Patents by Inventor Jin Yeol Kim

Jin Yeol Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100182253
    Abstract: A touch screen panel for an image display device and a method of fabricating the same. The touch screen panel includes first and second substrates facing each other, the first and second substrates being joined together by a sealant; a plurality of first sensing patterns coupled to one another along a first direction on a side of the first substrate facing the second substrate; a plurality of second sensing patterns coupled to one another along a second direction on a side of the second substrate facing the first substrate; a plurality of first dummy patterns between the first sensing patterns corresponding to the second sensing patterns; a plurality of second dummy patterns between the second sensing patterns corresponding to the first sensing patterns; and an insulating layer between the first and second substrates.
    Type: Application
    Filed: August 18, 2009
    Publication date: July 22, 2010
    Inventors: Jung-Mok Park, Sun-Haeng Cho, Chang-Yong Lee, Jin-Yeol Kim, Seong-Je Huang, In-Won Jang, Dong-Wook Kang, Tae-Hyeong Kim
  • Publication number: 20090114430
    Abstract: Disclosed herein is a method of patterning a circuit using a self-assembly lithography. More specifically, the present invention is directed to a method of a circuit by a self-assembly lithography, which comprises the steps of: coating a substrate; forming the primary circuit; completing the patterning; and washing the substrate, a self-assembled lithographic circuit prepared by said method, and a method of forming an electrode circuit using said circuit. The inventive method of patterning a circuit using a self-assembly lithography is a new patterning process which does not use any typical photoresists and developers, thereby greatly reducing the manufacturing cost. Further, the inventive method converts the conventional top-down process into a bottom-up process, which enables to form more fine circuits with freedom. The circuit prepared according to the present invention can be effectively used for the photo process in a semiconductor and a display.
    Type: Application
    Filed: November 6, 2007
    Publication date: May 7, 2009
    Applicant: Industry Academic Cooperation Foundation of Kukmin University
    Inventor: Jin Yeol KIM
  • Patent number: 6664355
    Abstract: Disclosed are a process for synthesizing conductive polymers by gas polymerization and product thereof. The process for synthesizing conductive polymers includes the steps of coating oxidant on a substrate surface in the unit of several microns and drying in a dryer, contacting monomers of a gas phase to cause a polymerization to the surface on the substrate, and cleaning the substrate for removing the non-reacted monomers and the oxidant after the polymerization. The present invention reduces the manufacturing process to 2˜3 steps by using the gas polymerization, thereby decreasing the manufacturing cost to two third or more compared with conventional methods. Moreover, the present invention has an excellent thin film property and can freely adjust the electric conductivity.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: December 16, 2003
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventors: Jin Yeol Kim, Eung Ryul Kim
  • Publication number: 20030045663
    Abstract: Disclosed are a process for synthesizing conductive polymers by gas polymerization and product thereof. The process for synthesizing conductive polymers includes the steps of coating oxidant on a substrate surface in the unit of several microns and drying in a dryer, contacting monomers of a gas phase to cause a polymerization to the surface on the substrate, and cleaning the substrate for removing the non-reacted monomers and the oxidant after the polymerization. The present invention reduces the manufacturing process to 2˜3 steps by using the gas polymerization, thereby decreasing the manufacturing cost to two third or more compared with conventional methods. Moreover, the present invention has an excellent thin film property and can freely adjust the electric conductivity.
    Type: Application
    Filed: August 31, 2001
    Publication date: March 6, 2003
    Inventors: Jin Yeol Kim, Eung Ryul Kim