Abstract: The laser processing device includes a laser head that emits laser light and a camera that acquires a surface image of a processing member after being irradiated with the laser light. The laser processing device further includes an image processor that performs image processing on an acquired surface image and calculates a diameter of a processing mark, and an autofocus controller that derives an optimum focal position of the laser light based on the diameter of the processing mark. In addition, the laser processing device includes a driver that moves the laser head in an emission direction of the laser light to allow the laser light to be condensed at an optimum focal position based on the derivation result of the autofocus controller.

Abstract: A technique that includes: a substrate holder provided with a substrate mounting table on which a substrate is mounted; a substrate transferrer configured to load or unload the substrate onto or from the substrate mounting table; a process container configured to accommodate the substrate holder holding the substrate; a film-forming gas supply system configured to supply a film-forming gas to the substrate in the process container; and a controller configured to be capable of controlling the substrate transferrer and the film-forming gas supply system to interrupt execution of a film forming process for supplying the film-forming gas to the substrate and perform a process for separating the substrate mounted on the substrate mounting table at least once until a film having a desired thickness is formed on the substrate after the film forming process is started.

Abstract: There is provided a configuration that includes: an intake damper and an intake fan configured to communicate with an intake port that sucks air to a transfer chamber connected to a process chamber; a valve of an inert gas introduction pipe configured to supply an inert gas to the transfer chamber; an exhaust fan and a first exhaust valve installed in the transfer chamber; a switch configured to select one of an atmospheric mode in which an atmosphere of the transfer chamber is an air atmosphere and a purge mode in which the atmosphere of the transfer chamber is an inert gas atmosphere; and a controller configured to control each of the intake damper, the intake fan, the valve of the inert gas introduction pipe, the exhaust fan, and the first exhaust valve to execute one of the atmospheric mode and the purge mode.

Abstract: There is provided a configuration that includes: an intake damper and an intake fan configured to communicate with an intake port that sucks air to a transfer chamber connected to a process chamber; a valve of an inert gas introduction pipe configured to supply an inert gas to the transfer chamber; an exhaust fan and a first exhaust valve installed in the transfer chamber; a switch configured to select one of an atmospheric mode in which an atmosphere of the transfer chamber is an air atmosphere and a purge mode in which the atmosphere of the transfer chamber is an inert gas atmosphere; and a controller configured to control each of the intake damper, the intake fan, the valve of the inert gas introduction pipe, the exhaust fan, and the first exhaust valve to execute one of the atmospheric mode and the purge mode.

Abstract: In a method for obtaining hardware resource, one of the hardware resources in the system, which resources have not been obtained, is obtained for the resource usage of a hardware resource obtaining request, when each use rate of the hardware resources, which have been obtained and which resource usages are identical with that of the hardware resource obtaining request exceeds a predetermined threshold.