Abstract: In a method and apparatus for generating a depth map, the method includes obtaining a LiDAR point cloud generated by a LiDAR, obtaining a 3D bounding box for at least a portion of the LiDAR point cloud, generating a first vehicle mask corresponding to the 3D bounding box from an image point cloud obtained by projecting coordinates of points of the LiDAR point cloud into an image coordinate system, and generating the depth map by removing distant points that are not included in the 3D bounding box among points included in the first vehicle mask.

Abstract: A tribo-composition for a triboelectric nanogenerator includes a triboelectric nanogenerator in which a tribo-positive electrode composition including a graphene oxide-based nanomaterial is applied as a tribo-positive electrode layer, or a triboelectric nanogenerator in which a tribo-negative electrode composition including any one among fluorine-functionalized graphite, a perovskite material, and molybdenum sulfide (MoS2) is applied as a tribo-negative electrode layer.

Abstract: The present invention relates to a method for manufacturing a reinforced composite membrane using a gantry slot die coater, and to a reinforced composite membrane manufactured using the same and a fuel cell including the same, wherein the method for manufacturing a reinforced composite membrane includes preparing an ionomer solution, preparing a porous support, applying the ionomer solution onto one surface of the porous support using a gantry slot die coater, and applying the ionomer solution onto the other surface of the porous support using a gantry slot die coater.

Abstract: Provided is a dehumidifying kit installed on a drying apparatus that operates an inside drying function when a door is closed and an outside dehumidifying function when the door is open through a suction port and an exhaust port that are provided inside, wherein an opening part of the drying apparatus is partitioned as an opening inlet and an opening outlet, an inner space of the drying apparatus is partitioned as an external air suction flow path from the opening inlet to the suction port and a dry air discharge flow path from the exhaust port to the opening outlet.

Abstract: The present invention relates to a method for manufacturing a stretchable electrochromic device and a stretchable electrochromic device manufactured thereby, and more specifically, the present invention is characterized in that a stretchable electrochromic device, which is manufactured by stretching color changeable polymer gel, and then coating one surface and/or the other surface thereof with a metal solution, has excellent water resistance and initial transmittance.

Abstract: An electro-responsive gel lens having automatic multifocal and image stabilization functions according to the present invention comprises: a first electrode and a second electrode formed on a substrate and having different polarities; and a transmissive part which is formed of an electroactive polymer, and the shape of which is deformed when a voltage is applied to the first electrode and the second electrode, wherein at least one of the first electrode and the second electrode is formed in the plural, and a voltage is individually applied so as to change the shape of the transmissive part in three dimensions, such that the location of the focal point of light passing through the transmissive part is changed in three dimensions.

Abstract: A method of fabricating a semiconductor device includes forming, in a semiconductor substrate, a device isolation trench defining active regions, forming a first liner dielectric layer covering a top surface of the semiconductor substrate and an inner wall of the device isolation trench, forming a second liner dielectric layer covering the first liner dielectric layer, forming a buried dielectric layer filling the device isolation trench, performing a polishing process on the second liner dielectric layer and the buried dielectric layer to form a device isolation structure, forming a mask pattern running across the active regions, and partially patterning the active regions and the device isolation structure to form gate trenches. After the polishing process, the first liner dielectric layer, the second liner dielectric layer, and the buried dielectric layer have their top surfaces formed by the polishing process coplanar with each other.

Abstract: The present invention relates to a composition for an electrochromic device having improved optical transmission and elasticity, and a manufacturing method of an electrochromic member, wherein the composition for an electrochromic device according to an embodiment of the present invention includes a light-transmitting polymer resin, a plasticizer, and an electrochromic material.

Abstract: The present invention relates to a poly(butyl acrylate)-based composition for an electrochromic device having transparency and elasticity and a manufacturing method of an electrochromic member, wherein the composition for an electrochromic device according to an embodiment of the present invention includes a light-transmitting polymer resin, a cross-linking agent, an initiator, an ionic liquid, and an electrochromic material, wherein the light-transmitting polymer resin is poly(butyl acrylate).

Abstract: The present disclosure provides a 3D object detection correction apparatus and method. The 3D object detection correction apparatus includes a processor configured to detect a 3D object based on image data. The processor is also configured to correct an error of the detected 3D object based on a difference value of camera information of a vehicle. The 3D object detection correction apparatus also includes a storage configured to store data and algorithms executable by the processor.

Abstract: The present invention relates to a method for manufacturing a stretchable electrochromic device and a stretchable electrochromic device manufactured thereby, and more specifically, the present invention is characterized in that a stretchable electrochromic device, which is manufactured by stretching color changeable polymer gel, and then coating one surface and/or the other surface thereof with a metal solution, has excellent water resistance and initial transmittance.

