Abstract: A method for fabricating an electrochromic device includes: depositing a first transparent film on a first substrate; depositing a first mesh structure on the first transparent film; depositing a second transparent film on the first mesh structure; depositing an electrochromic layer of WO3 or MoO3 on the second transparent film by an arc-plasma process to form a first electrode structure; depositing a third transparent film on a second substrate; depositing a second mesh structure on the third transparent film; depositing a fourth transparent film on the second mesh structure; forming an ion storage layer of PB on the fourth transparent film to produce a second electrode structure; binding the first and second electrode structures by having the electrochromic layer to face the ion storage layer; and, forming an electrolyte layer between the first and second electrode structures to produce the electrochromic device. In addition, an electrochromic device is also provided.

Abstract: An anti-reflection composite layer including a substrate, a plurality of first optical layers and a plurality of second optical layers is provided. The first optical layers and the second optical layers are alternately formed on the carrier surface of the substrate by a PVD coating process, and the refractive index of the materials forming the first optical layers is higher than that of the materials forming the second optical layers. A manufacturing method thereof is also provided.

Abstract: The present invention discloses a method for fabricating an electrochromic device, which adopts the vacuum cathodic arc-plasma deposition to comprise five layers with an ionic conduction layer (electrolyte) in contact with an electrochromic (EC) layer and an ion storage (complementary) layer, all sandwiched between two transparent conducting layers sequentially on a substrate. The method owns superior deposition efficiency and the fabricated thin film structures have higher crystalline homogeneity. In addition, thanks to the nanometer pores in the thin film structures, the electric capacity as well as the ion mobility are greater. Consequently, the reaction efficiency for bleaching or coloring is enhanced.

Abstract: A method for manufacturing electrochemical device, which may include the following steps: disposing a metal material or a metal oxide material to be doped on the anode of the plasma source of the arc plasma coating equipment; forming a metal oxide film of the electrochemical device by the arc plasma coating equipment via an arc plasma coating process; and doping the metal material or the metal oxide material into the metal oxide film after being mixed with the plasma by heat vaporization via the phenomenon of the electrons heating the anode of the plasma source.

Abstract: The present invention discloses a method for fabricating an electrochromic device, which adopts the vacuum cathodic arc-plasma deposition to comprise five layers with an ionic conduction layer (electrolyte) in contact with an electrochromic (EC) layer and an ion storage (complementary) layer, all sandwiched between two transparent conducting layers sequentially on a substrate. The method owns superior deposition efficiency and the fabricated thin film structures have higher crystalline homogeneity. In addition, thanks to the nanometer pores in the thin film structures, the electric capacity as well as the ion mobility are greater. Consequently, the reaction efficiency for bleaching or coloring is enhanced.

Abstract: A gas isolation chamber comprises a vacuum chamber, a first body module, a second body module and a first temperature modulator. The vacuum chamber comprises a first chamber part, a second chamber part and at least one first gas valve unit. The first body module is disposed on the inner wall of the first chamber part and has a first gas hole corresponding to the position of the first gas valve unit. The first gas hole is connected to the first gas valve unit. The second body module is disposed on the inner wall of the second chamber part such that a slit channel can be formed between the second and the first body modules. The first temperature modulator is disposed in the first body module. The gas isolation chamber is further combined with the vacuum film process chambers to form a plasma deposition apparatus for proceeding continuous deposition process.

Abstract: A magnetron sputtering apparatus suitable for coating on a workpiece is provided. The magnetron sputtering apparatus includes a vacuum chamber, a holder, a magnetron plasma source and a high-power pulse power supply set, wherein the magnetron plasma source includes a base, a magnetron controller and a target. A reactive gas is inputted into the vacuum chamber, and the holder supporting the workpiece is disposed inside the vacuum chamber. The magnetron plasma source is disposed opposite to the workpiece, wherein the magnetron controller is disposed in the base, and the target is disposed on the base. The high-power pulse power supply set is coupled to the vacuum chamber, the magnetron plasma source and the holder, and a high voltage pulse power is inputted to the magnetron plasma source to generate plasma to coat a film on the surface of the workpiece.

Abstract: There is a disclosed apparatus for coating diamond on work pieces via hot filament chemical vapor deposition. The apparatus includes a chamber, a pump for pumping air from the chamber, a pressure controller for con trolling the pressure in the chamber, a grid disposed in the chamber, a grid-bias power supply for providing a positive bias to the grid, a holder for carrying the work pieces, a holder-bias power supply for providing a negative bias to the holder, filaments provided between the grid and the carrier, a filament power supply for energizing the filaments to heat up, a programmable temperature controller for controlling the temperature in the chamber and a pipe for transferring reaction gas into the chamber.

Abstract: A plasma source is designed with a starting rod to reduce target vapor shielding. A curve ion duct has reverse thorns on its inner wall to filter macroparticles in plasma. The curve ion duct has duct segments and each duct segment has an individual electricity. The present invention increases ion amount, acquires a film through high energy ions, and obtains enhanced film adhesion and film quality.