treatment method using an air knife process and a dipping photoresist stripping method. The composition comprises 5-15 weight % of alkanolamine, 35-55 weight % of sulfoxide or sulfone compound and 35-55 weight % of glycolether, and preferably further includes surfactant, and also 1-10 weight % of tetra methyl ammonium hydroxide or 3-15 weight % of benzenediol and 1-15 weight % of alkylsulfonic acid.Type: GrantFiled: June 11, 1999Date of Patent: April 3, 2001Assignee: Samsung Electronics Co., Ltd.Inventors: Jin-Seock Kim, June-Ing Kil, Dong-Jin Park, Shang-Oa Park, Chun-Duek Lee, Seog-Young Lim, Yang-Sun Kim
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Patent number: 6071868Abstract: A photoresist stripping composition is provided. The composition includes 10-30 weight % of alkanolamine, 10-35 weight % of dimethylsulfoxide, 30-50 weight % of N-methylpyrrolidone and 10-30 weight % of glycolether. The composition shows good stripping force and strips photoresist by a single-wafer treatment method using the air-knife process or by a dipping method.Type: GrantFiled: January 8, 1999Date of Patent: June 6, 2000Assignee: Samsung Electronics Co., Ltd.Inventors: Jin-Seock Kim, Yang-Sun Kim, Seog-Young Lim, Dong-Uk Choi, Koog-Lok Lee