Abstract: The lamp comprises a light source configured to emit light, a support structure that supports the light source, and an optical component designed to change the characteristics of the light emitted from the light source. The support structure is configured to rotate both the light source and the optical component about a first axis, and the light source and the optical component are designed to move linearly relative to each other along a second axis.

Abstract: An LED lighting system capable of performing a dimming function for adjusting brightness of output light to decrease includes: an LED light source comprising three or more LED channels that are respectively configured to emit light of different color temperatures; and an electric circuit configured to electrically drive the three or more LED channels. The electric circuit is configured to drive the three or more LED channels so that brightness and color temperature of the output light obtained by the LED light source decrease together in conjunction with each other during dimming in which the brightness of the output light decreases.

Abstract: The present invention relates to a leakage-preventing high performance desiccant composition and a preparation method therefor, wherein a solid desiccant composition includes calcium chloride (CaCl2), magnesium chloride (MgCl2), and metal oxide, wherein the metal oxide may be calcium oxide (CaO), and a gel desiccant composition includes metal chloride and an absorbent polymer, wherein the metal chloride may be calcium chloride (CaCl2) and magnesium chloride (MgCl2), and the absorbent polymer may be CMC (carboxymethyl cellulose).

Abstract: A method of manufacturing a semiconductor device includes forming a first pattern structure having a first opening and a second pattern structure having a second opening on a substrate, forming a gap fill layer in the second opening, forming fences and contact structures in the first opening, removing the gap fill layer in the second opening, forming an upper conductive layer to cover the first and second pattern structures, the fences, and the contact structures, forming a mask pattern based on a photolithography process using the second pattern structure covered by the upper conductive layer as an align mark, and etching the upper conductive layer using the mask pattern to form upper conductive patterns. A width of the second opening is larger than a width of a first opening. A thickness of the upper conductive layer is smaller than a depth of the second opening.

Abstract: An electro-responsive gel lens having automatic multifocal and image stabilization functions according to the present invention comprises: a first electrode and a second electrode formed on a substrate and having different polarities; and a transmissive part which is formed of an electroactive polymer, and the shape of which is deformed when a voltage is applied to the first electrode and the second electrode, wherein at least one of the first electrode and the second electrode is formed in the plural, and a voltage is individually applied so as to change the shape of the transmissive part in three dimensions, such that the location of the focal point of light passing through the transmissive part is changed in three dimensions.

Abstract: Disclosed are an organic ion conductive polymer gel elastomer including a polymer matrix; a plasticizing solvent impregnated into the polymer matrix to plasticize the polymer matrix so that the polymer matrix is in a gel state; and an ion conductive dopant ionized by the plasticizing solvent and dispersed in the polymer matrix, wherein the plasticizing solvent and the ion conductive dopant are non-hydrophilic, and a method of preparing the organic ion conductive polymer gel elastomer.

Abstract: A method of manufacturing a semiconductor device includes forming a first pattern structure having a first opening and a second pattern structure having a second opening on a substrate, forming a gap fill layer in the second opening, forming fences and contact structures in the first opening, removing the gap fill layer in the second opening, forming an upper conductive layer to cover the first and second pattern structures, the fences, and the contact structures, forming a mask pattern based on a photolithography process using the second pattern structure covered by the upper conductive layer as an align mark, and etching the upper conductive layer using the mask pattern to form upper conductive patterns. A width of the second opening is larger than a width of a first opening. A thickness of the upper conductive layer is smaller than a depth of the second opening.

Abstract: A method of manufacturing a semiconductor device includes forming a first pattern structure having a first opening and a second pattern structure having a second opening on a substrate, forming a gap fill layer in the second opening, forming fences and contact structures in the first opening, removing the gap fill layer in the second opening, forming an upper conductive layer to cover the first and second pattern structures, the fences, and the contact structures, forming a mask pattern based on a photolithography process using the second pattern structure covered by the upper conductive layer as an align mark, and etching the upper conductive layer using the mask pattern to form upper conductive patterns. A width of the second opening is larger than a width of a first opening. A thickness of the upper conductive layer is smaller than a depth of the second opening.

Abstract: A method of forming a semiconductor device includes forming a mold structure on a substrate, forming a first mask layer having a deposition thickness on the mold structure and patterning the first mask layer to form first mask openings which expose the mold structure. The mold structure is etched to form holes that penetrate the mold structure. The first mask layer is thinned to form mask portions having thickness smaller than the deposition thickness. Conductive patterns are formed to fill the holes and the first mask openings. The first mask layer including the mask portions is etched to expose the mold structure. The conductive patterns include protrusions. A chemical mechanical polishing process is performed to remove the protrusions of the conductive patterns.