Abstract: A software package, a gateway for transmitting the same, and a software update method using the same are provided. A software package includes a binary file, a configuration file, and a hash file. The binary file includes read-only memory (ROM) data of a target controller. A management server generates the configuration file by combining a hash value obtained by hashing the binary file with meta information indicating an update procedure between a gateway and the target controller. The management server generates the hash file by hashing the configuration file. The gateway receives the software package and extract the binary file and the configuration file. The gateway transmits the binary file to the target controller according to the update procedure indicated by the meta information.

Abstract: A vehicular software update system for remotely performing a software update of a vehicle and a method thereof are provided. The vehicular software update system includes a management controller installed in a vehicle and a server that performs a remote software update in cooperation with the management controller. The management controller controls the vehicle to start in response to receiving a request for the remote software update from the server, downloads software for update from the server after controlling the vehicle to start, transmits the downloaded software for update to a performance controller in the background, determines whether the transmission of the software for update in the background is completed based on the vehicle being turned off, and performs a software update of the performance controller using the software for update based on the transmission of the software for update in the background being completed.

Abstract: A vehicular software update system includes a management controller coupled to a vehicle and at least one performance controller that receives software for over-the-air (OTA) update in the background from the management controller. The management controller determines a network load of the vehicle and adjusts a transmission speed of the software for OTA update, the software being transmitted to the at least one performance controller, based on a driving state of the vehicle and the network load of the vehicle.

Abstract: A system for monitoring haze of a photomask includes an installation unit in which a photomask is mounted, a light emission unit emitting a light beam to the photomask installed on the installation unit, a detection unit detecting a diffraction pattern of the light beam emitted by the light emission unit and passed through the photomask, and an analysis unit analyzing the diffraction pattern detected by the detection unit.

Abstract: A photomask includes an ion trapping layer and a method of manufacturing a semiconductor device uses the photomask. The photomask includes a transparent substrate and an ion trapping layer formed on a first region of the transparent substrate to trap ions present near the transparent substrate. In manufacturing a semiconductor device, a photosensitive film formed on a substrate is exposed through the photomask in which the ion trapping layer is formed on the transparent substrate, and the substrate is processed using the photosensitive film obtained as the result of the exposure.

Abstract: A binary photomask with an improved resolution and a method of manufacturing the same are provided. The binary photomask may include a substrate, a transmission-prevention pattern formed on the substrate to define a circuit pattern, and a compensation layer configured to change light transmitted through the binary photomask based on a topology of the compensation layer and arranged on the transmission-prevention layer and/or the substrate.

Abstract: Provided are a method of correcting a critical dimension (CD) in a photomask and a photomask having a corrected CD using the method. The method may include providing a substrate that is transparent with respect to an incident light, forming shielding patterns on the substrate to form a photomask, detecting a CD error region of the shielding patterns, and forming a correction film to vary an intensity of the incident light in the CD error region to correct critical dimensions (CDs) of circuit patterns formed by the shielding patterns.

Abstract: A system for monitoring haze of a photomask includes an installation unit in which a photomask is mounted, a light emission unit emitting a light beam to the photomask installed on the installation unit, a detection unit detecting a diffraction pattern of the light beam emitted by the light emission unit and passed through the photomask, and an analysis unit analyzing the diffraction pattern detected by the detection unit.

Abstract: A photomask includes an ion trapping layer and a method of manufacturing a semiconductor device uses the photomask. The photomask includes a transparent substrate and an ion trapping layer formed on a first region of the transparent substrate to trap ions present near the transparent substrate. In manufacturing a semiconductor device, a photosensitive film formed on a substrate is exposed through the photomask in which the ion trapping layer is formed on the transparent substrate, and the substrate is processed using the photosensitive film obtained as the result of the exposure.

Abstract: Provided are a method of correcting a critical dimension (CD) in a photomask and a photomask having a corrected CD using the method. The method may include providing a substrate that is transparent with respect to an incident light, forming shielding patterns on the substrate to form a photomask, detecting a CD error region of the shielding patterns, and forming a correction film to vary an intensity of the incident light in the CD error region to correct critical dimensions (CDs) of circuit patterns formed by the shielding patterns.

Abstract: A binary photomask with an improved resolution and a method of manufacturing the same are provided. The binary photomask may include a substrate, a transmission-prevention pattern formed on the substrate to define a circuit pattern, and a compensation layer configured to change light transmitted through the binary photomask based on a topology of the compensation layer and arranged on the transmission-prevention layer and/or the substrate.